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Author |
Title |
Year  |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W.J. |
Nanoparticle growth and transport mechanisms in capacitively coupled silane discharges: a numerical investigation |
2005 |
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UA library record; WoS full record; |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Modelling of formation and transport of nanoparticles in silane discharges |
2004 |
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UA library record |
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Herrebout, D.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J.; Vanhulsel, A. |
A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry |
2003 |
IEEE transactions on plasma science |
31 |
26 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Local and fast relaxation phenomena after laser-induced photodetachment in a strongly electronegative rf discharge |
2002 |
Physical review : E : statistical, nonlinear, and soft matter physics |
65 |
2 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 |
2000 |
Journal of applied physics |
87 |
14 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Two-dimensional model of a direct current glow discharge: description of the electrons, argon ions and fast argon atoms |
1996 |
Analytical chemistry |
68 |
70 |
UA library record; WoS full record; WoS citing articles |
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