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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Bogaerts, A.; Khosravian, N.; Van der Paal, J.; Verlackt, C.C.W.; Yusupov, M.; Kamaraj, B.; Neyts, E.C. |
Multi-level molecular modelling for plasma medicine |
2016 |
Journal of physics: D: applied physics |
49 |
11 |
UA library record; WoS full record; WoS citing articles |
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|
Tinck, S.; Bogaerts, A. |
Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry |
2016 |
Journal of physics: D: applied physics |
49 |
5 |
UA library record; WoS full record; WoS citing articles |
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|
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Tinck, S.; Bogaerts, A. |
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon |
2016 |
Journal of physics: D: applied physics |
49 |
|
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. |
Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation |
2016 |
Journal of physics: D: applied physics |
49 |
1 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. |
Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study |
2015 |
Journal of physics: D: applied physics |
48 |
9 |
UA library record; WoS full record; WoS citing articles |
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Titantah, J.T.; Lamoen, D.; Neyts, E.; Bogaerts, A. |
The effect of hydrogen on the electronic and bonding properties of amorphous carbon |
2006 |
Journal of physics : condensed matter |
18 |
13 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in Ar/CF4 capacitively coupled plasmas |
2012 |
Journal of physics: D: applied physics |
45 |
8 |
UA library record; WoS full record; WoS citing articles |
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Gul, B.; Tinck, S.; De Schepper, P.; Aman-ur-Rehman; Bogaerts, A. |
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching |
2015 |
Journal of physics: D: applied physics |
48 |
7 |
UA library record; WoS full record; WoS citing articles |
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Van der Paal, J.; Verlackt, C.C.; Yusupov, M.; Neyts, E.C.; Bogaerts, A. |
Structural modification of the skin barrier by OH radicals : a reactive molecular dynamics study for plasma medicine |
2015 |
Journal of physics: D: applied physics |
48 |
20 |
UA library record; WoS full record; WoS citing articles |
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Michiels, R.; Engelmann, Y.; Bogaerts, A. |
Plasma Catalysis for CO2Hydrogenation: Unlocking New Pathways toward CH3OH |
2020 |
Journal Of Physical Chemistry C |
124 |
|
UA library record; WoS full record; WoS citing articles |
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Vermeiren, V.; Bogaerts, A. |
Supersonic Microwave Plasma: Potential and Limitations for Energy-Efficient CO2Conversion |
2018 |
Journal Of Physical Chemistry C |
122 |
5 |
UA library record; WoS full record; WoS citing articles |
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Aerts, R.; Martens, T.; Bogaerts, A. |
Influence of vibrational states on CO2 splitting by dielectric barrier discharges |
2012 |
The journal of physical chemistry: C : nanomaterials and interfaces |
116 |
112 |
UA library record; WoS full record; WoS citing articles |
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Trenchev, G.; Kolev, S.; Wang, W.; Ramakers, M.; Bogaerts, A. |
CO2Conversion in a Gliding Arc Plasmatron: Multidimensional Modeling for Improved Efficiency |
2017 |
The journal of physical chemistry: C : nanomaterials and interfaces |
121 |
|
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Tu, X.; Whitehead, J.C.; Centi, G.; Lefferts, L.; Guaitella, O.; Azzolina-Jury, F.; Kim, H.-H.; Murphy, A.B.; Schneider, W.F.; Nozaki, T.; Hicks, J.C.; Rousseau, A.; Thevenet, F.; Khacef, A.; Carreon, M. |
The 2020 plasma catalysis roadmap |
2020 |
Journal Of Physics D-Applied Physics |
53 |
|
UA library record; WoS full record; WoS citing articles |
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Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. |
Changing chirality during single-walled carbon nanotube growth : a reactive molecular dynamics/Monte Carlo study |
2011 |
Journal of the American Chemical Society |
133 |
116 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Y.; Jiang, W.; Bogaerts, A. |
Kinetic simulation of direct-current driven microdischarges in argon at atmospheric pressure |
2014 |
Journal of physics: D: applied physics |
47 |
10 |
UA library record; WoS full record; WoS citing articles |
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Mao, M.; Wang, Y.N.; Bogaerts, A. |
Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications |
2011 |
Journal of physics: D: applied physics |
44 |
20 |
UA library record; WoS full record; WoS citing articles |
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van ‘t Veer, K.; Engelmann, Y.; Reniers, F.; Bogaerts, A. |
Plasma-Catalytic Ammonia Synthesis in a DBD Plasma: Role of Microdischarges and Their Afterglows |
2020 |
Journal Of Physical Chemistry C |
124 |
|
UA library record; WoS full record; WoS citing articles |
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Li, S.; Sun, J.; Gorbanev, Y.; van’t Veer, K.; Loenders, B.; Yi, Y.; Kenis, T.; Chen, Q.; Bogaerts, A. |
Plasma-Assisted Dry Reforming of CH4: How Small Amounts of O2Addition Can Drastically Enhance the Oxygenate Production─Experiments and Insights from Plasma Chemical Kinetics Modeling |
2023 |
ACS Sustainable Chemistry & Engineering |
11 |
|
UA library record; WoS full record; WoS citing articles |
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Heijkers, S.; Bogaerts, A. |
CO2Conversion in a Gliding Arc Plasmatron: Elucidating the Chemistry through Kinetic Modeling |
2017 |
The journal of physical chemistry: C : nanomaterials and interfaces |
121 |
6 |
UA library record; WoS full record; WoS citing articles |
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Neyts, E.; Shibuta, Y.; Bogaerts, A. |
Bond switching regimes in nickel and nickel-carbon nanoclusters |
2010 |
Chemical physics letters |
488 |
20 |
UA library record; WoS full record; WoS citing articles |
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Georgieva, V.; Todorov, I.T.; Bogaerts, A. |
Molecular dynamics simulation of oxide thin film growth: importance of the inter-atomic interaction potential |
2010 |
Chemical physics letters |
485 |
16 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Temelkov, K.A.; Vuchkov, N.K.; Gijbels, R. |
Calculation of rate constants for asymmetric charge transfer, and their effect on relative sensitivity factors in glow discharge mass spectrometry |
2007 |
Spectrochimica acta: part B : atomic spectroscopy |
62 |
28 |
UA library record; WoS full record; WoS citing articles |
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Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Janssens, K.; van Grieken, R. |
Colloquium Spectroscopicum Internationale 34, Antwerp (Belgium), 4-9 September 2005: preface |
2006 |
Spectrochimica acta: part B : atomic spectroscopy |
61 |
2 |
UA library record; WoS full record; WoS citing articles |
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Martens, T.; Bogaerts, A.; Brok, W.J.M.; van Dijk, J. |
The dominant role of impurities in the composition of high pressure noble gas plasmas |
2008 |
Applied physics letters |
92 |
115 |
UA library record; WoS full record; WoS citing articles |
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Aghaei, M.; Lindner, H.; Bogaerts, A. |
Effect of a mass spectrometer interface on inductively coupled plasma characteristics : a computational study |
2012 |
Journal of analytical atomic spectrometry |
27 |
18 |
UA library record; WoS full record; WoS citing articles |
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Neyts, E.C.; Bogaerts, A. |
Formation of endohedral Ni@C60 and exohedral NiC60 metallofullerene complexes by simulated ion implantation |
2009 |
Carbon |
47 |
15 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Naylor, J.; Hatcher, M.; Jones, W.J.; Mason, R. |
Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment |
1998 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
16 |
12 |
UA library record; WoS full record; WoS citing articles |
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Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
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