| |
Author  |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
|
Tennyson, J.; Rahimi, S.; Hill, C.; Tse, L.; Vibhakar, A.; Akello-Egwel, D.; Brown, D.B.; Dzarasova, A.; Hamilton, J.R.; Jaksch, D.; Mohr, S.; Wren-Little, K.; Bruckmeier, J.; Agarwal, A.; Bartschat, K.; Bogaerts, A.; Booth, J.-P.; Goeckner, M.J.; Hassouni, K.; Itikawa, Y.; Braams, B.J.; Krishnakumar, E.; Laricchiuta, A.; Mason, N.J.; Pandey, S.; Petrovic, Z.L.; Pu, Y.-K.; Ranjan, A.; Rauf, S.; Schulze, J.; Turner, M.M.; Ventzek, P.; Whitehead, J.C.; Yoon, J.-S. |
QDB: a new database of plasma chemistries and reactions |
2017 |
Plasma sources science and technology |
26 |
18 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Trenchev, G.; Kolev, S.; Bogaerts, A. |
A 3D model of a reverse vortex flow gliding arc reactor |
2016 |
Plasma sources science and technology |
25 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Trenchev, G.; Kolev, S.; Kiss’ovski, Z. |
Modeling a Langmuir probe in atmospheric pressure plasma at different EEDFs |
2017 |
Plasma sources science and technology |
26 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Van Gaens, W.; Bogaerts, A. |
Reaction pathways of biomedically active species in an Ar plasma jet |
2014 |
Plasma sources science and technology |
23 |
34 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Van Laer, K.; Bogaerts, A. |
Fluid modelling of a packed bed dielectric barrier discharge plasma reactor |
2016 |
Plasma sources science and technology |
25 |
50 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Van Laer, K.; Bogaerts, A. |
How bead size and dielectric constant affect the plasma behaviour in a packed bed plasma reactor: a modelling study |
2017 |
Plasma sources science and technology |
26 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Vanraes, P.; Parayil Venugopalan, S.; Besemer, M.; Bogaerts, A. |
Assessing neutral transport mechanisms in aspect ratio dependent etching by means of experiments and multiscale plasma modeling |
2023 |
Plasma Sources Science and Technology |
32 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Wang, L.; Wen, D.-Q.; Zhang, Q.-Z.; Song, Y.-H.; Zhang, Y.-R.; Wang, Y.-N. |
Disruption of self-organized striated structure induced by secondary electron emission in capacitive oxygen discharges |
2019 |
Plasma sources science and technology |
28 |
2 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Wang, W.; Berthelot, A.; Kolev, S.; Tu, X.; Bogaerts, A. |
CO2 conversion in a gliding arc plasma: 1D cylindrical discharge model |
2016 |
Plasma sources science and technology |
25 |
3 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Wang, W.; Bogaerts, A. |
Effective ionisation coefficients and critical breakdown electric field of CO2at elevated temperature: effect of excited states and ion kinetics |
2016 |
Plasma sources science and technology |
25 |
3 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Q.-Z.; Bogaerts, A. |
Propagation of a plasma streamer in catalyst pores |
2018 |
Plasma sources science and technology |
27 |
16 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Q.-Z.; Wang, W.-Z.; Bogaerts, A. |
Importance of surface charging during plasma streamer propagation in catalyst pores |
2018 |
Plasma sources science and technology |
27 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Y.-R.; Neyts, E.C.; Bogaerts, A. |
Enhancement of plasma generation in catalyst pores with different shapes |
2018 |
Plasma sources science and technology |
27 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Y.; Wang, H.-yu; Zhang, Y.-ru; Bogaerts, A. |
Formation of microdischarges inside a mesoporous catalyst in dielectric barrier discharge plasmas |
2017 |
Plasma sources science and technology |
26 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
|
