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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links  |
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Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. |
Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation |
2016 |
Journal of physics: D: applied physics |
49 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
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Tinck, S.; Bogaerts, A. |
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon |
2016 |
Journal of physics: D: applied physics |
49 |
|
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Bogaerts, A. |
Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry |
2016 |
Journal of physics: D: applied physics |
49 |
5 |
UA library record; WoS full record; WoS citing articles |
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Gul, B.; Tinck, S.; De Schepper, P.; Aman-ur-Rehman; Bogaerts, A. |
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching |
2015 |
Journal of physics: D: applied physics |
48 |
7 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. |
Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study |
2015 |
Journal of physics: D: applied physics |
48 |
9 |
UA library record; WoS full record; WoS citing articles |
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Van der Paal, J.; Verlackt, C.C.; Yusupov, M.; Neyts, E.C.; Bogaerts, A. |
Structural modification of the skin barrier by OH radicals : a reactive molecular dynamics study for plasma medicine |
2015 |
Journal of physics: D: applied physics |
48 |
20 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Y.; Jiang, W.; Bogaerts, A. |
Kinetic simulation of direct-current driven microdischarges in argon at atmospheric pressure |
2014 |
Journal of physics: D: applied physics |
47 |
10 |
UA library record; WoS full record; WoS citing articles |
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Zhang, L.; Heijkers, S.; Wang, W.; Martini, L.M.; Tosi, P.; Yang, D.; Fang, Z.; Bogaerts, A. |
Dry reforming of methane in a nanosecond repetitively pulsed discharge: chemical kinetics modeling |
2022 |
Plasma Sources Science & Technology |
31 |
|
UA library record; WoS full record |
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Matnazarova, S.; Khalilov, U.; Yusupov, M. |
Effect of endohedral nickel atoms on the hydrophilicity of carbon nanotubes |
2023 |
Molecular simulation |
49 |
|
UA library record; WoS full record |
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Mehmonov, K.; Ergasheva, A.; Yusupov, M.; Khalilov, U. |
The role of carbon monoxide in the catalytic synthesis of endohedral carbyne |
2023 |
Journal of applied physics |
134 |
|
UA library record; WoS full record |
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Bal, K.M.; Neyts, E.C. |
Extending and validating bubble nucleation rate predictions in a Lennard-Jones fluid with enhanced sampling methods and transition state theory |
2022 |
Journal Of Chemical Physics |
157 |
|
UA library record; WoS full record; WoS citing articles |
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Bruggeman, P.J.; Bogaerts, A.; Pouvesle, J.M.; Robert, E.; Szili, E.J. |
Plasma–liquid interactions |
2021 |
Journal Of Applied Physics |
130 |
|
UA library record |
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Bal, K.M. |
Nucleation rates from small scale atomistic simulations and transition state theory |
2021 |
Journal Of Chemical Physics |
155 |
|
UA library record; WoS full record; WoS citing articles |
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Vanraes, P.; Parayil Venugopalan, S.; Bogaerts, A. |
Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2etching by fluorocarbon-based plasmas |
2021 |
Applied Physics Reviews |
8 |
|
UA library record; WoS full record; WoS citing articles |
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Vanraes, P.; Bogaerts, A. |
The essential role of the plasma sheath in plasma–liquid interaction and its applications—A perspective |
2021 |
Journal Of Applied Physics |
129 |
|
UA library record; WoS full record; WoS citing articles |
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Bal, K.M.; Fukuhara, S.; Shibuta, Y.; Neyts, E.C. |
Free energy barriers from biased molecular dynamics simulations |
2020 |
Journal Of Chemical Physics |
153 |
|
UA library record; WoS full record; WoS citing articles |
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Khanam, A.; Vohra, A.; Slotte, J.; Makkonen, I.; Loo, R.; Pourtois, G.; Vandervorst, W. |
