|
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
Clima, S.; Chen, Y.Y.; Degraeve, R.; Mees, M.; Sankaran, K.; Govoreanu, B.; Jurczak, M.; De Gendt, S.; Pourtois, G. |
First-principles simulation of oxygen diffusion in HfOx : role in the resistive switching mechanism |
2012 |
Applied physics letters |
100 |
63 |
UA library record; WoS full record; WoS citing articles |
|
|
Clima, S.; Wouters, D.J.; Adelmann, C.; Schenk, T.; Schroeder, U.; Jurczak, M.; Pourtois, G. |
Identification of the ferroelectric switching process and dopant-dependent switching properties in orthorhombic HfO2 : a first principles insight |
2014 |
Applied physics letters |
104 |
79 |
UA library record; WoS full record; WoS citing articles |
|
|
Scalise, E.; Houssa, M.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. |
Inelastic electron tunneling spectroscopy of HfO2 gate stacks : a study based on first-principles modeling |
2011 |
Applied physics letters |
99 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
Martens, T.; Bogaerts, A.; Brok, W.J.M.; van Dijk, J. |
The influence of impurities on the performance of the dielectric barrier discharge |
2010 |
Applied physics letters |
96 |
28 |
UA library record; WoS full record; WoS citing articles |
|
|
Chen, Y.Y.; Pourtois, G.; Adelmann, C.; Goux, L.; Govoreanu, B.; Degreave, R.; Jurczak, M.; Kittl, J.A.; Groeseneken, G.; Wouters, D.J. |
Insights into Ni-filament formation in unipolar-switching Ni/HfO2/TiN resistive random access memory device |
2012 |
Applied physics letters |
100 |
29 |
UA library record; WoS full record; WoS citing articles |
|
|
Dumpala, S.; Broderick, S.R.; Khalilov, U.; Neyts, E.C.; van Duin, A.C.T.; Provine, J.; Howe, R.T.; Rajan, K. |
Integrated atomistic chemical imaging and reactive force field molecular dynamic simulations on silicon oxidation |
2015 |
Applied physics letters |
106 |
19 |
UA library record; WoS full record; WoS citing articles |
|
|
Wendelen, W.; Mueller, B.Y.; Autrique, D.; Bogaerts, A.; Rethfeld, B. |
Modeling ultrashort laser-induced emission from a negatively biased metal |
2013 |
Applied physics letters |
103 |
8 |
UA library record; WoS full record; WoS citing articles |
|
|
Chen, Z.; Bogaerts, A.; Vertes, A. |
Phase explosion in atmospheric pressure infrared laser ablation from water-rich targets |
2006 |
Applied physics letters |
89 |
32 |
UA library record; WoS full record; WoS citing articles |
|
|
Martens, T.; Bogaerts, A.; van Dijk, J. |
Pulse shape influence on the atmospheric barrier discharge |
2010 |
Applied physics letters |
96 |
35 |
UA library record; WoS full record; WoS citing articles |
|
|
Autrique, D.; Gornushkin, I.; Alexiades, V.; Chen, Z.; Bogaerts, A.; Rethfeld, B. |
Revisiting the interplay between ablation, collisional, and radiative processes during ns-laser ablation |
2013 |
Applied physics letters |
103 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
Wendelen, W.; Autrique, D.; Bogaerts, A. |
Space charge limited electron emission from a Cu surface under ultrashort pulsed laser irradiation |
2010 |
Applied physics letters |
96 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
Scalise, E.; Houssa, M.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. |
Structural and vibrational properties of amorphous GeO2 from first-principles |
2011 |
Applied physics letters |
98 |
226 |
UA library record; WoS full record; WoS citing articles |
|
|
Dhayalan, S.K.; Kujala, J.; Slotte, J.; Pourtois, G.; Simoen, E.; Rosseel, E.; Hikavyy, A.; Shimura, Y.; Iacovo, S.; Stesmans, A.; Loo, R.; Vandervorst, W.; |
On the manifestation of phosphorus-vacancy complexes in epitaxial Si:P films |
2016 |
Applied physics letters |
108 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
Lu, A.K.A.; Pourtois, G.; Agarwal, T.; Afzalian, A.; Radu, I.P.; Houssa, M. |
Origin of the performances degradation of two-dimensional-based metal-oxide-semiconductor field effect transistors in the sub-10 nm regime: A first-principles study |
2016 |
Applied physics letters |
108 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, Q.-Z.; Tinck, S.; de Marneffe, J.-F.; Zhang, L.; Bogaerts, A. |
Mechanisms for plasma cryogenic etching of porous materials |
2017 |
Applied physics letters |
111 |
2 |
UA library record; WoS full record; WoS citing articles |
|
|
Ghimire, B.; Szili, E.J.; Lamichhane, P.; Short, R.D.; Lim, J.S.; Attri, P.; Masur, K.; Weltmann, K.-D.; Hong, S.-H.; Choi, E.H. |
The role of UV photolysis and molecular transport in the generation of reactive species in a tissue model with a cold atmospheric pressure plasma jet |
