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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links  |
Links |
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|
Bal, K.M.; Huygh, S.; Bogaerts, A.; Neyts, E.C. |
Effect of plasma-induced surface charging on catalytic processes: application to CO2activation |
2018 |
Plasma sources science and technology |
27 |
19 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Alves, L.L.; Bogaerts, A.; Guerra, V.; Turner, M.M. |
Foundations of modelling of nonequilibrium low-temperature plasmas |
2018 |
Plasma sources science and technology |
27 |
17 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Q.-Z.; Bogaerts, A. |
Propagation of a plasma streamer in catalyst pores |
2018 |
Plasma sources science and technology |
27 |
16 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Y.-R.; Neyts, E.C.; Bogaerts, A. |
Enhancement of plasma generation in catalyst pores with different shapes |
2018 |
Plasma sources science and technology |
27 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Q.-Z.; Wang, W.-Z.; Bogaerts, A. |
Importance of surface charging during plasma streamer propagation in catalyst pores |
2018 |
Plasma sources science and technology |
27 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Wang, L.; Wen, D.-Q.; Zhang, Q.-Z.; Song, Y.-H.; Zhang, Y.-R.; Wang, Y.-N. |
Disruption of self-organized striated structure induced by secondary electron emission in capacitive oxygen discharges |
2019 |
Plasma sources science and technology |
28 |
2 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Biondo, O.; Hughes, A.; van der Steeg, A.; Maerivoet, S.; Loenders, B.; van Rooij, G.; Bogaerts, A. |
Power concentration determined by thermodynamic properties in complex gas mixtures : the case of plasma-based dry reforming of methane |
2023 |
Plasma sources science and technology |
32 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Vanraes, P.; Parayil Venugopalan, S.; Besemer, M.; Bogaerts, A. |
Assessing neutral transport mechanisms in aspect ratio dependent etching by means of experiments and multiscale plasma modeling |
2023 |
Plasma Sources Science and Technology |
32 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Bissonnette-Dulude, J.; Heirman, P.; Coulombe, S.; Bogaerts, A.; Gervais, T.; Reuter, S. |
Coupling the COST reference plasma jet to a microfluidic device: a computational study |
2024 |
Plasma Sources Science and Technology |
33 |
|
UA library record; WoS full record |
|
|
|
Smith, G.J.; Diomede, P.; Gibson, A.R.; Doyle, S.J.; Guerra, V.; Kushner, M.J.; Gans, T.; Dedrick, J.P. |
Low-pressure inductively coupled plasmas in hydrogen : impact of gas heating on the spatial distribution of atomic hydrogen and vibrationally excited states |
2024 |
Plasma sources science and technology |
33 |
|
UA library record; WoS full record |
|
|
|
Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Georgieva, V.; Bogaerts, A. |
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model |
2006 |
Plasma sources science and technology |
15 |
35 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. |
Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges |
2010 |
Plasma sources science and technology |
19 |
116 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
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