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Author (up) Title Year Publication Volume Times cited Additional Links
Zhang, Q.-Z.; Bogaerts, A. Capacitive electrical asymmetry effect in an inductively coupled plasma reactor 2018 Plasma Sources Science & Technology 27 1 UA library record; WoS full record; WoS citing articles
Zhang, Q.-Z.; Bogaerts, A. Plasma streamer propagation in structured catalysts 2018 Plasma Sources Science & Technology 27 3 UA library record; WoS full record; WoS citing articles
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas 2013 Plasma sources science and technology 22 9 UA library record; WoS full record; WoS citing articles
Zhang, Q.-Z.; Wang, W.-Z.; Bogaerts, A. Importance of surface charging during plasma streamer propagation in catalyst pores 2018 Plasma sources science and technology 27 13 UA library record; WoS full record; WoS citing articles
Zhang, Q.-Z.; Wang, W.Z.; Thille, C.; Bogaerts, A. H2S Decomposition into H2 and S2 by Plasma Technology: Comparison of Gliding Arc and Microwave Plasma 2020 Plasma Chemistry And Plasma Processing 40 UA library record; WoS full record; WoS citing articles
Zhang, Q.‐Z.; Zhang, L.; Yang, D.‐Z.; Schulze, J.; Wang, Y.‐N.; Bogaerts, A. Positive and negative streamer propagation in volume dielectric barrier discharges with planar and porous electrodes 2021 Plasma Processes And Polymers 18 UA library record; WoS full record; WoS citing articles
Zhang, Y.-R.; Neyts, E.C.; Bogaerts, A. Enhancement of plasma generation in catalyst pores with different shapes 2018 Plasma sources science and technology 27 11 UA library record; WoS full record; WoS citing articles
Zhang, Y.-R.; Xu, X.; Zhao, S.-X.; Bogaerts, A.; Wang, Y.-N. Comparison of electrostatic and electromagnetic simulations for very high frequency plasmas 2010 Physics of plasmas 17 30 UA library record; WoS full record; WoS citing articles
Zhang, Y.; Wang, H.-yu; Zhang, Y.-ru; Bogaerts, A. Formation of microdischarges inside a mesoporous catalyst in dielectric barrier discharge plasmas 2017 Plasma sources science and technology 26 15 UA library record; WoS full record; WoS citing articles
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma 2013 Plasma sources science and technology 22 11 UA library record; WoS full record; WoS citing articles