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  Author Title Year Publication Volume Times cited Additional Links Links
De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge 2011 Plasma processes and polymers 8 70 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A.; Shamiryan, D. Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma 2011 Plasma processes and polymers 8 5 UA library record; WoS full record; WoS citing articles doi
Teodoru, S.; Kusano, Y.; Bogaerts, A. The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge 2012 Plasma processes and polymers 9 24 UA library record; WoS full record; WoS citing articles pdf doi
Aerts, R.; Tu, X.; De Bie, C.; Whitehead, J.C.; Bogaerts, A. An investigation into the dominant reactions for ethylene destruction in non-thermal atmospheric plasmas 2012 Plasma processes and polymers 9 46 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) 2012 Plasma processes and polymers 9 5 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; De Schepper, P.; Bogaerts, A. Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas 2013 Plasma processes and polymers 10 3 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation 2014 Plasma processes and polymers 11 1 UA library record; WoS full record; WoS citing articles pdf doi
Aerts, R.; Snoeckx, R.; Bogaerts, A. In-situ chemical trapping of oxygen in the splitting of carbon dioxide by plasma 2014 Plasma processes and polymers 11 29 UA library record; WoS full record; WoS citing articles pdf doi
Somers, W.; Dubreuil, M.F.; Neyts, E.C.; Vangeneugden, D.; Bogaerts, A. Incorporation of fluorescent dyes in atmospheric pressure plasma coatings for in-line monitoring of coating homogeneity 2014 Plasma processes and polymers 11 3 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Yusupov, M.; Van der Paal, J.; Verlackt, C.C.W.; Neyts, E.C. Reactive molecular dynamics simulations for a better insight in plasma medicine 2014 Plasma processes and polymers 11 22 UA library record; WoS full record; WoS citing articles pdf doi
Ramakers, M.; Michielsen, I.; Aerts, R.; Meynen, V.; Bogaerts, A. Effect of argon or helium on the CO2 conversion in a dielectric barrier discharge 2015 Plasma processes and polymers 12 63 UA library record; WoS full record; WoS citing articles pdf url doi
Yusupov, M.; Neyts, E.C.; Verlackt, C.C.; Khalilov, U.; van Duin, A.C.T.; Bogaerts, A. Inactivation of the endotoxic biomolecule lipid A by oxygen plasma species : a reactive molecular dynamics study 2015 Plasma processes and polymers 12 18 UA library record; WoS full record; WoS citing articles pdf url doi
Clima, S.; Garbin, D.; Opsomer, K.; Avasarala, N.S.; Devulder, W.; Shlyakhov, I.; Keukelier, J.; Donadio, G.L.; Witters, T.; Kundu, S.; Govoreanu, B.; Goux, L.; Detavernier, C.; Afanas'ev, V.; Kar, G.S.; Pourtois, G. Ovonic threshold-switching GexSey chalcogenide materials : stoichiometry, trap nature, and material relaxation from first principles 2020 Physica Status Solidi-Rapid Research Letters 3 UA library record; WoS full record; WoS citing articles pdf doi
Cassimon, J.; Kovács, A.; Neyts, E.; Cornet, I.; Billen, P. Deacetylation of mannosylerythritol lipids in hydrophobic natural deep eutectic solvents 2023 European journal of organic chemistry 27 UA library record pdf doi
Nematollahi, P.; Neyts, E.C. Distribution pattern of metal atoms in bimetal-doped pyridinic-N₄ pores determines their potential for electrocatalytic N₂ reduction 2022 Journal Of Physical Chemistry A 126 UA library record; WoS full record pdf url doi
Vande Velde, C.; Bultinck, E.; Tersago, K.; van Alsenoy, C.; Blockhuys, F. From anisole to 1,2,4,5-tetramethoxybenzene: theoretical study of the factors that determine the conformation of methoxy groups on a benzene ring 2007 International journal of quantum chemistry 107 14 UA library record; WoS full record; WoS citing articles doi
