Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Ruelle, B.; Felten, A.; Ghijsen, J.; Drube, W.; Johnson, R.L.; Liang, D.; Erni, R.; Van Tendeloo, G.; Dubois, P.; Hecq, M.; Bittencourt, C.; |
Functionalization of MWCNTs with atomic nitrogen : electronic structure |
2008 |
Journal of physics: D: applied physics |
41 |
16 |
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
The origin of Bohm diffusion, investigated by a comparison of different modelling methods |
2010 |
Journal of physics: D: applied physics |
43 |
16 |
UA library record; WoS full record; WoS citing articles |
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics |
2012 |
Journal of physics: D: applied physics |
45 |
15 |
UA library record; WoS full record; WoS citing articles |
Rubino, S.; Schattschneider, P.; Rusz, J.; Verbeeck, J.; Leifer, K. |
Simulation of magnetic circular dichroism in the electron microscope |
2010 |
Journal of physics: D: applied physics |
43 |
13 |
UA library record; WoS full record; WoS citing articles |
Dufour, T.; Minnebo, J.; Abou Rich, S.; Neyts, E.C.; Bogaerts, A.; Reniers, F. |
Understanding polyethylene surface functionalization by an atmospheric He/O2 plasma through combined experiments and simulations |
2014 |
Journal of physics: D: applied physics |
47 |
13 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Khosravian, N.; Van der Paal, J.; Verlackt, C.C.W.; Yusupov, M.; Kamaraj, B.; Neyts, E.C. |
Multi-level molecular modelling for plasma medicine |
2016 |
Journal of physics: D: applied physics |
49 |
11 |
UA library record; WoS full record; WoS citing articles |
Verlackt, C.C.W.; Neyts, E.C.; Bogaerts, A. |
Atomic scale behavior of oxygen-based radicals in water |
2017 |
Journal of physics: D: applied physics |
50 |
11 |
UA library record; WoS full record; WoS citing articles |
Zhang, Y.; Jiang, W.; Bogaerts, A. |
Kinetic simulation of direct-current driven microdischarges in argon at atmospheric pressure |
2014 |
Journal of physics: D: applied physics |
47 |
10 |
UA library record; WoS full record; WoS citing articles |
Ghica, C.; Nistor, L.C.; Bender, H.; Richard, O.; Van Tendeloo, G.; Ulyashin, A. |
TEM characterization of extended defects induced in Si wafers by H-plasma treatment |
2007 |
Journal of physics: D: applied physics |
40 |
10 |
UA library record; WoS full record; WoS citing articles |
Razzokov, J.; Yusupov, M.; Cordeiro, R.M.; Bogaerts, A. |
Atomic scale understanding of the permeation of plasma species across native and oxidized membranes |
2018 |
Journal of physics: D: applied physics |
51 |
10 |
UA library record; WoS full record; WoS citing articles |
Leliaert, J.; Gypens, P.; Milošević, M.V.; Van Waeyenberge, B.; Mulkers, J. |
Coupling of the skyrmion velocity to its breathing mode in periodically notched nanotracks |
2019 |
Journal of physics: D: applied physics |
52 |
10 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. |
Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study |
2015 |
Journal of physics: D: applied physics |
48 |
9 |
UA library record; WoS full record; WoS citing articles |
Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in Ar/CF4 capacitively coupled plasmas |
2012 |
Journal of physics: D: applied physics |
45 |
8 |
UA library record; WoS full record; WoS citing articles |
Setareh, M.; Farnia, M.; Maghari, A.; Bogaerts, A. |
CF4 decomposition in a low-pressure ICP : influence of applied power and O2 content |
2014 |
Journal of physics: D: applied physics |
47 |
8 |
UA library record; WoS full record; WoS citing articles |
Kong, L.; Wang, W.; Murphy, A.B.; Xia, G. |
Numerical analysis of direct-current microdischarge for space propulsion applications using the particle-in-cell/Monte Carlo collision (PIC/MCC) method |
2017 |
Journal of physics: D: applied physics |
50 |
8 |
UA library record; WoS full record; WoS citing articles |
