|
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments |
2009 |
Journal of physics: D: applied physics |
42 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
Van Gaens, W.; Bogaerts, A. |
Kinetic modelling for an atmospheric pressure argon plasma jet in humid air |
2013 |
Journal of physics: D: applied physics |
46 |
115 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, Y.; Jiang, W.; Bogaerts, A. |
Kinetic simulation of direct-current driven microdischarges in argon at atmospheric pressure |
2014 |
Journal of physics: D: applied physics |
47 |
10 |
UA library record; WoS full record; WoS citing articles |
|
|
Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. |
New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
47 |
UA library record; WoS full record; WoS citing articles |
|
|
Gul, B.; Tinck, S.; De Schepper, P.; Aman-ur-Rehman; Bogaerts, A. |
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching |
2015 |
Journal of physics: D: applied physics |
48 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
Mao, M.; Wang, Y.N.; Bogaerts, A. |
Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications |
2011 |
Journal of physics: D: applied physics |
44 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
Eckert, M.; Neyts, E.; Bogaerts, A. |
On the reaction behaviour of hydrocarbon species at diamond (1 0 0) and (1 1 1) surfaces: a molecular dynamics investigation |
2008 |
Journal of physics: D: applied physics |
41 |
17 |
UA library record; WoS full record; WoS citing articles |
|
|
Martens, T.; Brok, W.J.M.; van Dijk, J.; Bogaerts, A. |
On the regime transitions during the formation of an atmospheric pressure dielectric barrier glow discharge |
2009 |
Journal of physics: D: applied physics |
42 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
de Bleecker, K.; Herrebout, D.; Bogaerts, A.; Gijbels, R.; Descamps, P. |
One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2 |
2003 |
Journal of physics: D: applied physics |
36 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
The origin of Bohm diffusion, investigated by a comparison of different modelling methods |
2010 |
Journal of physics: D: applied physics |
43 |
16 |
UA library record; WoS full record; WoS citing articles |
|
|
Yusupov, M.; Neyts, E.C.; Simon, P.; Berdiyorov, G.; Snoeckx, R.; van Duin, A.C.T.; Bogaerts, A. |
Reactive molecular dynamics simulations of oxygen species in a liquid water layer of interest for plasma medicine |
2014 |
Journal of physics: D: applied physics |
47 |
51 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, Q.-Z.; Zhao, S.-X.; Jiang, W.; Wang, Y.-N. |
Separate control between geometrical and electrical asymmetry effects in capacitively coupled plasmas |
2012 |
Journal of physics: D: applied physics |
45 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
31 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, S.; Van Gaens, W.; van Gessel, B.; Hofmann, S.; van Veldhuizen, E.; Bogaerts, A.; Bruggeman, P. |
Spatially resolved ozone densities and gas temperatures in a time modulated RF driven atmospheric pressure plasma jet : an analysis of the production and destruction mechanisms |
2013 |
Journal of physics: D: applied physics |
46 |
74 |
UA library record; WoS full record; WoS citing articles |
|
|
Van der Paal, J.; Verlackt, C.C.; Yusupov, M.; Neyts, E.C.; Bogaerts, A. |
Structural modification of the skin barrier by OH radicals : a reactive molecular dynamics study for plasma medicine |
2015 |
Journal of physics: D: applied physics |
48 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
Setareh, M.; Farnia, M.; Maghari, A.; Bogaerts, A. |
CF4 decomposition in a low-pressure ICP : influence of applied power and O2 content |
2014 |
Journal of physics: D: applied physics |
47 |
8 |
UA library record; WoS full record; WoS citing articles |
|
|
Neyts, E.C.; Bogaerts, A. |
Understanding plasma catalysis through modelling and simulation : a review |
2014 |
