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Atomistic simulations of graphite etching at realistic time scales”. Aussems DUB, Bal K M, Morgan TW, van de Sanden MCM, Neyts EC, Chemical science 8, 7160 (2017). http://doi.org/10.1039/C7SC02763J
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Concurrent effects of wafer temperature and oxygen fraction on cryogenic silicon etching with SF6/O2plasmas”. Tinck S, Tillocher T, Georgieva V, Dussart R, Neyts E, Bogaerts A, Plasma processes and polymers 14, 1700018 (2017). http://doi.org/10.1002/ppap.201700018
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Plasma technology &ndash, a novel solution for CO2conversion?”.Snoeckx R, Bogaerts A, Chemical Society reviews 46, 5805 (2017). http://doi.org/10.1039/C6CS00066E
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Structures and spectroscopic properties of sulfur-nitrogen-pnictogen chains : R2P-N=S=N-PR2 and R2P-N=S=N-AsR2”. Bal KM, Cautereels J, Blockhuys F, Journal of molecular structure 1132, 102 (2017). http://doi.org/10.1016/J.MOLSTRUC.2016.08.008
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Thickness dependence of the resistivity of platinum-group metal thin films”. Dutta S, Sankaran K, Moors K, Pourtois G, Van Elshocht S, Bommels J, Vandervorst W, Tokei Z, Adelmann C, Journal of applied physics 122, 025107 (2017). http://doi.org/10.1063/1.4992089
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Revealing the arc dynamics in a gliding arc plasmatron: a better insight to improve CO2conversion”. Ramakers M, Medrano JA, Trenchev G, Gallucci F, Bogaerts A, Plasma sources science and technology 26, 125002 (2017). http://doi.org/10.1088/1361-6595/aa9531
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Thermodynamic properties and transport coefficients of a two-temperature polytetrafluoroethylene vapor plasma for ablation-controlled discharge applications”. Wang H, Wang W, Yan JD, Qi H, Geng J, Wu Y, Journal of physics: D: applied physics 50, 395204 (2017). http://doi.org/10.1088/1361-6463/AA7D68
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Modeling of CO2plasma: effect of uncertainties in the plasma chemistry”. Berthelot A, Bogaerts A, Plasma sources science and technology 26, 115002 (2017). http://doi.org/10.1088/1361-6595/aa8ffb
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Mechanisms for plasma cryogenic etching of porous materials”. Zhang Q-Z, Tinck S, de Marneffe J-F, Zhang L, Bogaerts A, Applied physics letters 111, 173104 (2017). http://doi.org/10.1063/1.4999439
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Pressure as an additional control handle for non-thermal atmospheric plasma processes”. Belov I, Paulussen S, Bogaerts A, Plasma processes and polymers 14, 1700046 (2017). http://doi.org/10.1002/ppap.201700046
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CO2Conversion in a Gliding Arc Plasmatron: Multidimensional Modeling for Improved Efficiency”. Trenchev G, Kolev S, Wang W, Ramakers M, Bogaerts A, The journal of physical chemistry: C : nanomaterials and interfaces 121, 24470 (2017). http://doi.org/10.1021/acs.jpcc.7b08511
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Impact of layer alignment on the behavior of MoS2-ZrS2 tunnel field-effect transistors : an ab initio study”. Lu AKA, Houssa M, Luisier M, Pourtois G, Physical review applied 8, 034017 (2017). http://doi.org/10.1103/PHYSREVAPPLIED.8.034017
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Streamer propagation in a packed bed plasma reactor for plasma catalysis applications”. Wang W, Kim H-H, Van Laer K, Bogaerts A, Chemical engineering journal 334, 2467 (2018). http://doi.org/10.1016/j.cej.2017.11.139
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Combining experimental and modelling approaches to study the sources of reactive species induced in water by the COST RF plasma jet”. Gorbanev Y, Verlackt CCW, Tinck S, Tuenter E, Foubert K, Cos P, Bogaerts A, Physical chemistry, chemical physics 20, 2797 (2018). http://doi.org/10.1039/C7CP07616A
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Foundations of modelling of nonequilibrium low-temperature plasmas”. Alves LL, Bogaerts A, Guerra V, Turner MM, Plasma sources science and technology 27, 023002 (2018). http://doi.org/10.1088/1361-6595/aaa86d
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Atomic scale simulation of H2O2permeation through aquaporin: toward the understanding of plasma cancer treatment”. Yusupov M, Yan D, Cordeiro RM, Bogaerts A, Journal of physics: D: applied physics 51, 125401 (2018). http://doi.org/10.1088/1361-6463/aaae7a
