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Bahnamiri OS, Verheyen C, Snyders R, Bogaerts A, Britun N (2021) Nitrogen fixation in pulsed microwave discharge studied by infrared absorption combined with modelling. 065007
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Low-Temperature Plasma for Biology, Hygiene, and Medicine: Perspective and Roadmap”. Laroussi M, Bekeschus S, Keidar M, Bogaerts A, Fridman A, Lu X, Ostrikov K, Hori M, Stapelmann K, Miller V, Reuter S, Laux C, Mesbah A, Walsh J, Jiang C, Thagard SM, Tanaka H, Liu D, Yan D, Yusupov M, IEEE transactions on radiation and plasma medical sciences 6, 127 (2022). http://doi.org/10.1109/TRPMS.2021.3135118
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Dry reforming of methane in a nanosecond repetitively pulsed discharge: chemical kinetics modeling”. Zhang L, Heijkers S, Wang W, Martini LM, Tosi P, Yang D, Fang Z, Bogaerts A, Plasma Sources Science &, Technology 31, 055014 (2022). http://doi.org/10.1088/1361-6595/ac6bbc
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Foundations of plasma catalysis for environmental applications”. Bogaerts A, Neyts EC, Guaitella O, Murphy AB, Plasma Sources Science &, Technology (2022). http://doi.org/10.1088/1361-6595/ac5f8e
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Coupling the COST reference plasma jet to a microfluidic device: a computational study”. Bissonnette-Dulude J, Heirman P, Coulombe S, Bogaerts A, Gervais T, Reuter S, Plasma sources science and technology 33, 015001 (2024). http://doi.org/10.1088/1361-6595/ad1421
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Insights into the limitations to vibrational excitation of CO2: validation of a kinetic model with pulsed glow discharge experiments”. Biondo O, Fromentin C, Silva T, Guerra V, van Rooij G, Bogaerts A, Plasma Sources Science &, Technology 31, 074003 (2022). http://doi.org/10.1088/1361-6595/ac8019
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Molecular understanding of the possible mechanisms of oligosaccharide oxidation by cold plasma”. Yusupov M, Dewaele D, Attri P, Khalilov U, Sobott F, Bogaerts A, Plasma processes and polymers (2022). http://doi.org/10.1002/ppap.202200137
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The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions”. Tennyson J, Mohr S, Hanicinec M, Dzarasova A, Smith C, Waddington S, Liu B, Alves LL, Bartschat K, Bogaerts A, Engelmann SU, Gans T, Gibson AR, Hamaguchi S, Hamilton KR, Hill C, O’Connell D, Rauf S, van ’t Veer K, Zatsarinny O, Plasma Sources Science &, Technology 31, 095020 (2022). http://doi.org/10.1088/1361-6595/ac907e
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Simulation of glow and arc discharges in nitrogen: effects of the cathode emission mechanisms”. Tsonev I, Boothroyd J, Kolev S, Bogaerts A, PLASMA SOURCES SCIENCE &, TECHNOLOGY 32, 054002 (2023). http://doi.org/10.1088/1361-6595/acc96c
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Assessing neutral transport mechanisms in aspect ratio dependent etching by means of experiments and multiscale plasma modeling”. Vanraes P, Parayil Venugopalan S, Besemer M, Bogaerts A, Plasma Sources Science and Technology 32, 064004 (2023). http://doi.org/10.1088/1361-6595/acdc4f
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Plasma‐treated liquids in medicine: Let's get chemical”. Tampieri F, Gorbanev Y, Sardella E, Plasma Processes and Polymers 20, e2300077 (2023). http://doi.org/10.1002/ppap.202300077
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Modelling the dynamics of hydrogen synthesis from methane in nanosecond‐pulsed plasmas”. Morais E, Bogaerts A, Plasma processes and polymers 21 (2024). http://doi.org/10.1002/ppap.202300149
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Plasmonic effects in the neutralization of slow ions at a metallic surface”. Bercx M, Mayda S, Depla D, Partoens B, Lamoen D, Contributions to Plasma Physics (2023). http://doi.org/10.1002/ctpp.202300054
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Special Issue on “Dielectric Barrier Discharges and their Applications&rdquo, in Commemoration of the 20th Anniversary of Dr. Ulrich Kogelschatz’s Work”. Bogaerts A, Plasma Chemistry and Plasma Processing 43, 1281 (2023). http://doi.org/10.1007/s11090-023-10431-x
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Characterization of Non-Thermal Dielectric Barrier Discharges for Plasma Medicine: From Plastic Well Plates to Skin Surfaces”. Lin A, Gromov M, Nikiforov A, Smits E, Bogaerts A, Plasma Chemistry and Plasma Processing 43, 1587 (2023). http://doi.org/10.1007/s11090-023-10389-w
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Investigation of O atom kinetics in O2plasma and its afterglow”. Albrechts M, Tsonev I, Bogaerts A, Plasma Sources Science and Technology 33, 045017 (2024). http://doi.org/10.1088/1361-6595/ad3f4a
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Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge”. Yan M, Bogaerts A, Gijbels R, Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 63 (2001). http://doi.org/10.1103/PhysRevE.63.026405
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A 2D model for a gliding arc discharge”. Kolev S, Bogaerts A, Plasma sources science and technology 24, 015025 (2015). http://doi.org/10.1088/0963-0252/24/1/015025
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Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model”. Bultinck E, Bogaerts A, Plasma sources science and technology 20, 045013 (2011). http://doi.org/10.1088/0963-0252/20/4/045013
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Comprehensive modelling network for dc glow discharges in argon”. Bogaerts A, Plasma sources science and technology 8, 210 (1999). http://doi.org/10.1088/0963-0252/8/2/003
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Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition”. Tinck S, Bogaerts A, Plasma sources science and technology 20, 015008 (2011). http://doi.org/10.1088/0963-0252/20/1/015008
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Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges”. Paulussen S, Verheyde B, Tu X, De Bie C, Martens T, Petrovic D, Bogaerts A, Sels B, Plasma sources science and technology 19, 034015 (2010). http://doi.org/10.1088/0963-0252/19/3/034015
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Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations”. De Bie C, Martens T, van Dijk J, Paulussen S, Verheyde B, Corthals S, Bogaerts A, Plasma sources science and technology 20, 024008 (2011). http://doi.org/10.1088/0963-0252/20/2/024008
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Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis”. Peerenboom K, Parente A, Kozák T, Bogaerts A, Degrez G, Plasma sources science and technology 24, 025004 (2015). http://doi.org/10.1088/0963-0252/24/2/025004
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The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 21, 025008 (2012). http://doi.org/10.1088/0963-0252/21/2/025008
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Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges”. Liu Y-X, Zhang Q-Z, Liu L, Song Y-H, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025012 (2013). http://doi.org/10.1088/0963-0252/22/2/025012
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation”. Van Laer K, Tinck S, Samara V, de Marneffe JF, Bogaerts A, Plasma sources science and technology 22, 025011 (2013). http://doi.org/10.1088/0963-0252/22/2/025011
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Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model”. Kozák T, Bogaerts A, Plasma sources science and technology 24, 015024 (2015). http://doi.org/10.1088/0963-0252/24/1/015024
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Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 22, 015017 (2013). http://doi.org/10.1088/0963-0252/22/1/015017
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