2019 |
Applied physics letters |
114 |
12 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Centi, G. |
Plasma Technology for CO2 Conversion: A Personal Perspective on Prospects and Gaps |
2020 |
Frontiers in energy research |
8 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Tu, X.; Whitehead, J.C.; Centi, G.; Lefferts, L.; Guaitella, O.; Azzolina-Jury, F.; Kim, H.-H.; Murphy, A.B.; Schneider, W.F.; Nozaki, T.; Hicks, J.C.; Rousseau, A.; Thevenet, F.; Khacef, A.; Carreon, M. |
The 2020 plasma catalysis roadmap |
2020 |
Journal Of Physics D-Applied Physics |
53 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Heirman, P.; Verloy, R.; Baroen, J.; Privat-Maldonado, A.; Smits, E.; Bogaerts, A. |
Liquid treatment with a plasma jet surrounded by a gas shield: effect of the treated substrate and gas shield geometry on the plasma effluent conditions |
2024 |
Journal of physics: D: applied physics |
57 |
|
UA library record; WoS full record |
|
|
Adamovich, I.; Agarwal, S.; Ahedo, E.; Alves, L.L.; Baalrud, S.; Babaeva, N.; Bogaerts, A.; Bourdon, A.; Bruggeman, P.J.; Canal, C.; Choi, E.H.; Coulombe, S.; Donkó, Z.; Graves, D.B.; Hamaguchi, S.; Hegemann, D.; Hori, M.; Kim, H.-h; Kroesen, G.M.W.; Kushner, M.J.; Laricchiuta, A.; Li, X.; Magin, T.E.; Mededovic Thagard, S.; Miller, V.; Murphy, A.B.; Oehrlein, G.S.; Puac, N.; Sankaran, R.M.; Samukawa, S.; Shiratani, M.; Šimek, M.; Tarasenko, N.; Terashima, K.; Thomas Jr, E.; Trieschmann, J.; Tsikata, S.; Turner, M.M.; van der Walt, I.J.; van de Sanden, M.C.M.; von Woedtke, T. |
The 2022 Plasma Roadmap: low temperature plasma science and technology |
2022 |
Journal Of Physics D-Applied Physics |
55 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Verswyvel, H.; Deben, C.; Wouters, A.; Lardon, F.; Bogaerts, A.; Smits, E.; Lin, A. |
Phototoxicity and cell passage affect intracellular reactive oxygen species levels and sensitivity towards non-thermal plasma treatment in fluorescently-labeled cancer cells |
2023 |
Journal of physics: D: applied physics |
56 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Adriaensen, L.; Vangaever, F.; Gijbels, R. |
A comparative study of carbocyanine dyes measured with TOF-SIMS and other mass spectrometric techniques |
2004 |
Applied surface science |
231/232 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
Ignatova, V.A.; Conard, T.; Möller, W.; Vandervorst, W.; Gijbels, R. |
Depth profiling of ZrO2/SiO2/Si stacks : a TOF-SIMS and computer simulation study |
2004 |
Applied surface science |
231/232 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
de Mondt, R.; Adriaensen, L.; Vangaever, F.; Lenaerts, J.; van Vaeck, L.; Gijbels, R. |
Empirical evaluation of metal deposition for the analysis of organic compounds with static secondary ion mass spectrometry (S-SIMS) |
2006 |
Applied surface science |
252 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
van den Broek, B.; Houssa, M.; Scalise, E.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. |
First-principles electronic functionalization of silicene and germanene by adatom chemisorption |
2014 |
Applied surface science |
291 |
32 |
UA library record; WoS full record; WoS citing articles |
|
|
Lenaerts, J.; Gijbels, R.; van Vaeck, L.; Verlinden, G.; Geuens, I. |
Imaging TOF-SIMS for the surface analysis of silver halide microcrystals |
2003 |
Applied surface science |
203/204 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
de Witte, H.; Conard, T.; Vandervorst, W.; Gijbels, R. |
Ion-bombardment artifact in TOF-SIMS analysis of ZrO2/SiO2/Si stacks |
2003 |
Applied surface science |
203 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Adriaensen, L.; Vangaever, F.; Gijbels, R. |
Organic SIMS: the influence of time on the ion yield enhancement by silver and gold deposition |
2004 |
Applied surface science |
231/232 |
10 |
UA library record; WoS full record; WoS citing articles |
|
|
Adriaensen, L.; Vangaever, F.; Lenaerts, J.; Gijbels, R. |
S-SIMS and MetA-SIMS study of organic additives in thin polymer coatings |
2006 |
Applied surface science |
252 |
3 |
UA library record; WoS full record; WoS citing articles |
|
|
Houssa, M.; van den Broek, B.; Scalise, E.; Ealet, B.; Pourtois, G.; Chiappe, D.; Cinquanta, E.; Grazianetti, C.; Fanciulli, M.; Molle, A.; Afanas’ev, V.V.; Stesmans, A.; |
Theoretical aspects of graphene-like group IV semiconductors |
2014 |
Applied surface science |
291 |
20 |
UA library record; WoS full record; WoS citing articles |
|