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  Author Title Year (down) Publication Volume Times cited Additional Links Links
Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation 2014 Plasma processes and polymers 11 1 UA library record; WoS full record; WoS citing articles pdf doi
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