|
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
Zhang, Q.-Z.; Wang, W.-Z.; Bogaerts, A. |
Importance of surface charging during plasma streamer propagation in catalyst pores |
2018 |
Plasma sources science and technology |
27 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
Wardenier, N.; Vanraes, P.; Nikiforov, A.; Van Hulle, S.W.H.; Leys, C. |
Removal of micropollutants from water in a continuous-flow electrical discharge reactor |
2019 |
Journal of hazardous materials |
362 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
Martin, J.M.L.; Taylor, P.R.; François, J.P.; Gijbels, R. |
Ab initio study of the spectroscopy, kinetics, and thermochemistry of the BN2 molecule |
1994 |
Chemical physics letters |
222 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Wilken, L.; Hoffmann, V.; Gijbels, R.; Wetzig, K. |
Comparison of modeling calculations with experimental results for rf glow discharge optical emission spectrometry |
2002 |
Spectrochimica acta: part B : atomic spectroscopy |
57 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Verscharen, W.; Steers, E. |
Computer simulations of crater profiles in glow discharge optical emission spectrometry: comparison with experiments and investigation of the underlying mechanisms |
2004 |
Spectrochimica acta: part B : atomic spectroscopy |
59 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Aghaei, M.; Lindner, H.; Bogaerts, A. |
The effect of the sampling cone position and diameter on the gas flow dynamics in an ICP |
2013 |
Journal of analytical atomic spectrometry |
28 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
de Witte, H.; de Gendt, S.; Douglas, M.; Conard, T.; Kenis, K.; Mertens, P.W.; Vandervorst, W.; Gijbels, R. |
Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on wafer surfaces |
2000 |
Journal of the electrochemical society |
147 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Vande Velde, C.; Bultinck, E.; Tersago, K.; van Alsenoy, C.; Blockhuys, F. |
From anisole to 1,2,4,5-tetramethoxybenzene: theoretical study of the factors that determine the conformation of methoxy groups on a benzene ring |
2007 |
International journal of quantum chemistry |
107 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Chen, Z.; Gijbels, R. |
Glow discharge modelling: from basic understanding towards applications |
2003 |
Surface and interface analysis |
35 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
van Grieken, R.; Gijbels, R.; Speecke, A.; Hoste, J. |
Internal standard activation analysis of silicon in steel |
1968 |
Analytica chimica acta |
43 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.; Eckert, M.; Bogaerts, A. |
Molecular dynamics simulations of the growth of thin a-C:H films under additional ion bombardment: influence of the growth species and the Ar+ ion kinetic energy |
2007 |
Chemical vapor deposition |
13 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.C.; Ostrikov, K.(K.) |
Nanoscale thermodynamic aspects of plasma catalysis |
2015 |
Catalysis today |
256 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Shariat, M.; Shokri, B.; Neyts, E.C. |
On the low-temperature growth mechanism of single walled carbon nanotubes in plasma enhanced chemical vapor deposition |
2013 |
Chemical physics letters |
590 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Yan, M.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J. |
Spatial behavior of energy relaxation of electrons in capacitively coupled discharges: comparison between Ar and SiH4 |
2000 |
Journal of applied physics |
87 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Baguer, N.; Neyts, E.; van Gils, S.; Bogaerts, A. |
Study of atmospheric MOCVD of TiO2 thin films by means of computational fluid dynamics simulations |
2008 |
Chemical vapor deposition |
14 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Georgieva, V.; Voter, A.F.; Bogaerts, A. |
Understanding the surface diffusion processes during magnetron sputter-deposition of complex oxide Mg-Al-O thin films |
2011 |
Crystal growth & design |
11 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Aghaei, M. |
Inductively coupled plasma-mass spectrometry: insights through computer modeling |
2017 |
Journal of analytical atomic spectrometry |
32 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
Gorbanev, Y.; Vervloessem, E.; Nikiforov, A.; Bogaerts, A. |
Nitrogen fixation with water vapor by nonequilibrium plasma : toward sustainable ammonia production |
2020 |
Acs Sustainable Chemistry & Engineering |
8 |
14 |
UA library record; WoS full record; WoS citing articles |
|
|
van der Linden, V.; Bultinck, E.; de Ruytter, J.; Schalm, O.; Janssens, K.; Devos, W.; Tiri, W. |
Compositional analysis of 17-18th century archaeological glass fragments, excavated in Mechelen, Belgium: comparison with data from neighboring cities in the Low Countries |
2005 |
Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms |
239 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Huygh, S.; Bogaerts, A.; van Duin, A.C.T.; Neyts, E.C. |
Development of a ReaxFF reactive force field for intrinsic point defects in titanium dioxide |
2014 |
Computational materials science |
95 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics |
2012 |
Journal of physics: D: applied physics |
45 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.C.; Bogaerts, A. |
Formation of endohedral Ni@C60 and exohedral NiC60 metallofullerene complexes by simulated ion implantation |
2009 |
Carbon |
47 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
de Witte, H.; Conard, T.; Vandervorst, W.; Gijbels, R. |
Ion-bombardment artifact in TOF-SIMS analysis of ZrO2/SiO2/Si stacks |
2003 |
Applied surface science |
203 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Eckert, M.; Neyts, E.; Bogaerts, A. |
Modeling adatom surface processes during crystal growth: a new implementation of the Metropolis Monte Carlo algorithm |
2009 |
CrystEngComm |
11 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Gijbels, R. |
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis |
1997 |
Journal of the American Society of Mass Spectrometry |
8 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Gou, F.; Neyts, E.; Eckert, M.; Tinck, S.; Bogaerts, A. |
Molecular dynamics simulations of Cl+ etching on a Si(100) surface |
2010 |
Journal of applied physics |
107 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Scarrozza, M.; Pourtois, G.; Houssa, M.; Heyns, M.; Stesmans, A. |
Oxidation of the GaAs(001) surface : insights from first-principles calculations |
2012 |
Physical review : B : condensed matter and materials physics |
85 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.; Yan, M.; Bogaerts, A.; Gijbels, R. |
Particle-in-cell/Monte Carlo simulations of a low-pressure capacitively coupled radio-frequency discharge: effect of adding H2 to an Ar discharge |
2003 |
Journal of applied physics |
93 |
15 |
UA library record; WoS full record; WoS citing articles |
|