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  Author Title Year Publication (up) Volume Times cited Additional Links Links
Gou, F.; Neyts, E.; Eckert, M.; Tinck, S.; Bogaerts, A. Molecular dynamics simulations of Cl+ etching on a Si(100) surface 2010 Journal of applied physics 107 15 UA library record; WoS full record; WoS citing articles doi
Sen, H.S.; Sahin, H.; Peeters, F.M.; Durgun, E. Monolayers of MoS2 as an oxidation protective nanocoating material 2014 Journal of applied physics 116 52 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A. Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics 2005 Journal of applied physics 98 75 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A.; Gijbels, R. Numerical study of Ar/CF4/N2 discharges in single and dual frequency capacitively coupled plasma reactors 2003 Journal of applied physics 94 90 UA library record; WoS full record; WoS citing articles doi
Dobrynin, A.N.; Temst, K.; Lievens, P.; Margueritat, J.; Gonzalo, J.; Afonso, C.N.; Piscopiello, E.; Van Tendeloo, G. Observation of Co/CoO nanoparticles below the critical size for exchange bias 2007 Journal of applied physics 101 27 UA library record; WoS full record; WoS citing articles doi
Dhong, H.M.; Zhang, J.; Peeters, F.M.; Xu, W. Optical conductance and transmission in bilayer graphene 2009 Journal of applied physics 106 11 UA library record; WoS full record; WoS citing articles doi
Li, L.L.; Xu, W.; Peeters, F.M. Optical conductivity of topological insulator thin films 2015 Journal of applied physics 117 9 UA library record; WoS full record; WoS citing articles doi
Gryse, O.D.; Clauws, P.; van Landuyt, J.; Lebedev, O.; Claeys, C.; Simoen, E.; Vanhellemont, J. Oxide phase determination in silicon using infrared spectroscopy and transmission electron microscopy techniques 2002 Journal of applied physics 91 27 UA library record; WoS full record; WoS citing articles pdf doi
Cenian, A.; Chernukho, A.; Bogaerts, A.; Gijbels, R.; Leys, C. Particle-in-cell Monte Carlo modeling of Langmuir probes in an Ar plasma 2005 Journal of applied physics 97 18 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A.; Gijbels, R. Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency Ar/Cf4 discharge: effect of gas composition 2003 Journal of applied physics 93 57 UA library record; WoS full record; WoS citing articles doi
Neyts, E.; Yan, M.; Bogaerts, A.; Gijbels, R. Particle-in-cell/Monte Carlo simulations of a low-pressure capacitively coupled radio-frequency discharge: effect of adding H2 to an Ar discharge 2003 Journal of applied physics 93 15 UA library record; WoS full record; WoS citing articles doi
Wen, D.-Q.; Zhang, Q.-Z.; Jiang, W.; Song, U.-H.; Bogaerts, A.; Wang, Y.-N. Phase modulation in pulsed dual-frequency capacitively coupled plasmas 2014 Journal of applied physics 115 8 UA library record; WoS full record; WoS citing articles pdf doi
Carrillo-Nuñez, H.; Magnus, W.; Vandenberghe, W.G.; Sorée, B.; Peeters, F.M. Phonon-assisted Zener tunneling in a cylindrical nanowire transistor 2013 Journal of applied physics 113 4 UA library record; WoS full record; WoS citing articles doi
Zhang, Y.; Fischetti, M.V.; Sorée, B.; Magnus, W.; Heyns, M.; Meuris, M. Physical modeling of strain-dependent hole mobility in Ge p-channel inversion layers 2009 Journal of applied physics 106 29 UA library record; WoS full record; WoS citing articles doi
Wouters, J.; Lebedev, O.I.; Van Tendeloo, G.; Yamada, H.; Sato, N.; Vanacken, J.; Moshchalkov, V.V.; Verbiest, T.; Valev, V.K. Preparing polymer films doped with magnetic nanoparticles by spin-coating and melt-processing can induce an in-plane magnetic anisotropy 2011 Journal of applied physics 109 10 UA library record; WoS full record; WoS citing articles pdf doi