Journal of physics: D: applied physics |
47 |
130 |
UA library record; WoS full record; WoS citing articles |
|
|
Dufour, T.; Minnebo, J.; Abou Rich, S.; Neyts, E.C.; Bogaerts, A.; Reniers, F. |
Understanding polyethylene surface functionalization by an atmospheric He/O2 plasma through combined experiments and simulations |
2014 |
Journal of physics: D: applied physics |
47 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Khosravian, N.; Van der Paal, J.; Verlackt, C.C.W.; Yusupov, M.; Kamaraj, B.; Neyts, E.C. |
Multi-level molecular modelling for plasma medicine |
2016 |
Journal of physics: D: applied physics |
49 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
Tinck, S.; Bogaerts, A. |
Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry |
2016 |
Journal of physics: D: applied physics |
49 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
Tinck, S.; Bogaerts, A. |
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon |
2016 |
Journal of physics: D: applied physics |
49 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. |
Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation |
2016 |
Journal of physics: D: applied physics |
49 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
de de Meux, A.J.; Pourtois, G.; Genoe, J.; Heremans, P. |
Comparison of the electronic structure of amorphous versus crystalline indium gallium zinc oxide semiconductor : structure, tail states and strain effects |
2015 |
Journal of physics: D: applied physics |
48 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
Ozkan, A.; Bogaerts, A.; Reniers, F. |
Routes to increase the conversion and the energy efficiency in the splitting of CO2by a dielectric barrier discharge |
2017 |
Journal of physics: D: applied physics |
50 |
28 |
UA library record; WoS full record; WoS citing articles |
|
|
Verlackt, C.C.W.; Neyts, E.C.; Bogaerts, A. |
Atomic scale behavior of oxygen-based radicals in water |
2017 |
Journal of physics: D: applied physics |
50 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
Khalilov, U.; Bogaerts, A.; Hussain, S.; Kovacevic, E.; Brault, P.; Boulmer-Leborgne, C.; Neyts, E.C. |
Nanoscale mechanisms of CNT growth and etching in plasma environment |
2017 |
Journal of physics: D: applied physics |
50 |
6 |
UA library record; WoS full record; WoS citing articles |
|
|
Adamovich, I.; Baalrud, S.D.; Bogaerts, A.; Bruggeman, P.J.; Cappelli, M.; Colombo, V.; Czarnetzki, U.; Ebert, U.; Eden, J.G.; Favia, P.; Graves, D.B.; Hamaguchi, S.; Hieftje, G.; Hori, M.; Kaganovich, I.D.; Kortshagen, U.; Kushner, M.J.; Mason, N.J.; Mazouffre, S.; Thagard, S.M.; Metelmann, H.-R.; Mizuno, A.; Moreau, E.; Murphy, A.B.; Niemira, B.A.; Oehrlein, G.S.; Petrovic, Z.L.; Pitchford, L.C.; Pu, Y.-K.; Rauf, S.; Sakai, O.; Samukawa, S.; Starikovskaia, S.; Tennyson, J.; Terashima, K.; Turner, M.M.; van de Sanden, M.C.M.; Vardelle, A. |
The 2017 Plasma Roadmap: Low temperature plasma science and technology |
2017 |
Journal of physics: D: applied physics |
50 |
246 |
UA library record; WoS full record; WoS citing articles |
|
|
Kong, L.; Wang, W.; Murphy, A.B.; Xia, G. |
Numerical analysis of direct-current microdischarge for space propulsion applications using the particle-in-cell/Monte Carlo collision (PIC/MCC) method |
2017 |
Journal of physics: D: applied physics |
50 |
8 |
UA library record; WoS full record; WoS citing articles |
|
|
Wang, W.; Kong, L.; Geng, J.; Wei, F.; Xia, G. |
Wall ablation of heated compound-materials into non-equilibrium discharge plasmas |
2017 |
Journal of physics: D: applied physics |
50 |
19 |
UA library record; WoS full record; WoS citing articles |
|
|
Wang, H.; Wang, W.; Yan, J.D.; Qi, H.; Geng, J.; Wu, Y. |
Thermodynamic properties and transport coefficients of a two-temperature polytetrafluoroethylene vapor plasma for ablation-controlled discharge applications |
2017 |
Journal of physics: D: applied physics |
50 |
3 |
UA library record; WoS full record; WoS citing articles |
|