|
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
Lin, A.; Gromov, M.; Nikiforov, A.; Smits, E.; Bogaerts, A. |
Characterization of Non-Thermal Dielectric Barrier Discharges for Plasma Medicine: From Plastic Well Plates to Skin Surfaces |
2023 |
Plasma Chemistry and Plasma Processing |
43 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Oleshko, V.P.; Gijbels, R.H.; van Daele, A.J.; Jacob, W.A.; Xu, Y.-E.; Wang, S.-E.; Park, I.-Y.; Kang, T.-S. |
Combined characterization of composite tabular silver halide microcrystals by cryo-EFTEM/EELS and cryo-STEM/EDX techniques |
1998 |
Microscopy research and technique |
42 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Bultinck, E.; Kolev, I.; Schwaederlé, L.; van Aeken, K.; Buyle, G.; Depla, D. |
Computer modelling of magnetron discharges |
2009 |
Journal of physics: D: applied physics |
42 |
32 |
UA library record; WoS full record; WoS citing articles |
|
|
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Fluid modelling of an atmospheric pressure dielectric barrier discharge in cylindrical geometry |
2009 |
Journal of physics: D: applied physics |
42 |
29 |
UA library record; WoS full record; WoS citing articles |
|
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments |
2009 |
Journal of physics: D: applied physics |
42 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
Martens, T.; Brok, W.J.M.; van Dijk, J.; Bogaerts, A. |
On the regime transitions during the formation of an atmospheric pressure dielectric barrier glow discharge |
2009 |
Journal of physics: D: applied physics |
42 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
van Dijk, J.; Kroesen, G.M.W.; Bogaerts, A. |
Plasma modelling and numerical simulation |
2009 |
Journal of physics: D: applied physics |
42 |
64 |
UA library record; WoS full record; WoS citing articles |
|
|
Georgieva, V.; Saraiva, M.; Jehanathan, N.; Lebelev, O.I.; Depla, D.; Bogaerts, A. |
Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments |
2009 |
Journal of physics: D: applied physics |
42 |
37 |
UA library record; WoS full record; WoS citing articles |
|
|
Dinh, D.K.; Trenchev, G.; Lee, D.H.; Bogaerts, A. |
Arc plasma reactor modification for enhancing performance of dry reforming of methane |
2020 |
Journal Of Co2 Utilization |
42 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Bultinck, E.; Bogaerts, A. |
The effect of the magnetic field strength on the sheath region of a dc magnetron discharge |
2008 |
Journal of physics: D: applied physics |
41 |
16 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Gijbels, R. |
Modeling of radio-frequency and direct current glow discharges in argon |
2000 |
Journal of technical physics |
41 |
|
UA library record |
|
|
Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. |
New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
47 |
UA library record; WoS full record; WoS citing articles |
|
|
Eckert, M.; Neyts, E.; Bogaerts, A. |
On the reaction behaviour of hydrocarbon species at diamond (1 0 0) and (1 1 1) surfaces: a molecular dynamics investigation |
2008 |
Journal of physics: D: applied physics |
41 |
17 |
UA library record; WoS full record; WoS citing articles |
|
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
31 |
UA library record; WoS full record; WoS citing articles |
|
|
Adriaensen, L.; Vangaever, F.; Lenaerts, J.; Gijbels, R. |
Comparative study of organic dyes with time-of-flight static secondary ion mass spectrometry and related techniques |
2005 |
Journal of mass spectrometry |
40 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, Q.-Z.; Wang, W.Z.; Thille, C.; Bogaerts, A. |
H2S Decomposition into H2 and S2 by Plasma Technology: Comparison of Gliding Arc and Microwave Plasma |
2020 |
