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Author |
Title |
Year |
Publication  |
Volume |
Times cited |
Additional Links |
Links |
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Bogaerts, A.; Neyts, E.C.; Rousseau, A. |
Special issue on fundamentals of plasmasurface interactions |
2014 |
Journal of physics: D: applied physics |
47 |
2 |
UA library record; WoS full record; WoS citing articles |
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Georgieva, V.; Saraiva, M.; Jehanathan, N.; Lebelev, O.I.; Depla, D.; Bogaerts, A. |
Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments |
2009 |
Journal of physics: D: applied physics |
42 |
37 |
UA library record; WoS full record; WoS citing articles |
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Van der Paal, J.; Verlackt, C.C.; Yusupov, M.; Neyts, E.C.; Bogaerts, A. |
Structural modification of the skin barrier by OH radicals : a reactive molecular dynamics study for plasma medicine |
2015 |
Journal of physics: D: applied physics |
48 |
20 |
UA library record; WoS full record; WoS citing articles |
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Setareh, M.; Farnia, M.; Maghari, A.; Bogaerts, A. |
CF4 decomposition in a low-pressure ICP : influence of applied power and O2 content |
2014 |
Journal of physics: D: applied physics |
47 |
8 |
UA library record; WoS full record; WoS citing articles |
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Neyts, E.C.; Bogaerts, A. |
Understanding plasma catalysis through modelling and simulation : a review |
2014 |
Journal of physics: D: applied physics |
47 |
130 |
UA library record; WoS full record; WoS citing articles |
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Dufour, T.; Minnebo, J.; Abou Rich, S.; Neyts, E.C.; Bogaerts, A.; Reniers, F. |
Understanding polyethylene surface functionalization by an atmospheric He/O2 plasma through combined experiments and simulations |
2014 |
Journal of physics: D: applied physics |
47 |
13 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Khosravian, N.; Van der Paal, J.; Verlackt, C.C.W.; Yusupov, M.; Kamaraj, B.; Neyts, E.C. |
Multi-level molecular modelling for plasma medicine |
2016 |
Journal of physics: D: applied physics |
49 |
11 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Bogaerts, A. |
Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry |
2016 |
Journal of physics: D: applied physics |
49 |
5 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Bogaerts, A. |
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon |
2016 |
Journal of physics: D: applied physics |
49 |
|
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. |
Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation |
2016 |
Journal of physics: D: applied physics |
49 |
1 |
UA library record; WoS full record; WoS citing articles |
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Ozkan, A.; Bogaerts, A.; Reniers, F. |
Routes to increase the conversion and the energy efficiency in the splitting of CO2by a dielectric barrier discharge |
2017 |
Journal of physics: D: applied physics |
50 |
28 |
UA library record; WoS full record; WoS citing articles |
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Verlackt, C.C.W.; Neyts, E.C.; Bogaerts, A. |
Atomic scale behavior of oxygen-based radicals in water |
2017 |
Journal of physics: D: applied physics |
50 |
11 |
UA library record; WoS full record; WoS citing articles |
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Khalilov, U.; Bogaerts, A.; Hussain, S.; Kovacevic, E.; Brault, P.; Boulmer-Leborgne, C.; Neyts, E.C. |
Nanoscale mechanisms of CNT growth and etching in plasma environment |
2017 |
Journal of physics: D: applied physics |
50 |
6 |
UA library record; WoS full record; WoS citing articles |
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Adamovich, I.; Baalrud, S.D.; Bogaerts, A.; Bruggeman, P.J.; Cappelli, M.; Colombo, V.; Czarnetzki, U.; Ebert, U.; Eden, J.G.; Favia, P.; Graves, D.B.; Hamaguchi, S.; Hieftje, G.; Hori, M.; Kaganovich, I.D.; Kortshagen, U.; Kushner, M.J.; Mason, N.J.; Mazouffre, S.; Thagard, S.M.; Metelmann, H.-R.; Mizuno, A.; Moreau, E.; Murphy, A.B.; Niemira, B.A.; Oehrlein, G.S.; Petrovic, Z.L.; Pitchford, L.C.; Pu, Y.-K.; Rauf, S.; Sakai, O.; Samukawa, S.; Starikovskaia, S.; Tennyson, J.; Terashima, K.; Turner, M.M.; van de Sanden, M.C.M.; Vardelle, A. |
The 2017 Plasma Roadmap: Low temperature plasma science and technology |
2017 |
Journal of physics: D: applied physics |
