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Author |
Title |
Year  |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: combined Monte Carlo and fluid model |
1999 |
Japanese journal of applied physics |
38 |
45 |
UA library record; WoS full record; WoS citing articles |
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Adams, F.; Gijbels, R.; van Grieken, R.; Kim, Y.-sang |
Inorganic mass spectrometry |
1999 |
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UA library record |
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Kaganovich, I.; Misina, M.; Bogaerts, A.; Gijbels, R. |
Investigation of the electron distribution functions in low pressure electron cyclotron resonance discharges |
1999 |
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UA library record; WoS full record; |
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Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
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Berezhnoi, S.; Kaganovich, I.; Bogaerts, A.; Gijbels, R. |
Modelling of radio frequency capacitively coupled plasma at intermediate pressures |
1999 |
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UA library record; WoS full record; |
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Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
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|
|
Bogaerts, A.; Gijbels, R. |
New developments and applications in GDMS |
1999 |
Fresenius' journal of analytical chemistry |
364 |
17 |
UA library record; WoS full record; WoS citing articles |
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Oleshko, V.P.; Gijbels, R.H.; van Daele, A.J.; Jacob, W.A. |
On estimation of the dielectric function of Ag(Br,I) nanocrystals by cryo-EELS (addendum) |
1999 |
Nanostructered materials |
11 |
|
UA library record |
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Verlinden, G.; Gijbels, R.; Geuens, I. |
Quantitative secondary ion mass spectrometry depth profiling of surface layers of cubic silver halide microcrystals |
1999 |
Journal of the American Society for Mass Spectrometry |
10 |
4 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
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Baguer, N.; Bogaerts, A.; Gijbels, R. |
A self-consistent mathematical model of a hollow cathode glow discharge |
1999 |
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UA library record; WoS full record; |
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Berezhnoi, S.; Kaganovich, I.; Misina, M.; Bogaerts, A.; Gijbels, R. |
Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures |
1999 |
IEEE transactions plasma science |
27 |
7 |
UA library record; WoS full record; WoS citing articles |
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Herrebout, D.; Bogaerts, A.; Goedheer, W.; Dekempeneer, E.; Gijbels, R. |
Simulation of plasma processes in plasma assisted CVD reactors |
1999 |
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UA library record; WoS full record; |
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van Vaeck, L.; Adriaens, A.; Gijbels, R. |
Static secondary ion mass spectrometry (S-SIMS): part 1: methodology and structural interpretation |
1999 |
Mass spectrometry reviews |
18 |
112 |
UA library record; WoS full record; WoS citing articles |
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Verlinden, G.; Gijbels, R.; Geuens, I.; de Keyzer, R. |
Surface analysis of halide distributions in complex AgX microcrystals by imaging time-of-flight SIMS (TOF-SIMS) |
1999 |
Journal of analytical atomic spectrometry |
14 |
10 |
UA library record; WoS full record; WoS citing articles |
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Conard, T.; de Witte, H.; Loo, R.; Verheyen, P.; Vandervorst, W.; Caymax, M.; Gijbels, R. |
XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers |
1999 |
Thin solid films : an international journal on the science and technology of thin and thick films |
343/344 |
1 |
UA library record; WoS full record; WoS citing articles |
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Oleshko, V.P.; Gijbels, R.H.; Jacob, W.A. |
Analytical electron microscopy of silver halide photographic systems |
2000 |
Micron |
31 |
8 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Behavior of the sputtered copper atoms, ions and excited species in a radio-frequency and direct current glow discharge |
2000 |
Spectrochimica acta: part B : atomic spectroscopy |
55 |
17 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R.; Serikov, V.V. |
Calculation of gas heating in direct current argon glow discharges |
2000 |
Journal of applied physics |
87 |
63 |
UA library record; WoS full record; WoS citing articles |
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Verlinden, G.; Gijbels, R.; Geuens, I.; de Keyzer, R. |
Chemical surface characterization of complex AgX microcrystals by imaging TOF-SIMS and dual beam depth profiling |
2000 |
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UA library record |
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Bogaerts, A.; Donko, Z.; Kutasi, K.; Bano, G.; Pinhao, N.; Pinheiro, M. |
Comparison of calculated and measured optical emission intensities in a direct current argon-copper glow discharge |
2000 |
Spectrochimica acta: part B : atomic spectroscopy |
55 |
33 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A.; Gijbels, R. |
Description of the argon-excited levels in a radio-frequency and direct current glow discharge |
2000 |
Spectrochimica acta: part B : atomic spectroscopy |
55 |
24 |
UA library record; WoS full record; WoS citing articles |
|
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Charlier, E.; Gijbels, R.; Van Doorselaer, M.; De Keyzer, R. |
Determination of the silver sulphide cluster size distribution via computer simulations |
2000 |
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UA library record; WoS full record; |
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Bogaerts, A.; Gijbels, R. |
Effects of adding hydrogen to an argon glow discharge: overview of relevant processes and some qualitative explanations |
2000 |
Journal of analytical atomic spectrometry |
15 |
58 |
UA library record; WoS full record; WoS citing articles |
|
|
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Gijbels, R.; Adriaens, A. |
Einleitung zu den massenspektrometrischen Methoden |
2000 |
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UA library record |
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Kaganovich, I.; Misina, M.; Berezhnoi, S.; Gijbels, R. |
Electron Boltzmann kinetic equation averaged over fast electron bouncing and pitch-angle scattering for fast modeling of electron cyclotron resonance discharge |
2000 |
Physical review : E : statistical, nonlinear, and soft matter physics |
61 |
31 |
UA library record; WoS full record; WoS citing articles |
|
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Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
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Oleshko, V.; Gijbels, R.; Amelinckx, S. |
Electron microscopy and scanning microanalysis |
2000 |
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UA library record |
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de Witte, H.; de Gendt, S.; Douglas, M.; Conard, T.; Kenis, K.; Mertens, P.W.; Vandervorst, W.; Gijbels, R. |
Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on wafer surfaces |
2000 |
Journal of the electrochemical society |
147 |
14 |
UA library record; WoS full record; WoS citing articles |
|
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Oleshko, V.P.; Gijbels, R.H.; Bilous, V.M.; Jacob, W.A.; Alfimov, M.V. |
Evolution of impurity clusters and photographic sensitivity |
2000 |
Zhurnal nauchnoj prikladnoj fotografii i kinematografii |
45 |
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UA library record |
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