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  Author Title Year Publication Volume Times cited Additional Links Links
Loo, R.; Arimura, H.; Cott, D.; Witters, L.; Pourtois, G.; Schulze, A.; Douhard, B.; Vanherle, W.; Eneman, G.; Richard, O.; Favia, P.; Mitard, J.; Mocuta, D.; Langer, R.; Collaert, N. Epitaxial CVD Growth of Ultra-Thin Si Passivation Layers on Strained Ge Fin Structures 2018 ECS journal of solid state science and technology 7 5 UA library record; WoS full record; WoS citing articles url doi
de de Meux, A.J.; Pourtois, G.; Genoe, J.; Heremans, P. Method to quantify the delocalization of electronic states in amorphous semiconductors and its application to assessing charge carrier mobility of p-type amorphous oxide semiconductors 2018 Physical review B 97 2 UA library record; WoS full record; WoS citing articles url doi
Berthelot, A. Modeling of microwave plasmas for carbon dioxide conversion 2018 UA library record url
Sun, S. Study of carbon dioxide dissociation mechanisms in a gliding arc discharge 2018 UA library record;
Nematollahi, P.; Neyts, E.C. A comparative DFT study on CO oxidation reaction over Si-doped BC2N nanosheet and nanotube 2018 Applied surface science 439 8 UA library record; WoS full record; WoS citing articles doi
Wang, Z.; Zhang, Y.; Neyts, E.C.; Cao, X.; Zhang, X.; Jang, B.W.-L.; Liu, C.-jun Catalyst preparation with plasmas : how does it work? 2018 ACS catalysis 8 81 UA library record; WoS full record; WoS citing articles doi
Loo, R.; Arimura, H.; Cott, D.; Witters, L.; Pourtois, G.; Schulze, A.; Douhard, B.; Vanherle, W.; Eneman, G.; Richard, O.; Favia, P.; Mitard, J.; Mocuta, D.; Langer, R.; Collaert, N. Epitaxial CVD growth of ultra-thin Si passivation layers on strained Ge fin structures 2017 Semiconductor Process Integration 10 UA library record; WoS full record pdf doi
Yadav, D.K.; Kumar, S.; Saloni; Misra, S.; Yadav, L.; Teli, M.; Sharma, P.; Chaudhary, S.; Kumar, N.; Choi, E.H.; Kim, H.S.; Kim, M.-hyun Molecular Insights into the Interaction of RONS and Thieno[3,2-c]pyran Analogs with SIRT6/COX-2: A Molecular Dynamics Study 2018 Scientific reports 8 10 UA library record; WoS full record; WoS citing articles url doi
Pourtois, G.; Dabral, A.; Sankaran, K.; Magnus, W.; Yu, H.; de de Meux, A.J.; Lu, A.K.A.; Clima, S.; Stokbro, K.; Schaekers, M.; Houssa, M.; Collaert, N.; Horiguchi, N. Probing the intrinsic limitations of the contact resistance of metal/semiconductor interfaces through atomistic simulations 2017 Semiconductors, Dielectrics, And Metals For Nanoelectronics 15: In Memory Of Samares Kar 1 UA library record; WoS full record; WoS citing articles pdf doi
de de Meux, A.J.; Pourtois, G.; Genoe, J.; Heremans, P. Defects in amorphous semiconductors : the case of amorphous indium gallium zinc oxide 2018 Physical review applied 9 7 UA library record; WoS full record; WoS citing articles url doi
de de Meux, A.J.; Pourtois, G.; Genoe, J.; Heremans, P. Effects of hole self-trapping by polarons on transport and negative bias illumination stress in amorphous-IGZO 2018 Journal of applied physics 123 4 UA library record; WoS full record; WoS citing articles pdf url doi
Zhang, H.; Wang, W.; Li, X.; Han, L.; Yan, M.; Zhong, Y.; Tu, X. Plasma activation of methane for hydrogen production in a N2 rotating gliding arc warm plasma : a chemical kinetics study 2018 Chemical engineering journal 345 25 UA library record; WoS full record; WoS citing articles pdf url doi
Nematollahi, P.; Esrafili, M.D.; Neyts, E.C. The role of healed N-vacancy defective BC2N sheet and nanotube by NO molecule in oxidation of NO and CO gas molecules 2018 Surface science : a journal devoted to the physics and chemistry of interfaces 672-673 1 UA library record; WoS full record; WoS citing articles pdf url doi
Heyne, M.H.; de Marneffe, J.-F.; Radu, I.; Neyts, E.C.; De Gendt, S. Thermal recrystallization of short-range ordered WS2 films 2018 Journal of vacuum science and technology: A: vacuum surfaces and films 36 2 UA library record; WoS full record; WoS citing articles pdf doi
Dabral, A.; Pourtois, G.; Sankaran, K.; Magnus, W.; Yu, H.; de de Meux, A.J.; Lu, A.K.A.; Clima, S.; Stokbro, K.; Schaekers, M.; Collaert, N.; Horiguchi, N.; Houssa, M. Study of the intrinsic limitations of the contact resistance of metal/semiconductor interfaces through atomistic simulations 2018 ECS journal of solid state science and technology 7 2 UA library record; WoS full record; WoS citing articles doi