50 |
246 |
UA library record; WoS full record; WoS citing articles |
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Yusupov, M.; Yan, D.; Cordeiro, R.M.; Bogaerts, A. |
Atomic scale simulation of H2O2permeation through aquaporin: toward the understanding of plasma cancer treatment |
2018 |
Journal of physics: D: applied physics |
51 |
7 |
UA library record; WoS full record; WoS citing articles |
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Wang, W.; Berthelot, A.; Zhang, Q.; Bogaerts, A. |
Modelling of plasma-based dry reforming: how do uncertainties in the input data affect the calculation results? |
2018 |
Journal of physics: D: applied physics |
51 |
7 |
UA library record; WoS full record; WoS citing articles |
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Kumar, N.; Attri, P.; Dewilde, S.; Bogaerts, A. |
Inactivation of human pancreatic ductal adenocarcinoma with atmospheric plasma treated media and water: a comparative study |
2018 |
Journal of physics: D: applied physics |
51 |
6 |
UA library record; WoS full record; WoS citing articles |
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Razzokov, J.; Yusupov, M.; Cordeiro, R.M.; Bogaerts, A. |
Atomic scale understanding of the permeation of plasma species across native and oxidized membranes |
2018 |
Journal of physics: D: applied physics |
51 |
10 |
UA library record; WoS full record; WoS citing articles |
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Gröger, S.; Ramakers, M.; Hamme, M.; Medrano, J.A.; Bibinov, N.; Gallucci, F.; Bogaerts, A.; Awakowicz, P. |
Characterization of a nitrogen gliding arc plasmatron using optical emission spectroscopy and high-speed camera |
2019 |
Journal of physics: D: applied physics |
52 |
7 |
UA library record; WoS full record; WoS citing articles |
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Verswyvel, H.; Deben, C.; Wouters, A.; Lardon, F.; Bogaerts, A.; Smits, E.; Lin, A. |
Phototoxicity and cell passage affect intracellular reactive oxygen species levels and sensitivity towards non-thermal plasma treatment in fluorescently-labeled cancer cells |
2023 |
Journal of physics: D: applied physics |
56 |
|
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Modeling of radio-frequency and direct current glow discharges in argon |
2000 |
Journal of technical physics |
41 |
|
UA library record |
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Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. |
Changing chirality during single-walled carbon nanotube growth : a reactive molecular dynamics/Monte Carlo study |
2011 |
Journal of the American Chemical Society |
133 |
116 |
UA library record; WoS full record; WoS citing articles |
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Neyts, E.C.; van Duin, A.C.T.; Bogaerts, A. |
Insights in the plasma-assisted growth of carbon nanotubes through atomic scale simulations : effect of electric field |
2012 |
Journal of the American Chemical Society |
134 |
56 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis |
1997 |
Journal of the American Society of Mass Spectrometry |
8 |
15 |
UA library record; WoS full record; WoS citing articles |
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Liu, Y.-X.; Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. |
Electromagnetic effects in high-frequency large-area capacitive discharges : a review |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
10 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Y.-R.; Gao, F.; Li, X.-C.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the bias effect in inductive/capacitive discharges |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
9 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Naylor, J.; Hatcher, M.; Jones, W.J.; Mason, R. |
Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment |
1998 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
16 |
12 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. |
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
3 |
UA library record; WoS full record; WoS citing articles |
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Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
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Kolev, I.; Bogaerts, A. |
Numerical study of the sputtering in a dc magnetron |
2009 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
27 |
66 |
UA library record; WoS full record; WoS citing articles |
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