Gul, B.; Tinck, S.; De Schepper, P.; Aman-ur-Rehman; Bogaerts, A. |
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching |
2015 |
Journal of physics: D: applied physics |
48 |
7 |
UA library record; WoS full record; WoS citing articles |
Yusupov, M.; Yan, D.; Cordeiro, R.M.; Bogaerts, A. |
Atomic scale simulation of H2O2permeation through aquaporin: toward the understanding of plasma cancer treatment |
2018 |
Journal of physics: D: applied physics |
51 |
7 |
UA library record; WoS full record; WoS citing articles |
Wang, W.; Berthelot, A.; Zhang, Q.; Bogaerts, A. |
Modelling of plasma-based dry reforming: how do uncertainties in the input data affect the calculation results? |
2018 |
Journal of physics: D: applied physics |
51 |
7 |
UA library record; WoS full record; WoS citing articles |
Gröger, S.; Ramakers, M.; Hamme, M.; Medrano, J.A.; Bibinov, N.; Gallucci, F.; Bogaerts, A.; Awakowicz, P. |
Characterization of a nitrogen gliding arc plasmatron using optical emission spectroscopy and high-speed camera |
2019 |
Journal of physics: D: applied physics |
52 |
7 |
UA library record; WoS full record; WoS citing articles |
Khalilov, U.; Bogaerts, A.; Hussain, S.; Kovacevic, E.; Brault, P.; Boulmer-Leborgne, C.; Neyts, E.C. |
Nanoscale mechanisms of CNT growth and etching in plasma environment |
2017 |
Journal of physics: D: applied physics |
50 |
6 |
UA library record; WoS full record; WoS citing articles |
Kumar, N.; Attri, P.; Dewilde, S.; Bogaerts, A. |
Inactivation of human pancreatic ductal adenocarcinoma with atmospheric plasma treated media and water: a comparative study |
2018 |
Journal of physics: D: applied physics |
51 |
6 |
UA library record; WoS full record; WoS citing articles |
Khalili, M.; Daniels, L.; Lin, A.; Krebs, F.C.; Snook, A.E.; Bekeschus, S.; Bownel, W.B.; Miller, V. |
Non-thermal plasma-induced immunogenic cell death in cancer |
2019 |
Journal of physics: D: applied physics |
52 |
6 |
UA library record; WoS full record; WoS citing articles |
Wang, H.; Cuppens, J.; Biermans, E.; Bals, S.; Fernandez-Ballester, L.; Kvashnina, K.O.; Bras, W.; van Bael, M.J.; Temst, K.; Vantomme, A. |
Tuning of the size and the lattice parameter of ion-beam synthesized Pb nanoparticles embedded in Si |
2012 |
Journal of physics: D: applied physics |
45 |
5 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry |
2016 |
Journal of physics: D: applied physics |
49 |
5 |
UA library record; WoS full record; WoS citing articles |
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. |
Densification of thin a-C: H films grown from low-kinetic energy hydrocarbon radicals under the influence of H and C particle fluxes: a molecular dynamics study |
2006 |
Journal of physics: D: applied physics |
39 |
3 |
UA library record; WoS full record; WoS citing articles |
Wang, H.; Wang, W.; Yan, J.D.; Qi, H.; Geng, J.; Wu, Y. |
Thermodynamic properties and transport coefficients of a two-temperature polytetrafluoroethylene vapor plasma for ablation-controlled discharge applications |
2017 |
Journal of physics: D: applied physics |
50 |
3 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Neyts, E.C.; Rousseau, A. |
Special issue on fundamentals of plasmasurface interactions |
2014 |
Journal of physics: D: applied physics |
47 |
2 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. |
Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation |
2016 |
Journal of physics: D: applied physics |
49 |
1 |
UA library record; WoS full record; WoS citing articles |
de Bleecker, K.; Herrebout, D.; Bogaerts, A.; Gijbels, R.; Descamps, P. |
One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2 |
2003 |
Journal of physics: D: applied physics |
36 |
|
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon |
2016 |
Journal of physics: D: applied physics |
49 |
|
UA library record; WoS full record; WoS citing articles |