Fridman, A.; Lin, A.; Miller, V.; Bekeschus, S.; Wende, K.; Weltmann, K.-D. The plasma treatment unit : an attempt to standardize cold plasma treatment for defined biological effects 2018 Plasma medicine 8 UA library record pdf doi
Dhayalan, S.K.; Kujala, J.; Slotte, J.; Pourtois, G.; Simoen, E.; Rosseel, E.; Hikavyy, A.; Shimura, Y.; Loo, R.; Vandervorst, W. On the evolution of strain and electrical properties in as-grown and annealed Si:P epitaxial films for source-drain stressor applications 2018 ECS journal of solid state science and technology 7 4 UA library record; WoS full record; WoS citing articles url doi
Lin, A.G.; Xiang, B.; Merlino, D.J.; Baybutt, T.R.; Sahu, J.; Fridman, A.; Snook, A.E.; Miller, V. Non-thermal plasma induces immunogenic cell death in vivo in murine CT26 colorectal tumors 2018 Oncoimmunology 7 28 UA library record; WoS full record; WoS citing articles pdf doi
Bal, K. New ways to bridge the gap between microscopic simulations and macroscopic chemistry 2018 UA library record url
Bekeschus, S.; Lin, A.; Fridman, A.; Wende, K.; Weltmann, K.-D.; Miller, V. A comparison of floating-electrode DBD and kINPen jet : plasma parameters to achieve similar growth reduction in colon cancer cells under standardized conditions 2018 Plasma chemistry and plasma processing 38 12 UA library record; WoS full record; WoS citing articles url doi
Hu, L.; Amini, M.N.; Wu, Y.; Jin, Z.; Yuan, J.; Lin, R.; Wu, J.; Dai, Y.; He, H.; Lu, Y.; Lu, J.; Ye, Z.; Han, S.-T.; Ye, J.; Partoens, B.; Zeng, Y.-J.; Ruan, S. Charge transfer doping modulated raman scattering and enhanced stability of black phosphorus quantum dots on a ZnO nanorod 2018 Advanced Optical Materials 6 37 UA library record; WoS full record; WoS citing articles pdf doi
Verlackt, C. The behavior of plasma-generated reactive species in plasma medicine 2018 UA library record pdf
Ghorbanfekr Kalashami, H. Graphene-based membranes and nanoconfined water : molecular dynamics simulation study 2019 UA library record url
Paunska, T.; Trenchev, G.; Bogaerts, A.; Kolev, S. A 2D model of a gliding arc discharge for CO2conversion 2019 AIP conference proceedings T2 – 10th Jubilee Conference of the Balkan-Physical-Union (BPU), AUG 26-30, 2018, Sofia, BULGARIA UA library record; WoS full record; WoS citing articles url doi
Heyne, M.H.; Marinov, D.; Braithwaite, N.; Goodyear, A.; de Marneffe, J.-F.; Cooke, M.; Radu, I.; Neyts, E.C.; De Gendt, S. A route towards the fabrication of 2D heterostructures using atomic layer etching combined with selective conversion 2019 2D materials 6 UA library record; WoS full record; WoS citing articles pdf doi
Dabral, A.; Lu, A.K.A.; Chiappe, D.; Houssa, M.; Pourtois, G. A systematic study of various 2D materials in the light of defect formation and oxidation 2019 Physical chemistry, chemical physics 21 1 UA library record; WoS full record; WoS citing articles pdf doi
Michielsen, I.; Uytdenhouwen, Y.; Bogaerts, A.; Meynen, V. Altering conversion and product selectivity of dry reforming of methane in a dielectric barrier discharge by changing the dielectric packing material 2019 Catalysts 9 4 UA library record; WoS full record; WoS citing articles; WoS full record; WoS citing articles url doi
Trenchev, G.; Nikiforov, A.; Wang, W.; Kolev, S.; Bogaerts, A. Atmospheric pressure glow discharge for CO2 conversion : model-based exploration of the optimum reactor configuration 2019 Chemical engineering journal 362 4 UA library record; WoS full record; WoS citing articles pdf url doi
Wang, L.; Wen, D.-Q.; Zhang, Q.-Z.; Song, Y.-H.; Zhang, Y.-R.; Wang, Y.-N. Disruption of self-organized striated structure induced by secondary electron emission in capacitive oxygen discharges 2019 Plasma sources science and technology 28 2 UA library record; WoS full record; WoS citing articles pdf url doi
Jia, W.-Z.; Zhang, Q.-Z.; Wang, X.-F.; Song, Y.-H.; Zhang, Y.-Y.; Wang, Y.-N. Effect of dust particle size on the plasma characteristics in a radio frequency capacitively coupled silane plasma 2019 Journal of physics: D: applied physics 52 UA library record; WoS full record; WoS citing articles pdf url doi
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