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  Author (down) Title Year Publication Volume Times cited Additional Links Links
Tinck, S.; De Schepper, P.; Bogaerts, A. Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas 2013 Plasma processes and polymers 10 3 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Boullart, W.; Bogaerts, A. Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments 2009 Journal of physics: D: applied physics 42 23 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Boullart, W.; Bogaerts, A. Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments 2008 Journal of physics: D: applied physics 41 31 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A.; Shamiryan, D. Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma 2011 Plasma processes and polymers 8 5 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) 2012 Plasma processes and polymers 9 5 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A. Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry 2016 Journal of physics: D: applied physics 49 5 UA library record; WoS full record; WoS citing articles pdf url doi
Tinck, S.; Bogaerts, A. Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon 2016 Journal of physics: D: applied physics 49 UA library record; WoS full record; WoS citing articles pdf url doi
Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation 2014 Plasma processes and polymers 11 1 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S. Numerical simulations of inductively coupled plasmas for applications in the microelectronics industry 2011 UA library record
Teodoru, S.; Kusano, Y.; Bogaerts, A. The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge 2012 Plasma processes and polymers 9 24 UA library record; WoS full record; WoS citing articles pdf doi
Tennyson, J.; Rahimi, S.; Hill, C.; Tse, L.; Vibhakar, A.; Akello-Egwel, D.; Brown, D.B.; Dzarasova, A.; Hamilton, J.R.; Jaksch, D.; Mohr, S.; Wren-Little, K.; Bruckmeier, J.; Agarwal, A.; Bartschat, K.; Bogaerts, A.; Booth, J.-P.; Goeckner, M.J.; Hassouni, K.; Itikawa, Y.; Braams, B.J.; Krishnakumar, E.; Laricchiuta, A.; Mason, N.J.; Pandey, S.; Petrovic, Z.L.; Pu, Y.-K.; Ranjan, A.; Rauf, S.; Schulze, J.; Turner, M.M.; Ventzek, P.; Whitehead, J.C.; Yoon, J.-S. QDB: a new database of plasma chemistries and reactions 2017 Plasma sources science and technology 26 18 UA library record; WoS full record; WoS citing articles url doi
Tennyson, J.; Mohr, S.; Hanicinec, M.; Dzarasova, A.; Smith, C.; Waddington, S.; Liu, B.; Alves, L.L.; Bartschat, K.; Bogaerts, A.; Engelmann, S.U.; Gans, T.; Gibson, A.R.; Hamaguchi, S.; Hamilton, K.R.; Hill, C.; O’Connell, D.; Rauf, S.; van ’t Veer, K.; Zatsarinny, O. The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions 2022 Plasma Sources Science & Technology 31 UA library record; WoS full record url doi
Tchakoua, T.; Powell, A.D.; Gerrits, N.; Somers, M.F.; Doblhoff-Dier, K.; Busnengo, H.F.; Kroes, G.-J. Simulating highly activated sticking of H₂ on Al(110) : quantum versus quasi-classical dynamics 2023 The journal of physical chemistry: C : nanomaterials and interfaces 127 UA library record; WoS full record; WoS citing articles url doi
Tchakoua, T.; Gerrits, N.; Smeets, E.W.F.; Kroes, G.-J. SBH17 : benchmark database of barrier heights for dissociative chemisorption on transition metal surfaces 2023 Journal of chemical theory and computation 19 UA library record; WoS full record; WoS citing articles url doi
Taylor, P.R.; Martin, J.M.L.; François, J.P.; Gijbels, R. An ab initio study of the C3+ cation using multireference methods 1991 The journal of chemical physics 95 UA library record
Tavernier, S.M.F.; Nies, E.; Gijbels, R. Hard-spere model for hydrodynamic chromatography systems 1981 Analytical proceedings 18 UA library record doi
Tampieri, F.; Gorbanev, Y.; Sardella, E. Plasma‐treated liquids in medicine: Let's get chemical 2023 Plasma Processes and Polymers 20 UA library record; WoS full record; WoS citing articles url doi
Tampieri, F.; Espona-Noguera, A.; Labay, C.; Ginebra, M.-P.; Yusupov, M.; Bogaerts, A.; Canal, C. Does non-thermal plasma modify biopolymers in solution? A chemical and mechanistic study for alginate 2023 Biomaterials Science UA library record; WoS full record; WoS citing articles pdf url doi
Tambuyzer, B.R.; Bergwerf, I.; de Vocht, N.; Reekmans, K.; Daans, J.; Jorens, P.G.; Goossens, H.; Ysebaert, D.K.; Chatterjee, S.; Van Marck, E.; Berneman, Z.N.; Ponsaerts, P. Allogeneic stromal cell implantation in brain tissue leads to robust microglial activation 2009 Immunology and cell biology 31 UA library record; WoS full record; WoS citing articles doi
Surmenev, R.A.; Grubova, I.Y.; Neyts, E.; Teresov, A.D.; Koval, N.N.; Epple, M.; Tyurin, A.I.; Pichugin, V.F.; Chaikina, M.V.; Surmeneva, M.A. Ab initio calculations and a scratch test study of RF-magnetron sputter deposited hydroxyapatite and silicon-containing hydroxyapatite coatings 2020 Surfaces and interfaces 21 UA library record; WoS full record; WoS citing articles pdf url doi
Sun, S.R.; Wang, H.X.; Mei, D.H.; Tu, X.; Bogaerts, A. CO2 conversion in a gliding arc plasma: Performance improvement based on chemical reaction modeling 2017 Journal of CO2 utilization 17 41 UA library record; WoS full record; WoS citing articles pdf url doi
Sun, S.R.; Wang, H.X.; Bogaerts, A. Chemistry reduction of complex CO2chemical kinetics: application to a gliding arc plasma 2020 Plasma Sources Science & Technology 29 UA library record; WoS full record; WoS citing articles pdf url doi
Sun, S.R.; Kolev, S.; Wang, H.X.; Bogaerts, A. Coupled gas flow-plasma model for a gliding arc: investigations of the back-breakdown phenomenon and its effect on the gliding arc characteristics 2017 Plasma sources science and technology 26 9 UA library record; WoS full record; WoS citing articles pdf url doi
Sun, S.R.; Kolev, S.; Wang, H.X.; Bogaerts, A. Investigations of discharge and post-discharge in a gliding arc: a 3D computational study 2017 Plasma sources science and technology 26 11 UA library record; WoS full record; WoS citing articles pdf url doi
Sun, S. Study of carbon dioxide dissociation mechanisms in a gliding arc discharge 2018 UA library record;
Sun, J.-Y.; Wen, D.-Q.; Zhang, Q.-Z.; Liu, Y.-X.; Wang, Y.-N. The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials 2019 Physics of plasmas 26 1 UA library record; WoS full record; WoS citing articles url doi
Struyf, H.; van Vaeck, L.; Kennis, P.; Gijbels, R.; van Grieken, R. Chemical characterization of neo-ceramic powders by time-of-flight and Fourier transform laser microprobe mass spectrometry 1996 Rapid communications in mass spectrometry 10 11 UA library record; WoS full record; WoS citing articles pdf doi
Struyf, H.; van Roy, W.; van Vaeck, L.; van Grieken, R.; Gijbels, R.; Caravatti, P. Laser microprobe Fourier transform mass spectrometer with external ion source for organic and inorganic microanalysis 1993 Analytica chimica acta 283 17 UA library record; WoS full record; WoS citing articles doi
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