A demonstration of donor passivation through direct formation of V-As-i complexes in As-doped Ge1-XSnx |
2020 |
Journal Of Applied Physics |
127 |
|
UA library record; WoS full record; WoS citing articles |
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Vohra, A.; Khanam, A.; Slotte, J.; Makkonen, I.; Pourtois, G.; Porret, C.; Loo, R.; Vandervorst, W. |
Heavily phosphorus doped germanium : strong interaction of phosphorus with vacancies and impact of tin alloying on doping activation |
2019 |
Journal of applied physics |
125 |
1 |
UA library record; WoS full record; WoS citing articles |
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Sun, J.-Y.; Wen, D.-Q.; Zhang, Q.-Z.; Liu, Y.-X.; Wang, Y.-N. |
The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials |
2019 |
Physics of plasmas |
26 |
1 |
UA library record; WoS full record; WoS citing articles |
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Paunska, T.; Trenchev, G.; Bogaerts, A.; Kolev, S. |
A 2D model of a gliding arc discharge for CO2conversion |
2019 |
AIP conference proceedings
T2 – 10th Jubilee Conference of the Balkan-Physical-Union (BPU), AUG 26-30, 2018, Sofia, BULGARIA |
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UA library record; WoS full record; WoS citing articles |
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Vanraes, P.; Bogaerts, A. |
Plasma physics of liquids—A focused review |
2018 |
Applied physics reviews |
5 |
33 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Q.-Z.; Tinck, S.; de Marneffe, J.-F.; Zhang, L.; Bogaerts, A. |
Mechanisms for plasma cryogenic etching of porous materials |
2017 |
Applied physics letters |
111 |
2 |
UA library record; WoS full record; WoS citing articles |
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de de Meux, A.J.; Pourtois, G.; Genoe, J.; Heremans, P. |
Effects of hole self-trapping by polarons on transport and negative bias illumination stress in amorphous-IGZO |
2018 |
Journal of applied physics |
123 |
4 |
UA library record; WoS full record; WoS citing articles |
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Lu, A.K.A.; Pourtois, G.; Luisier, M.; Radu, I.P.; Houssa, M. |
On the electrostatic control achieved in transistors based on multilayered MoS2 : a first-principles study |
2017 |
Journal of applied physics |
121 |
|
UA library record; WoS full record; WoS citing articles |
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Clima, S.; Chen, Y.Y.; Chen, C.Y.; Goux, L.; Govoreanu, B.; Degraeve, R.; Fantini, A.; Jurczak, M.; Pourtois, G. |
First-principles thermodynamics and defect kinetics guidelines for engineering a tailored RRAM device |
2016 |
Journal of applied physics |
119 |
17 |
UA library record; WoS full record; WoS citing articles |
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Dhayalan, S.K.; Kujala, J.; Slotte, J.; Pourtois, G.; Simoen, E.; Rosseel, E.; Hikavyy, A.; Shimura, Y.; Iacovo, S.; Stesmans, A.; Loo, R.; Vandervorst, W.; |
On the manifestation of phosphorus-vacancy complexes in epitaxial Si:P films |
2016 |
Applied physics letters |
108 |
9 |
UA library record; WoS full record; WoS citing articles |
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Schoeters, B.; Leenaerts, O.; Pourtois, G.; Partoens, B. |
Ab-initio study of the segregation and electronic properties of neutral and charged B and P dopants in Si and Si/SiO2 nanowires |
2015 |
Journal of applied physics |
118 |
3 |
UA library record; WoS full record; WoS citing articles |
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Zhao, S.-X.; Gao, F.; Wang, Y.-P.; Wang, Y.-N.; Bogaerts, A. |
Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma |
2015 |
Journal of applied physics |
118 |
1 |
UA library record; WoS full record; WoS citing articles |
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Zhao, S.-X.; Zhang, Y.-R.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Bulk plasma fragmentation in a C4F8 inductively coupled plasma : a hybrid modelling study |
2015 |
Journal of applied physics |
117 |
11 |
UA library record; WoS full record; WoS citing articles |
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Dumpala, S.; Broderick, S.R.; Khalilov, U.; Neyts, E.C.; van Duin, A.C.T.; Provine, J.; Howe, R.T.; Rajan, K. |
Integrated atomistic chemical imaging and reactive force field molecular dynamic simulations on silicon oxidation |
2015 |
Applied physics letters |
106 |
19 |
UA library record; WoS full record; WoS citing articles |
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