Plasma Chemistry And Plasma Processing |
40 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Yang, Z.; Geise, H.J.; Mehbod, M.; Debrue, G.; Visser, J.W.; Sonneveld, E.J.; Van 't dack, L.; Gijbels, R. |
Conductivity and electron density of undoped model compounds of poly(phenylene vinylene) |
1990 |
Synthetic metals |
39 |
25 |
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. |
Densification of thin a-C: H films grown from low-kinetic energy hydrocarbon radicals under the influence of H and C particle fluxes: a molecular dynamics study |
2006 |
Journal of physics: D: applied physics |
39 |
3 |
UA library record; WoS full record; WoS citing articles |
|
|
Trenchev, G.; Bogaerts, A. |
Dual-vortex plasmatron: A novel plasma source for CO2 conversion |
2020 |
Journal Of Co2 Utilization |
39 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Khalilov, U.; Yusupov, M.; Eshonqulov, Gb.; Neyts, Ec.; Berdiyorov, Gr. |
Atomic level mechanisms of graphene healing by methane-based plasma radicals |
2023 |
FlatChem |
39 |
|
UA library record; WoS full record |
|
|
Maeyens, A.; Tempère, J. |
How would a superconducting liquid flow in a magnetic field? |
2007 |
Europhysics news |
38 |
|
UA library record |
|
|
Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: combined Monte Carlo and fluid model |
1999 |
Japanese journal of applied physics |
38 |
45 |
UA library record; WoS full record; WoS citing articles |
|
|
Snoeckx, R.; Setareh, M.; Aerts, R.; Simon, P.; Maghari, A.; Bogaerts, A. |
Influence of N2 concentration in a CH4/N2 dielectric barrier discharge used for CH4 conversion into H2 |
2013 |
International journal of hydrogen energy |
38 |
40 |
UA library record; WoS full record; WoS citing articles |
|
|
Bekeschus, S.; Lin, A.; Fridman, A.; Wende, K.; Weltmann, K.-D.; Miller, V. |
A comparison of floating-electrode DBD and kINPen jet : plasma parameters to achieve similar growth reduction in colon cancer cells under standardized conditions |
2018 |
Plasma chemistry and plasma processing |
38 |
12 |
UA library record; WoS full record; WoS citing articles |
|
|
Pentcheva, E.N.; Swenters, K.; Van 't dack, L.; Verlinden, J.; Gijbels, R. |
Recherches microchimiques comparatives (SME et AAN) d'hydrothermes des granites de la Bulgarie du Sud |
1984 |
Doklady Bolgarskoi Akademii Nauk |
37 |
|
UA library record |
|
|
Geuens, I.; Gijbels, R.; Jacob, W.A.; Verbeeck, A.; de Keyzer, R. |
Analysis of silver halide microcrystals using different modes of a scanning transmission electron microscope and digital image processing |
1992 |
The journal of imaging science and technology |
36 |
10 |
UA library record; WoS full record; WoS citing articles |
|
|
de Bleecker, K.; Herrebout, D.; Bogaerts, A.; Gijbels, R.; Descamps, P. |
One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2 |
2003 |
Journal of physics: D: applied physics |
36 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; van de Sanden, R. |
Special Issue of Papers by Plenary and Topical Invited Lecturers at the 22nd International Symposium on Plasma Chemistry (ISPC 22), 5–10 July 2015, Antwerp, Belgium: Introduction |
2016 |
Plasma chemistry and plasma processing |
36 |
|
UA library record; WoS full record |
|
|
Neyts, E.C. |
Plasma-Surface Interactions in Plasma Catalysis |
2016 |
Plasma chemistry and plasma processing |
36 |
66 |
UA library record; WoS full record; WoS citing articles |
|
|
Clima, S.; Chen, Y.Y.; Fantini, A.; Goux, L.; Degraeve, R.; Govoreanu, B.; Pourtois, G.; Jurczak, M. |
Intrinsic tailing of resistive states distributions in amorphous <tex>HfOx </tex> and TaOx based resistive random access memories |
2015 |
IEEE electron device letters |
36 |
33 |
UA library record; WoS full record; WoS citing articles |
|