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Effect of plasma-induced surface charging on catalytic processes: application to CO2activation”. Bal KM, Huygh S, Bogaerts A, Neyts EC, Plasma sources science and technology 27, 024001 (2018). http://doi.org/10.1088/1361-6595/aaa868
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Kinetic and thermodynamic heterogeneity : an intrinsic source of variability in Cu-based RRAM memories”. Clima S, Belmonte A, Degraeve R, Fantini A, Goux L, Govoreanu B, Jurczak M, Ota K, Redolfi A, Kar GS, Pourtois G, Journal of computational electronics 16, 1011 (2017). http://doi.org/10.1007/S10825-017-1042-3
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Structural characterization of SnS crystals formed by chemical vapour deposition”. Mehta AN, Zhang H, Dabral A, Richard O, Favia P, Bender H, Delabie A, Caymax M, Houssa M, Pourtois G, Vandervorst W, Journal of microscopy T2 –, 20th International Conference on Microscopy of Semiconducting Materials, (MSM), APR 09-13, 2017, Univ Oxford, Univ Oxford, Oxford, ENGLAND 268, 276 (2017). http://doi.org/10.1111/JMI.12652
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Transport and accumulation of plasma generated species in aqueous solution”. Verlackt CCW, Van Boxem W, Bogaerts A, Physical chemistry, chemical physics 20, 6845 (2018). http://doi.org/10.1039/C7CP07593F
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Enhancement of cellular glucose uptake by reactive species: a promising approach for diabetes therapy”. Kumar N, Shaw P, Razzokov J, Yusupov M, Attri P, Uhm HS, Choi EH, Bogaerts A, RSC advances 8, 9887 (2018). http://doi.org/10.1039/C7RA13389H
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Phosphatidylserine flip-flop induced by oxidation of the plasma membrane: a better insight by atomic scale modeling”. Razzokov J, Yusupov M, Vanuytsel S, Neyts EC, Bogaerts A, Plasma processes and polymers 14, 1700013 (2017). http://doi.org/10.1002/ppap.201700013
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Pinpointing energy losses in CO 2 plasmas &ndash, Effect on CO 2 conversion”. Berthelot A, Bogaerts A, Journal of CO2 utilization 24, 479 (2018). http://doi.org/10.1016/j.jcou.2018.02.011
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Modelling molecular adsorption on charged or polarized surfaces: a critical flaw in common approaches”. Bal KM, Neyts EC, Physical chemistry, chemical physics 20, 8456 (2018). http://doi.org/10.1039/C7CP08209F
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The conversion mechanism of amorphous silicon to stoichiometric WS2”. Heyne MH, de Marneffe J-F, Nuytten T, Meersschaut J, Conard T, Caymax M, Radu I, Delabie A, Neyts EC, De Gendt S, Journal of materials chemistry C : materials for optical and electronic devices 6, 4122 (2018). http://doi.org/10.1039/C8TC00760H
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Atomistic simulations of plasma catalytic processes”. Neyts EC, Frontiers of Chemical Science and Engineering 12, 145 (2018). http://doi.org/10.1007/S11705-017-1674-7
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Epitaxial CVD Growth of Ultra-Thin Si Passivation Layers on Strained Ge Fin Structures”. Loo R, Arimura H, Cott D, Witters L, Pourtois G, Schulze A, Douhard B, Vanherle W, Eneman G, Richard O, Favia P, Mitard J, Mocuta D, Langer R, Collaert N, ECS journal of solid state science and technology 7, P66 (2018). http://doi.org/10.1149/2.0191802JSS
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Method to quantify the delocalization of electronic states in amorphous semiconductors and its application to assessing charge carrier mobility of p-type amorphous oxide semiconductors”. de de Meux AJ, Pourtois G, Genoe J, Heremans P, Physical review B 97, 045208 (2018). http://doi.org/10.1103/PHYSREVB.97.045208
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Propagation of a plasma streamer in catalyst pores”. Zhang Q-Z, Bogaerts A, Plasma sources science and technology 27, 035009 (2018). http://doi.org/10.1088/1361-6595/aab47a
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Carbon dioxide dissociation in a microwave plasma reactor operating in a wide pressure range and different gas inlet configurations”. Belov I, Vermeiren V, Paulussen S, Bogaerts A, Journal of CO2 utilization 24, 386 (2018). http://doi.org/10.1016/j.jcou.2017.12.009
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