| |
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
|
Bahnamiri, O.S.; Verheyen, C.; Snyders, R.; Bogaerts, A.; Britun, N. |
Nitrogen fixation in pulsed microwave discharge studied by infrared absorption combined with modelling |
2021 |
Plasma Sources Science & Technology |
30 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Laroussi, M.; Bekeschus, S.; Keidar, M.; Bogaerts, A.; Fridman, A.; Lu, X.; Ostrikov, K.; Hori, M.; Stapelmann, K.; Miller, V.; Reuter, S.; Laux, C.; Mesbah, A.; Walsh, J.; Jiang, C.; Thagard, S.M.; Tanaka, H.; Liu, D.; Yan, D.; Yusupov, M. |
Low-Temperature Plasma for Biology, Hygiene, and Medicine: Perspective and Roadmap |
2022 |
IEEE transactions on radiation and plasma medical sciences |
6 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, L.; Heijkers, S.; Wang, W.; Martini, L.M.; Tosi, P.; Yang, D.; Fang, Z.; Bogaerts, A. |
Dry reforming of methane in a nanosecond repetitively pulsed discharge: chemical kinetics modeling |
2022 |
Plasma Sources Science & Technology |
31 |
|
UA library record; WoS full record |
|
|
|
Bogaerts, A.; Neyts, E.C.; Guaitella, O.; Murphy, A.B. |
Foundations of plasma catalysis for environmental applications |
2022 |
Plasma Sources Science & Technology |
|
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Bissonnette-Dulude, J.; Heirman, P.; Coulombe, S.; Bogaerts, A.; Gervais, T.; Reuter, S. |
Coupling the COST reference plasma jet to a microfluidic device: a computational study |
2024 |
Plasma sources science and technology |
33 |
|
UA library record; WoS full record |
|
|
|
Biondo, O.; Fromentin, C.; Silva, T.; Guerra, V.; van Rooij, G.; Bogaerts, A. |
Insights into the limitations to vibrational excitation of CO2: validation of a kinetic model with pulsed glow discharge experiments |
2022 |
Plasma Sources Science & Technology |
31 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Yusupov, M.; Dewaele, D.; Attri, P.; Khalilov, U.; Sobott, F.; Bogaerts, A. |
Molecular understanding of the possible mechanisms of oligosaccharide oxidation by cold plasma |
2022 |
Plasma processes and polymers |
|
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Tennyson, J.; Mohr, S.; Hanicinec, M.; Dzarasova, A.; Smith, C.; Waddington, S.; Liu, B.; Alves, L.L.; Bartschat, K.; Bogaerts, A.; Engelmann, S.U.; Gans, T.; Gibson, A.R.; Hamaguchi, S.; Hamilton, K.R.; Hill, C.; O’Connell, D.; Rauf, S.; van ’t Veer, K.; Zatsarinny, O. |
The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions |
2022 |
Plasma Sources Science & Technology |
31 |
|
UA library record; WoS full record |
|
|
|
Tsonev, I.; Boothroyd, J.; Kolev, S.; Bogaerts, A. |
Simulation of glow and arc discharges in nitrogen: effects of the cathode emission mechanisms |
2023 |
PLASMA SOURCES SCIENCE & TECHNOLOGY |
32 |
|
UA library record; WoS full record |
|
|
|
Vanraes, P.; Parayil Venugopalan, S.; Besemer, M.; Bogaerts, A. |
Assessing neutral transport mechanisms in aspect ratio dependent etching by means of experiments and multiscale plasma modeling |
2023 |
Plasma Sources Science and Technology |
32 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Tampieri, F.; Gorbanev, Y.; Sardella, E. |
Plasma‐treated liquids in medicine: Let's get chemical |
2023 |
Plasma Processes and Polymers |
20 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Morais, E.; Bogaerts, A. |
Modelling the dynamics of hydrogen synthesis from methane in nanosecond‐pulsed plasmas |
2024 |
Plasma processes and polymers |
21 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Bercx, M.; Mayda, S.; Depla, D.; Partoens, B.; Lamoen, D. |
Plasmonic effects in the neutralization of slow ions at a metallic surface |
2023 |
Contributions to Plasma Physics |
|
|
UA library record; WoS full record |
|
|
|
Bogaerts, A. |
Special Issue on “Dielectric Barrier Discharges and their Applications” in Commemoration of the 20th Anniversary of Dr. Ulrich Kogelschatz’s Work |
2023 |
Plasma Chemistry and Plasma Processing |
43 |
|
UA library record; WoS full record |
|
|
|
Lin, A.; Gromov, M.; Nikiforov, A.; Smits, E.; Bogaerts, A. |
Characterization of Non-Thermal Dielectric Barrier Discharges for Plasma Medicine: From Plastic Well Plates to Skin Surfaces |
2023 |
Plasma Chemistry and Plasma Processing |
43 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Albrechts, M.; Tsonev, I.; Bogaerts, A. |
Investigation of O atom kinetics in O2plasma and its afterglow |
2024 |
Plasma Sources Science and Technology |
33 |
|
UA library record; WoS full record |
|
|
|
Yan, M.; Bogaerts, A.; Gijbels, R. |
Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge |
2001 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
63 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Kolev, S.; Bogaerts, A. |
A 2D model for a gliding arc discharge |
2015 |
Plasma sources science and technology |
24 |
34 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. |
Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges |
2010 |
Plasma sources science and technology |
19 |
116 |
UA library record; WoS full record; WoS citing articles |
|
|
|
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. |
Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis |
2015 |
Plasma sources science and technology |
24 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. |
Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges |
2013 |
Plasma sources science and technology |
22 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Kozák, T.; Bogaerts, A. |
Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model |
2015 |
Plasma sources science and technology |
24 |
100 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
|