Verreck, D.; Van de Put, M.; Sorée, B.; Verhulst, A.S.; Magnus, W.; Vandenberghe, W.G.; Collaert, N.; Thean, A.; Groeseneken, G. Quantum mechanical solver for confined heterostructure tunnel field-effect transistors 2014 Journal of applied physics 115 15 UA library record; WoS full record; WoS citing articles doi
Croitoru, M.D.; Gladilin, V.N.; Fomin, V.M.; Devreese, J.T.; Magnus, W.; Schoenmaker, W.; Sorée, B. Quantum transport in a nanosize double-gate metal-oxide-semiconductor field-effect transistor 2004 Journal of applied physics 96 14 UA library record; WoS full record; WoS citing articles doi
Croitoru, M.D.; Gladilin, V.N.; Fomin, V.M.; Devreese, J.T.; Magnus, W.; Schoenmaker, W.; Sorée, B. Quantum transport in a nanosize silicon-on-insulator metal-oxide-semiconductor field effect transistor 2003 Journal of applied physics 93 16 UA library record; WoS full record; WoS citing articles doi
Papp, G.; Peeters, F.M. Resistance maps for a submicron Hall electrosensor in the diffusive regime 2007 Journal of applied physics 101 7 UA library record; WoS full record; WoS citing articles url doi
Papp, G.; Peeters, F.M. Resistance maps from local probing of a ballistic mesoscopic Hall bar 2007 Journal of applied physics 101 5 UA library record; WoS full record; WoS citing articles url doi
Moors, K.; Sorée, B.; Tokei, Z.; Magnus, W. Resistivity scaling and electron relaxation times in metallic nanowires 2014 Journal of applied physics 116 17 UA library record; WoS full record; WoS citing articles url doi
Cornelissens, Y.G.; Peeters, F.M. Response function of a Hall magnetosensor in the diffusive regime 2002 Journal of applied physics 92 24 UA library record; WoS full record; WoS citing articles doi
Chen, Z.; Bogaerts, A. Response to “Comment on 'Laser ablation of Cu and plume expansion into 1 atm ambient gas'” [J. Appl. Phys. 115, 166101 (2014)] 2014 Journal of applied physics 115 1 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation 1995 Journal of applied physics 78 60 UA library record; WoS full record; WoS citing articles doi
Autrique, D.; Clair, G.; L'Hermite, D.; Alexiades, V.; Bogaerts, A.; Rethfeld, B. The role of mass removal mechanisms in the onset of ns-laser induced plasma formation 2013 Journal of applied physics 114 31 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Gijbels, R. Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model 1996 Journal of applied physics 79 81 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description 1999 Journal of applied physics 86 50 UA library record; WoS full record; WoS citing articles doi
Baguer, N.; Bogaerts, A.; Gijbels, R. Role of the fast Ar atoms, Ar+ ions and metastable Ar atoms in a hollow cathode glow discharge: study by a hybrid model 2003 Journal of applied physics 94 19 UA library record; WoS full record; WoS citing articles doi
Depla, D.; Li, X.Y.; Mahieu, S.; van Aeken, K.; Leroy, W.P.; Haemers, J.; de Gryse, R.; Bogaerts, A. Rotating cylindrical magnetron sputtering: simulation of the reactive process 2010 Journal of applied physics 107 15 UA library record; WoS full record; WoS citing articles doi
Resta, V.; Siegel, J.; Bonse, J.; Gonzalo, J.; Afonso, C.N.; Piscopiello, E.; Van Tenedeloo, G.; Sharpening the shape distribution of gold nanoparticles by laser irradiation 2006 Journal of applied physics 100 36 UA library record; WoS full record; WoS citing articles pdf doi
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