Bal, K.M. Nucleation rates from small scale atomistic simulations and transition state theory 2021 Journal Of Chemical Physics 155 UA library record; WoS full record; WoS citing articles url doi
Bal, K.M.; Neyts, E.C. On the time scale associated with Monte Carlo simulations 2014 The journal of chemical physics 141 26 UA library record; WoS full record; WoS citing articles url doi
Khalilov, U.; Bogaerts, A.; Neyts, E.C. Toward the Understanding of Selective Si Nano-Oxidation by Atomic Scale Simulations 2017 Accounts of chemical research 50 5 UA library record; WoS full record; WoS citing articles pdf url doi
Ostrikov, K.; Neyts, E.C.; Meyyappan, M. Plasma nanoscience : from nano-solids in plasmas to nano-plasmas in solids 2013 Advances in physics 62 380 UA library record; WoS full record; WoS citing articles pdf doi
Wang, J.; Zhang, K.; Mertens, M.; Bogaerts, A.; Meynen, V. Plasma-based dry reforming of methane in a dielectric barrier discharge reactor: Importance of uniform (sub)micron packings/catalysts to enhance the performance 2023 APPLIED CATALYSIS B-ENVIRONMENTAL 337 UA library record; WoS full record pdf url doi
Wang, J.; Zhang, K.; Mertens, M.; Bogaerts, A.; Meynen, V. Plasma-based dry reforming of methane in a dielectric barrier discharge reactor: Importance of uniform (sub)micron packings/catalysts to enhance the performance 2023 APPLIED CATALYSIS B-ENVIRONMENTAL 337 UA library record; WoS full record pdf url doi
Kelly, S.; Verheyen, C.; Cowley, A.; Bogaerts, A. Producing oxygen and fertilizer with the Martian atmosphere by using microwave plasma 2022 Chem 8 UA library record; WoS full record; WoS citing articles pdf url doi
Lin, A.; Sahun, M.; Biscop, E.; Verswyvel, H.; De Waele, J.; De Backer, J.; Theys, C.; Cuypers, B.; Laukens, K.; Berghe, W.V.; Smits, E.; Bogaerts, A. Acquired non-thermal plasma resistance mediates a shift towards aerobic glycolysis and ferroptotic cell death in melanoma 2023 Drug resistance updates 67 UA library record; WoS full record; WoS citing articles pdf url doi
Snoeckx, R.; Heijkers, S.; Van Wesenbeeck, K.; Lenaerts, S.; Bogaerts, A. CO2conversion in a dielectric barrier discharge plasma: N2in the mix as a helping hand or problematic impurity? 2016 Energy & environmental science 9 68 UA library record; WoS full record; WoS citing articles pdf url doi
Rouwenhorst, K.H.R.; Jardali, F.; Bogaerts, A.; Lefferts, L. From the Birkeland–Eyde process towards energy-efficient plasma-based NOXsynthesis: a techno-economic analysis 2021 Energy & Environmental Science 14 UA library record; WoS full record; WoS citing articles url doi
van den Broek, B.; Houssa, M.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. Current-voltage characteristics of armchair Sn nanoribbons 2014 Physica status solidi: rapid research letters 8 9 UA library record; WoS full record; WoS citing articles doi
Clima, S.; Sankaran, K.; Chen, Y.Y.; Fantini, A.; Celano, U.; Belmonte, A.; Zhang, L.; Goux, L.; Govoreanu, B.; Degraeve, R.; Wouters, D.J.; Jurczak, M.; Vandervorst, W.; Gendt, S.D.; Pourtois, G.; RRAMs based on anionic and cationic switching : a short overview 2014 Physica status solidi: rapid research letters 8 28 UA library record; WoS full record; WoS citing articles doi
Clima, S.; Kaczer, B.; Govoreanu, B.; Popovici, M.; Swerts, J.; Verhulst, A.S.; Jurczak, M.; De Gendt, S.; Pourtois, G. Determination of ultimate leakage through rutile TiO2 and tetragonal ZrO2 from ab initio complex band calculations 2013 IEEE electron device letters 34 3 UA library record; WoS full record; WoS citing articles doi
Clima, S.; Chen, Y.Y.; Fantini, A.; Goux, L.; Degraeve, R.; Govoreanu, B.; Pourtois, G.; Jurczak, M. Intrinsic tailing of resistive states distributions in amorphous <tex>HfOx </tex> and TaOx based resistive random access memories 2015 IEEE electron device letters 36 33 UA library record; WoS full record; WoS citing articles doi
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