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Author Title (down) Year Publication Volume Times cited Additional Links
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. Densification of thin a-C: H films grown from low-kinetic energy hydrocarbon radicals under the influence of H and C particle fluxes: a molecular dynamics study 2006 Journal of physics: D: applied physics 39 3 UA library record; WoS full record; WoS citing articles
Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study 2015 Journal of physics: D: applied physics 48 9 UA library record; WoS full record; WoS citing articles
Leliaert, J.; Gypens, P.; Milošević, M.V.; Van Waeyenberge, B.; Mulkers, J. Coupling of the skyrmion velocity to its breathing mode in periodically notched nanotracks 2019 Journal of physics: D: applied physics 52 10 UA library record; WoS full record; WoS citing articles
Neyts, E.C.; Yusupov, M.; Verlackt, C.C.; Bogaerts, A. Computer simulations of plasmabiomolecule and plasmatissue interactions for a better insight in plasma medicine 2014 Journal of physics: D: applied physics 47 28 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Eckert, M.; Mao, M.; Neyts, E. Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials 2011 Journal of physics: D: applied physics 44 25 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Bultinck, E.; Kolev, I.; Schwaederlé, L.; van Aeken, K.; Buyle, G.; Depla, D. Computer modelling of magnetron discharges 2009 Journal of physics: D: applied physics 42 32 UA library record; WoS full record; WoS citing articles
Tinck, S.; Bogaerts, A. Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry 2016 Journal of physics: D: applied physics 49 5 UA library record; WoS full record; WoS citing articles
de de Meux, A.J.; Pourtois, G.; Genoe, J.; Heremans, P. Comparison of the electronic structure of amorphous versus crystalline indium gallium zinc oxide semiconductor : structure, tail states and strain effects 2015 Journal of physics: D: applied physics 48 23 UA library record; WoS full record; WoS citing articles
Song, C.-H.; Attri, P.; Ku, S.-K.; Han, I.; Bogaerts, A.; Choi, E.H. Cocktail of reactive species generated by cold atmospheric plasma: oral administration induces non-small cell lung cancer cell death 2021 Journal Of Physics D-Applied Physics 54 UA library record; WoS full record; WoS citing articles
Gröger, S.; Ramakers, M.; Hamme, M.; Medrano, J.A.; Bibinov, N.; Gallucci, F.; Bogaerts, A.; Awakowicz, P. Characterization of a nitrogen gliding arc plasmatron using optical emission spectroscopy and high-speed camera 2019 Journal of physics: D: applied physics 52 7 UA library record; WoS full record; WoS citing articles
Setareh, M.; Farnia, M.; Maghari, A.; Bogaerts, A. CF4 decomposition in a low-pressure ICP : influence of applied power and O2 content 2014 Journal of physics: D: applied physics 47 8 UA library record; WoS full record; WoS citing articles
Razzokov, J.; Yusupov, M.; Cordeiro, R.M.; Bogaerts, A. Atomic scale understanding of the permeation of plasma species across native and oxidized membranes 2018 Journal of physics: D: applied physics 51 10 UA library record; WoS full record; WoS citing articles
Yusupov, M.; Yan, D.; Cordeiro, R.M.; Bogaerts, A. Atomic scale simulation of H2O2permeation through aquaporin: toward the understanding of plasma cancer treatment 2018 Journal of physics: D: applied physics 51 7 UA library record; WoS full record; WoS citing articles
Verlackt, C.C.W.; Neyts, E.C.; Bogaerts, A. Atomic scale behavior of oxygen-based radicals in water 2017 Journal of physics: D: applied physics 50 11 UA library record; WoS full record; WoS citing articles
Lawson, N.C.; Janyavula, S.; Çakir, D.; Burgess, J.O. An analysis of the physiologic parameters of intraoral wear: a review 2013 Journal Of Physics D-Applied Physics 46 UA library record; WoS full record; WoS citing articles
Kozák, T.; Vlček, J. A parametric model for reactive high-power impulse magnetron sputtering of films 2016 Journal Of Physics D-Applied Physics 49 25