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Author  |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Tchakoua, T.; Gerrits, N.; Smeets, E.W.F.; Kroes, G.-J. |
SBH17 : benchmark database of barrier heights for dissociative chemisorption on transition metal surfaces |
2023 |
Journal of chemical theory and computation |
19 |
|
UA library record; WoS full record; WoS citing articles |
|
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Tchakoua, T.; Powell, A.D.; Gerrits, N.; Somers, M.F.; Doblhoff-Dier, K.; Busnengo, H.F.; Kroes, G.-J. |
Simulating highly activated sticking of H₂ on Al(110) : quantum versus quasi-classical dynamics |
2023 |
The journal of physical chemistry: C : nanomaterials and interfaces |
127 |
|
UA library record; WoS full record; WoS citing articles |
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Tennyson, J.; Mohr, S.; Hanicinec, M.; Dzarasova, A.; Smith, C.; Waddington, S.; Liu, B.; Alves, L.L.; Bartschat, K.; Bogaerts, A.; Engelmann, S.U.; Gans, T.; Gibson, A.R.; Hamaguchi, S.; Hamilton, K.R.; Hill, C.; O’Connell, D.; Rauf, S.; van ’t Veer, K.; Zatsarinny, O. |
The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions |
2022 |
Plasma Sources Science & Technology |
31 |
|
UA library record; WoS full record |
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Tennyson, J.; Rahimi, S.; Hill, C.; Tse, L.; Vibhakar, A.; Akello-Egwel, D.; Brown, D.B.; Dzarasova, A.; Hamilton, J.R.; Jaksch, D.; Mohr, S.; Wren-Little, K.; Bruckmeier, J.; Agarwal, A.; Bartschat, K.; Bogaerts, A.; Booth, J.-P.; Goeckner, M.J.; Hassouni, K.; Itikawa, Y.; Braams, B.J.; Krishnakumar, E.; Laricchiuta, A.; Mason, N.J.; Pandey, S.; Petrovic, Z.L.; Pu, Y.-K.; Ranjan, A.; Rauf, S.; Schulze, J.; Turner, M.M.; Ventzek, P.; Whitehead, J.C.; Yoon, J.-S. |
QDB: a new database of plasma chemistries and reactions |
2017 |
Plasma sources science and technology |
26 |
18 |
UA library record; WoS full record; WoS citing articles |
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Teodoru, S.; Kusano, Y.; Bogaerts, A. |
The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge |
2012 |
Plasma processes and polymers |
9 |
24 |
UA library record; WoS full record; WoS citing articles |
|
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Tinck, S. |
Numerical simulations of inductively coupled plasmas for applications in the microelectronics industry |
2011 |
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UA library record |
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Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. |
Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation |
2014 |
Plasma processes and polymers |
11 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
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Tinck, S.; Bogaerts, A. |
Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry |
2016 |
Journal of physics: D: applied physics |
49 |
5 |
UA library record; WoS full record; WoS citing articles |
|
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Tinck, S.; Bogaerts, A. |
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon |
2016 |
Journal of physics: D: applied physics |
49 |
|
UA library record; WoS full record; WoS citing articles |
|
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Tinck, S.; Bogaerts, A.; Shamiryan, D. |
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma |
2011 |
Plasma processes and polymers |
8 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
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Tinck, S.; Boullart, W.; Bogaerts, A. |
Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments |
2009 |
Journal of physics: D: applied physics |
42 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
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Tinck, S.; Boullart, W.; Bogaerts, A. |
Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
31 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; De Schepper, P.; Bogaerts, A. |
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas |
2013 |
Plasma processes and polymers |
10 |
3 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Neyts, E.C.; Bogaerts, A. |
Fluorinesilicon surface reactions during cryogenic and near room temperature etching |
2014 |
The journal of physical chemistry: C : nanomaterials and interfaces |
118 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. |
Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study |
2015 |
Journal of physics: D: applied physics |
48 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
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Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. |
Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation |
2016 |
Journal of physics: D: applied physics |
49 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Tillocher, T.; Georgieva, V.; Dussart, R.; Neyts, E.; Bogaerts, A. |
Concurrent effects of wafer temperature and oxygen fraction on cryogenic silicon etching with SF6/O2plasmas |
2017 |
Plasma processes and polymers |
14 |
|
UA library record; WoS full record; WoS citing articles |
|
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Tit, N.; Al Ezzi, M.M.; Abdullah, H.M.; Yusupov, M.; Kouser, S.; Bahlouli, H.; Yamani, Z.H. |
Detection of CO2 using CNT-based sensors: Role of Fe catalyst on sensitivity and selectivity |
2017 |
Materials chemistry and physics |
186 |
17 |
UA library record; WoS full record; WoS citing articles |
|
|
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Titantah, J.T.; Lamoen, D.; Neyts, E.; Bogaerts, A. |
The effect of hydrogen on the electronic and bonding properties of amorphous carbon |
2006 |
Journal of physics : condensed matter |
18 |
13 |
UA library record; WoS full record; WoS citing articles |
|
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Torfs, E.; Vajs, J.; Bidart de Macedo, M.; Cools, F.; Vanhoutte, B.; Gorbanev, Y.; Bogaerts, A.; Verschaeve, L.; Caljon, G.; Maes, L.; Delputte, P.; Cos, P.; Komrlj, J.; Cappoen, D. |
Synthesis and in vitro investigation of halogenated 1,3-bis(4-nitrophenyl)triazenide salts as antitubercular compounds |
2017 |
Chemical biology and drug design |
|
5 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Trenchev, G. |
Computational modelling of atmospheric DC discharges for CO2 conversion |
2019 |
|
|
|
UA library record |
|
|
|
Trenchev, G.; Bogaerts, A. |
Dual-vortex plasmatron: A novel plasma source for CO2 conversion |
2020 |
Journal Of Co2 Utilization |
39 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Trenchev, G.; Kolev, S.; Bogaerts, A. |
A 3D model of a reverse vortex flow gliding arc reactor |
2016 |
Plasma sources science and technology |
25 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Trenchev, G.; Kolev, S.; Kiss’ovski, Z. |
Modeling a Langmuir probe in atmospheric pressure plasma at different EEDFs |
2017 |
Plasma sources science and technology |
26 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Trenchev, G.; Kolev, S.; Wang, W.; Ramakers, M.; Bogaerts, A. |
CO2Conversion in a Gliding Arc Plasmatron: Multidimensional Modeling for Improved Efficiency |
2017 |
The journal of physical chemistry: C : nanomaterials and interfaces |
121 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Trenchev, G.; Nikiforov, A.; Wang, W.; Kolev, S.; Bogaerts, A. |
Atmospheric pressure glow discharge for CO2 conversion : model-based exploration of the optimum reactor configuration |
2019 |
Chemical engineering journal |
362 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Truong, B.; Siegert, K.; Lin, A.; Miller, V.; Krebs, F.C. |
Apical application of nanosecond-pulsed dielectric barrier discharge plasma causes the basolateral release of adenosine triphosphate as a damage-associated molecular pattern from polarized HaCaT cells |
2017 |
Plasma medicine |
7 |
|
UA library record |
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