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  Author Title Year (up) Publication Volume Times cited Additional Links Links
Somers, W.; Bogaerts, A.; van Duin, A.C.T.; Neyts, E.C. Plasma species interacting with nickel surfaces : toward an atomic scale understanding of plasma-catalysis 2012 The journal of physical chemistry: C : nanomaterials and interfaces 116 37 UA library record; WoS full record; WoS citing articles pdf doi
Hardy, A.; Van Elshocht, S.; De Dobbelaere, C.; Hadermann, J.; Pourtois, G.; De Gendt, S.; Afanas'ev, V.V.; Van Bael, M.K. Properties and thermal stability of solution processed ultrathin, high-k bismuth titanate (Bi2Ti2O7) films 2012 Materials research bulletin 47 UA library record; WoS full record; WoS citing articles pdf doi
Pham, A.-T.; Sorée, B.; Magnus, W.; Jungemann, C.; Meinerzhagen, B.; Pourtois, G. Quantum simulations of electrostatics in Si cylindrical junctionless nanowire nFETs and pFETs with a homogeneous channel including strain and arbitrary crystallographic orientations 2012 Solid state electronics 71 2 UA library record; WoS full record; WoS citing articles pdf doi
Delabie, A.; Sioncke, S.; Rip, J.; Van Elshocht, S.; Pourtois, G.; Mueller, M.; Beckhoff, B.; Pierloot, K. Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates 2012 Journal of vacuum science and technology: A: vacuum surfaces and films 30 41 UA library record; WoS full record; WoS citing articles doi
Phung, Q.M.; Vancoillie, S.; Delabie, A.; Pourtois, G.; Pierloot, K. Ruthenocene and cyclopentadienyl pyrrolyl ruthenium as precursors for ruthenium atomic layer deposition : a comparative study of dissociation enthalpies 2012 Theoretical chemistry accounts : theory, computation, and modeling 131 5 UA library record; WoS full record; WoS citing articles doi
Khalilov, U.; Pourtois, G.; van Duin, A.C.T.; Neyts, E.C. Self-limiting oxidation in small-diameter Si nanowires 2012 Chemistry of materials 24 45 UA library record; WoS full record; WoS citing articles doi
Zhang, Q.-Z.; Zhao, S.-X.; Jiang, W.; Wang, Y.-N. Separate control between geometrical and electrical asymmetry effects in capacitively coupled plasmas 2012 Journal of physics: D: applied physics 45 20 UA library record; WoS full record; WoS citing articles pdf doi
Wendelen, W.; Mueller, B.Y.; Autrique, D.; Rethfeld, B.; Bogaerts, A. Space charge corrected electron emission from an aluminum surface under non-equilibrium conditions 2012 Journal of applied physics 111 30 UA library record; WoS full record; WoS citing articles pdf doi
Fei, G.; Xue-Chun, L.; Zhao, S.-X.; You-Nian, W. Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition 2012 Chinese physics B 21 11 UA library record; WoS full record; WoS citing articles pdf doi
Yusupov, M.; Saraiva, M.; Depla, D.; Bogaerts, A. Sputter deposition of MgxAlyOz thin films in a dual-magnetron device : a multi-species Monte Carlo model 2012 New journal of physics 14 2 UA library record; WoS full record; WoS citing articles url doi
Scalise, E.; Houssa, M.; Pourtois, G.; Afanas'ev, V.; Stesmans, A. Strain-induced semiconductor to metal transition in the two-dimensional honeycomb structure of MoS2 2012 Nano Research 5 407 UA library record; WoS full record; WoS citing articles pdf doi
Mees, M.J.; Pourtois, G.; Neyts, E.C.; Thijsse, B.J.; Stesmans, A. Uniform-acceptance force-bias Monte Carlo method with time scale to study solid-state diffusion 2012 Physical review : B : condensed matter and materials physics 85 31 UA library record; WoS full record; WoS citing articles url doi
Houssa, M.; van den Broek, B.; Scalise, E.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. An electric field tunable energy band gap at silicene/(0001) ZnS interfaces 2013 Physical chemistry, chemical physics 15 74 UA library record; WoS full record; WoS citing articles pdf doi
Phung, Q.M.; Vancoillie, S.; Pourtois, G.; Swerts, J.; Pierloot, K.; Delabie, A. Atomic layer deposition of ruthenium on a titanium nitride surface : a density functional theory study 2013 The journal of physical chemistry: C : nanomaterials and interfaces 117 6 UA library record; WoS full record; WoS citing articles doi
Bings, N.H.; Bogaerts, A.; Broekaert, J.A.C. Atomic spectroscopy 2013 Analytical chemistry 85 29 UA library record; WoS full record; WoS citing articles doi
Elliott, J.A.; Shibuta, Y.; Amara, H.; Bichara, C.; Neyts, E.C. Atomistic modelling of CVD synthesis of carbon nanotubes and graphene 2013 Nanoscale 5 52 UA library record; WoS full record; WoS citing articles doi
Neyts, E.C.; Bogaerts, A. Combining molecular dynamics with Monte Carlo simulations : implementations and applications 2013 Theoretical chemistry accounts : theory, computation, and modeling 132 27 UA library record; WoS full record; WoS citing articles doi
Khan, A.W.; Jan, F.; Saeed, A.; Zaka-ul-Islam, M.; Abrar, M.; Khattak, N.A.D.; Zakaullah, M. Comparative study of electron temperature and excitation temperature in a magnetic pole enhanced-inductively coupled argon plasma 2013 Current applied physics 13 13 UA library record; WoS full record; WoS citing articles doi
Neyts, E.C.; Ostrikov, K.; Han, Z.J.; Kumar, S.; van Duin, A.C.T.; Bogaerts, A. Defect healing and enhanced nucleation of carbon nanotubes by low-energy ion bombardment 2013 Physical review letters 110 50 UA library record; WoS full record; WoS citing articles url doi
Clima, S.; Kaczer, B.; Govoreanu, B.; Popovici, M.; Swerts, J.; Verhulst, A.S.; Jurczak, M.; De Gendt, S.; Pourtois, G. Determination of ultimate leakage through rutile TiO2 and tetragonal ZrO2 from ab initio complex band calculations 2013 IEEE electron device letters 34 3 UA library record; WoS full record; WoS citing articles doi
Aghaei, M.; Lindner, H.; Bogaerts, A. The effect of the sampling cone position and diameter on the gas flow dynamics in an ICP 2013 Journal of analytical atomic spectrometry 28 14 UA library record; WoS full record; WoS citing articles pdf doi
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles pdf doi
Oleshko, V.P.; Gijbels, R.; Amelinckx, S. Electron microscopy, nanoscopy, and scanning micro- and nanoanalysis 2013 UA library record
Delabie, A.; Jayachandran, S.; Caymax, M.; Loo, R.; Maggen, J.; Pourtois, G.; Douhard, B.; Conard, T.; Meersschaut, J.; Lenka, H.; Vandervorst, W.; Heyns, M.; Epitaxial chemical vapor deposition of silicon on an oxygen monolayer on Si(100) substrates 2013 ECS solid state letters 2 12 UA library record; WoS full record; WoS citing articles url doi
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. Formation of single layer graphene on nickel under far-from-equilibrium high flux conditions 2013 Nanoscale 5 25 UA library record; WoS full record; WoS citing articles pdf doi
Aerts, R.; Tu, X.; Van Gaens, W.; Whitehead, J.C.; Bogaerts, A. Gas purification by nonthermal plasma : a case study of ethylene 2013 Environmental science and technology 47 56 UA library record; WoS full record; WoS citing articles pdf doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles pdf doi
Snoeckx, R.; Setareh, M.; Aerts, R.; Simon, P.; Maghari, A.; Bogaerts, A. Influence of N2 concentration in a CH4/N2 dielectric barrier discharge used for CH4 conversion into H2 2013 International journal of hydrogen energy 38 40 UA library record; WoS full record; WoS citing articles pdf doi
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