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Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis”. Peerenboom K, Parente A, Kozák T, Bogaerts A, Degrez G, Plasma sources science and technology 24, 025004 (2015). http://doi.org/10.1088/0963-0252/24/2/025004
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The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 21, 025008 (2012). http://doi.org/10.1088/0963-0252/21/2/025008
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Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges”. Liu Y-X, Zhang Q-Z, Liu L, Song Y-H, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025012 (2013). http://doi.org/10.1088/0963-0252/22/2/025012
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Electron capture in GaAs quantum wells via electron-electron and optic phonon scattering”. Kálna K, Mo×ko M, Peeters FM, Applied physics letters 68, 117 (1996)
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation”. Van Laer K, Tinck S, Samara V, de Marneffe JF, Bogaerts A, Plasma sources science and technology 22, 025011 (2013). http://doi.org/10.1088/0963-0252/22/2/025011
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Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model”. Kozák T, Bogaerts A, Plasma sources science and technology 24, 015024 (2015). http://doi.org/10.1088/0963-0252/24/1/015024
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Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma”. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology 22, 015017 (2013). http://doi.org/10.1088/0963-0252/22/1/015017
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Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas”. Zhang Q-Z, Liu Y-X, Jiang W, Bogaerts A, Wang Y-N, Plasma sources science and technology 22, 025014 (2013). http://doi.org/10.1088/0963-0252/22/2/025014
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Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux”. Bogaerts A, Okhrimovskyy A, Baguer N, Gijbels R, Plasma sources science and technology 14, 191 (2005). http://doi.org/10.1088/0963-0252/14/1/021
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InAs p-n diodes grown on GaAs and GaAs-coated Si by molecular beam epitaxy”. Dobbelaere W, de Boeck J, Heremans P, Mertens R, Borghs G, Luyten W, van Landuyt J, Applied physics letters 60, 868 (1992). http://doi.org/10.1063/1.106490
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InAs0.85Sb0.15 infrared photodiodes grown on GaAs and GaAs-coated Si by molecular beam epitaxy”. Dobbelaere W, de Boeck J, Heremans P, Mertens R, Borghs G, Luyten W, van Landuyt J, Applied physics letters 600, 3256 (1992). http://doi.org/10.1063/1.106711
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating”. Tinck S, Boullart W, Bogaerts A, Plasma sources science and technology 20, 045012 (2011). http://doi.org/10.1088/0963-0252/20/4/045012
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Nonlinear transport phenomena in a triangular quantum well”. Kastalsky A, Peeters FM, Chan WK, Florez LT, Harbison JP, Applied physics letters 59, 1708 (1991)
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Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model”. Georgieva V, Bogaerts A, Plasma sources science and technology 15, 368 (2006). http://doi.org/10.1088/0963-0252/15/3/010
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Reaction pathways of biomedically active species in an Ar plasma jet”. Van Gaens W, Bogaerts A, Plasma sources science and technology 23, 035015 (2014). http://doi.org/10.1088/0963-0252/23/3/035015
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Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model”. Kozák T, Bogaerts A, Plasma sources science and technology 23, 045004 (2014). http://doi.org/10.1088/0963-0252/23/4/045004
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Similarities and differences between gliding glow and gliding arc discharges”. Kolev S, Bogaerts A, Plasma sources science and technology 24, 065023 (2015). http://doi.org/10.1088/0963-0252/24/6/065023
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Y2O3 inclusions in YBa2Cu3O7-\delta thin films”. Verbist K, Vasiliev AL, Van Tendeloo G, Applied physics letters 66, 1424 (1995). http://doi.org/10.1063/1.113266
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Fluid modelling of a packed bed dielectric barrier discharge plasma reactor”. Van Laer K, Bogaerts A, Plasma sources science and technology 25, 015002 (2016). http://doi.org/10.1088/0963-0252/25/1/015002
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Appearance of a conductive carbonaceous coating in a CO2dielectric barrier discharge and its influence on the electrical properties and the conversion efficiency”. Belov I, Paulussen S, Bogaerts A, Plasma sources science and technology 25, 015023 (2016). http://doi.org/10.1088/0963-0252/25/1/015023
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The influence of power and frequency on the filamentary behavior of a flowing DBD—application to the splitting of CO2”. Ozkan A, Dufour T, Silva T, Britun N, Snyders R, Bogaerts A, Reniers F, Plasma sources science and technology 25, 025013 (2016). http://doi.org/10.1088/0963-0252/25/2/025013
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A 3D model of a reverse vortex flow gliding arc reactor”. Trenchev G, Kolev S, Bogaerts A, Plasma sources science and technology 25, 035014 (2016). http://doi.org/10.1088/0963-0252/25/3/035014
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How do the barrier thickness and dielectric material influence the filamentary mode and CO2conversion in a flowing DBD?”.Ozkan A, Dufour T, Bogaerts A, Reniers F, Plasma sources science and technology 25, 045016 (2016). http://doi.org/10.1088/0963-0252/25/4/045016
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Modeling of plasma-based CO2conversion: lumping of the vibrational levels”. Berthelot A, Bogaerts A, Plasma sources science and technology 25, 045022 (2016). http://doi.org/10.1088/0963-0252/25/4/045022
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DBD in burst mode: solution for more efficient CO2conversion?”.Ozkan A, Dufour T, Silva T, Britun N, Snyders R, Reniers F, Bogaerts A, Plasma sources science and technology 25, 055005 (2016). http://doi.org/10.1088/0963-0252/25/5/055005
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Modeling plasma-based CO2conversion: crucial role of the dissociation cross section”. Bogaerts A, Wang W, Berthelot A, Guerra V, Plasma sources science and technology 25, 055016 (2016). http://doi.org/10.1088/0963-0252/25/5/055016
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Effective ionisation coefficients and critical breakdown electric field of CO2at elevated temperature: effect of excited states and ion kinetics”. Wang W, Bogaerts A, Plasma sources science and technology 25, 055025 (2016). http://doi.org/10.1088/0963-0252/25/5/055025
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CO2 conversion in a gliding arc plasma: 1D cylindrical discharge model”. Wang W, Berthelot A, Kolev S, Tu X, Bogaerts A, Plasma sources science and technology 25, 065012 (2016). http://doi.org/10.1088/0963-0252/25/6/065012
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