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  Author Title Year Publication Volume Times cited Additional Links Links
Boschker, H.; Huijben, M.; Vailinois, A.; Verbeeck, J.; Van Aert, S.; Luysberg, M.; Bals, S.; Van Tendeloo, G.; Houwman, E.P.; Koster, G.; Blank, D.H.A.; Rijnders, G. Optimized fabrication of high-quality La0.67Sr0.33MnO3 thin films considering all essential characteristics 2011 Journal of physics: D: applied physics 44 99 UA library record; WoS full record; WoS citing articles pdf doi
Mao, M.; Bogaerts, A. Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system : the effect of different gas mixtures 2010 Journal of physics: D: applied physics 43 52 UA library record; WoS full record; WoS citing articles doi
Mao, M.; Bogaerts, A. Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma-enhanced CVD system : the effect of processing parameters 2010 Journal of physics: D: applied physics 43 17 UA library record; WoS full record; WoS citing articles doi
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. The origin of Bohm diffusion, investigated by a comparison of different modelling methods 2010 Journal of physics: D: applied physics 43 16 UA library record; WoS full record; WoS citing articles doi
Rubino, S.; Schattschneider, P.; Rusz, J.; Verbeeck, J.; Leifer, K. Simulation of magnetic circular dichroism in the electron microscope 2010 Journal of physics: D: applied physics 43 13 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Bultinck, E.; Kolev, I.; Schwaederlé, L.; van Aeken, K.; Buyle, G.; Depla, D. Computer modelling of magnetron discharges 2009 Journal of physics: D: applied physics 42 32 UA library record; WoS full record; WoS citing articles doi
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. Fluid modelling of an atmospheric pressure dielectric barrier discharge in cylindrical geometry 2009 Journal of physics: D: applied physics 42 29 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Boullart, W.; Bogaerts, A. Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments 2009 Journal of physics: D: applied physics 42 23 UA library record; WoS full record; WoS citing articles doi
Martens, T.; Brok, W.J.M.; van Dijk, J.; Bogaerts, A. On the regime transitions during the formation of an atmospheric pressure dielectric barrier glow discharge 2009 Journal of physics: D: applied physics 42 21 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Saraiva, M.; Jehanathan, N.; Lebelev, O.I.; Depla, D.; Bogaerts, A. Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments 2009 Journal of physics: D: applied physics 42 37 UA library record; WoS full record; WoS citing articles pdf doi
Bultinck, E.; Bogaerts, A. The effect of the magnetic field strength on the sheath region of a dc magnetron discharge 2008 Journal of physics: D: applied physics 41 16 UA library record; WoS full record; WoS citing articles doi
Ruelle, B.; Felten, A.; Ghijsen, J.; Drube, W.; Johnson, R.L.; Liang, D.; Erni, R.; Van Tendeloo, G.; Dubois, P.; Hecq, M.; Bittencourt, C.; Functionalization of MWCNTs with atomic nitrogen : electronic structure 2008 Journal of physics: D: applied physics 41 16 UA library record; WoS full record; WoS citing articles pdf doi
Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments 2008 Journal of physics: D: applied physics 41 47 UA library record; WoS full record; WoS citing articles doi
Eckert, M.; Neyts, E.; Bogaerts, A. On the reaction behaviour of hydrocarbon species at diamond (1 0 0) and (1 1 1) surfaces: a molecular dynamics investigation 2008 Journal of physics: D: applied physics 41 17 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Boullart, W.; Bogaerts, A. Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments 2008 Journal of physics: D: applied physics 41 31 UA library record; WoS full record; WoS citing articles doi
Felten, A.; Ghijsen, J.; Pireaux, J.-J.; Johnson, R.L.; Whelan, C.M.; Liang, D.; Van Tendeloo, G. Effect of oxygen rf-plasma on electronic properties of CNTs 2007 Journal of physics: D: applied physics 40 25 UA library record; WoS full record; WoS citing articles doi
Ghica, C.; Nistor, L.C.; Bender, H.; Richard, O.; Van Tendeloo, G.; Ulyashin, A. TEM characterization of extended defects induced in Si wafers by H-plasma treatment 2007 Journal of physics: D: applied physics 40 10 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. Densification of thin a-C: H films grown from low-kinetic energy hydrocarbon radicals under the influence of H and C particle fluxes: a molecular dynamics study 2006 Journal of physics: D: applied physics 39 3 UA library record; WoS full record; WoS citing articles doi
de Bleecker, K.; Herrebout, D.; Bogaerts, A.; Gijbels, R.; Descamps, P. One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2 2003 Journal of physics: D: applied physics 36 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Khosravian, N.; Van der Paal, J.; Verlackt, C.C.W.; Yusupov, M.; Kamaraj, B.; Neyts, E.C. