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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links  |
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de Bleecker, K.; Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Numerical investigation of particle formation mechanisms in silane discharges |
2004 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
69 |
74 |
UA library record; WoS full record; WoS citing articles |
|
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Faraji, F.; Neek-Amal, M.; Neyts, E.C.; Peeters, F.M. |
Cation-controlled permeation of charged polymers through nanocapillaries |
2023 |
Physical review E |
107 |
|
UA library record; WoS full record; WoS citing articles |
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Compemolle, S.; Pourtois, G.; Sorée, B.; Magnus, W.; Chibotaru, L.F.; Ceulemans, A. |
Conductance of a copper-nanotube bundle interface: impact of interface geometry and wave-function interference |
2008 |
Physical review : B : condensed matter and materials physics |
77 |
8 |
UA library record; WoS full record; WoS citing articles |
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Heyne, M.H.; Marinov, D.; Braithwaite, N.; Goodyear, A.; de Marneffe, J.-F.; Cooke, M.; Radu, I.; Neyts, E.C.; De Gendt, S. |
A route towards the fabrication of 2D heterostructures using atomic layer etching combined with selective conversion |
2019 |
2D materials |
6 |
|
UA library record; WoS full record; WoS citing articles |
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van den Broek, B.; Houssa, M.; Iordanidou, K.; Pourtois, G.; Afanas'ev, V.V.; Stesmans, A. |
Functional silicene and stanene nanoribbons compared to graphene: electronic structure and transport |
2016 |
2D materials |
3 |
19 |
UA library record; WoS full record; WoS citing articles |
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Fei, G.; Xue-Chun, L.; Zhao, S.-X.; You-Nian, W. |
Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition |
2012 |
Chinese physics B |
21 |
11 |
UA library record; WoS full record; WoS citing articles |
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Biondo, O.; Hughes, A.; van der Steeg, A.; Maerivoet, S.; Loenders, B.; van Rooij, G.; Bogaerts, A. |
Power concentration determined by thermodynamic properties in complex gas mixtures : the case of plasma-based dry reforming of methane |
2023 |
Plasma sources science and technology |
32 |
|
UA library record; WoS full record; WoS citing articles |
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de de Meux, A.J.; Pourtois, G.; Genoe, J.; Heremans, P. |
Origin of the apparent delocalization of the conduction band in a high-mobility amorphous semiconductor |
2017 |
Journal of physics : condensed matter |
29 |
5 |
UA library record; WoS full record; WoS citing articles |
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Wang, W.; Butterworth, T.; Bogaerts, A. |
Plasma propagation in a single bead DBD reactor at different dielectric constants : insights from fluid modelling |
2021 |
Journal Of Physics D-Applied Physics |
54 |
|
UA library record; WoS full record; WoS citing articles |
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Wang, H.; Wang, W.; Yan, J.D.; Qi, H.; Geng, J.; Wu, Y. |
Thermodynamic properties and transport coefficients of a two-temperature polytetrafluoroethylene vapor plasma for ablation-controlled discharge applications |
2017 |
Journal of physics: D: applied physics |
50 |
3 |
UA library record; WoS full record; WoS citing articles |
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Saeed, A.; Khan, A.W.; Shafiq, M.; Jan, F.; Abrar, M.; Zaka-ul-Islam, M.; Zakaullah, M. |
Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy |
2014 |
Plasma science & technology |
16 |
5 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
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Kozák, T.; Bogaerts, A. |
Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model |
2014 |
Plasma sources science and technology |
23 |
170 |
UA library record; WoS full record; WoS citing articles |
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Van Gaens, W.; Bogaerts, A. |
Reaction pathways of biomedically active species in an Ar plasma jet |
2014 |
Plasma sources science and technology |
23 |
34 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
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Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. |
Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges |
2013 |
Plasma sources science and technology |
22 |
20 |
UA library record; WoS full record; WoS citing articles |
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Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
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Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
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Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
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Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
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De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
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Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. |
Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges |
2010 |
Plasma sources science and technology |
19 |
116 |
UA library record; WoS full record; WoS citing articles |
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Georgieva, V.; Bogaerts, A. |
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model |
2006 |
Plasma sources science and technology |
15 |
35 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
|
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Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
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Dabaghmanesh, S.; Saniz, R.; Amini, M.N.; Lamoen, D.; Partoens, B. |
Perovskite transparent conducting oxides : an ab initio study |
2013 |
Journal of physics : condensed matter |
25 |
17 |
UA library record; WoS full record; WoS citing articles |
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Titantah, J.T.; Lamoen, D.; Neyts, E.; Bogaerts, A. |
The effect of hydrogen on the electronic and bonding properties of amorphous carbon |
2006 |
Journal of physics : condensed matter |
18 |
13 |
UA library record; WoS full record; WoS citing articles |
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