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  Author Title Year (down) Publication Volume Times cited Additional Links Links
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A. Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) 2012 Plasma processes and polymers 9 5 UA library record; WoS full record; WoS citing articles pdf doi
Aghaei, M.; Lindner, H.; Bogaerts, A. Effect of a mass spectrometer interface on inductively coupled plasma characteristics : a computational study 2012 Journal of analytical atomic spectrometry 27 18 UA library record; WoS full record; WoS citing articles doi
Hardy, A.; Van Elshocht, S.; De Dobbelaere, C.; Hadermann, J.; Pourtois, G.; De Gendt, S.; Afanas'ev, V.V.; Van Bael, M.K. Properties and thermal stability of solution processed ultrathin, high-k bismuth titanate (Bi2Ti2O7) films 2012 Materials research bulletin 47 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 1 : transient behaviour of electrodynamics and power deposition 2012 Journal of physics: D: applied physics 45 57 UA library record; WoS full record; WoS citing articles pdf doi
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics 2012 Journal of physics: D: applied physics 45 15 UA library record; WoS full record; WoS citing articles pdf doi
Delabie, A.; Sioncke, S.; Rip, J.; Van Elshocht, S.; Pourtois, G.; Mueller, M.; Beckhoff, B.; Pierloot, K. Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates 2012 Journal of vacuum science and technology: A: vacuum surfaces and films 30 41 UA library record; WoS full record; WoS citing articles doi
Pham, A.-T.; Sorée, B.; Magnus, W.; Jungemann, C.; Meinerzhagen, B.; Pourtois, G. Quantum simulations of electrostatics in Si cylindrical junctionless nanowire nFETs and pFETs with a homogeneous channel including strain and arbitrary crystallographic orientations 2012 Solid state electronics 71 2 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. Insights in the plasma-assisted growth of carbon nanotubes through atomic scale simulations : effect of electric field 2012 Journal of the American Chemical Society 134 56 UA library record; WoS full record; WoS citing articles pdf doi
Scalise, E.; Houssa, M.; Pourtois, G.; Afanas'ev, V.; Stesmans, A. Strain-induced semiconductor to metal transition in the two-dimensional honeycomb structure of MoS2 2012 Nano Research 5 407 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.; Mao, M.; Eckert, M.; Bogaerts, A. Modeling aspects of plasma-enhanced chemical vapor deposition of carbon-based materials 2012 UA library record
Khalilov, U.; Neyts, E.C.; Pourtois, G.; van Duin, A.C.T. Can we control the thickness of ultrathin silica layers by hyperthermal silicon oxidation at room temperature? 2011 The journal of physical chemistry: C : nanomaterials and interfaces 115 36 UA library record; WoS full record; WoS citing articles doi
Mao, M.; Wang, Y.N.; Bogaerts, A. Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications 2011 Journal of physics: D: applied physics 44 20 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. Changing chirality during single-walled carbon nanotube growth : a reactive molecular dynamics/Monte Carlo study 2011 Journal of the American Chemical Society 133 116 UA library record; WoS full record; WoS citing articles pdf doi
Scalise, E.; Houssa, M.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. Inelastic electron tunneling spectroscopy of HfO2 gate stacks : a study based on first-principles modeling 2011 Applied physics letters 99 1 UA library record; WoS full record; WoS citing articles doi
Delabie, A.; Sioncke, S.; Rip, J.; van Elshocht, S.; Caymax, M.; Pourtois, G.; Pierloot, K. Mechanisms for the trimethylaluminum reaction in aluminum oxide atomic layer deposition on sulfur passivated germanium 2011 The journal of physical chemistry: C : nanomaterials and interfaces 115 9 UA library record; WoS full record; WoS citing articles doi
Pham, A.-T.; Zhao, Q.-T.; Jungemann, C.; Meinerzhagen, B.; Mantl, S.; Sorée, B.; Pourtois, G. Comparison of strained SiGe heterostructure-on-insulator (0 0 1) and (1 1 0) PMOSFETs : CV characteristics, mobility, and ON current 2011 Solid state electronics 65-66 2 UA library record; WoS full record; WoS citing articles pdf doi
Lindner, H.; Murtazin, A.; Groh, S.; Niemax, K.; Bogaerts, A. Simulation and experimental studies on plasma temperature, flow velocity, and injector diameter effects for an inductively coupled plasma 2011 Analytical chemistry 83 34 UA library record; WoS full record; WoS citing articles pdf doi
De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge 2011 Plasma processes and polymers 8 70 UA library record; WoS full record; WoS citing articles pdf doi
Wang, Y.; Yu, M.Y.; Chen, Z.Y. Coherent relativistic wake wave of a charged object moving steadily in a plasma 2011 Physica scripta 84 5 UA library record; WoS full record; WoS citing articles pdf doi
Nourbakhsh, A.; Cantoro, M.; Klekachev, A.V.; Pourtois, G.; Vosch, T.; Hofkens, J.; van der Veen, M.H.; Heyns, M.M.; de Gendt, S.; Sels, B.F. Single layer vs bilayer graphene : a comparative study of the effects of oxygen plasma treatment on their electronic and optical properties 2011 The journal of physical chemistry: C : nanomaterials and interfaces 115 46 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
Bultinck, E.; Bogaerts, A. Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model 2011 Plasma sources science and technology 20 7 UA library record; WoS full record; WoS citing articles pdf doi
Houssa, M.; Scalise, E.; Sankaran, K.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. Electronic properties of hydrogenated silicene and germanene 2011 Applied physics letters 98 63 UA library record; WoS full record; WoS citing articles doi
Scalise, E.; Houssa, M.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. Structural and vibrational properties of amorphous GeO2 from first-principles 2011 Applied physics letters 98 226 UA library record; WoS full record; WoS citing articles doi
Lindner, H.; Bogaerts, A. Multi-element model for the simulation of inductively coupled plasmas : effects of helium addition to the central gas stream 2011 Spectrochimica acta: part B : atomic spectroscopy 66 28 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Aghaei, M.; Autrique, D.; Lindner, H.; Chen, Z.; Wendelen, W. Computer simulations of laser ablation, plume expansion and plasma formation 2011 8 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Eckert, M.; Mao, M.; Neyts, E. Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials 2011 Journal of physics: D: applied physics 44 25 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Voter, A.F.; Bogaerts, A. Understanding the surface diffusion processes during magnetron sputter-deposition of complex oxide Mg-Al-O thin films 2011 Crystal growth & design 11 14 UA library record; WoS full record; WoS citing articles doi
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations 2011 Plasma sources science and technology 20 38 UA library record; WoS full record; WoS citing articles pdf doi
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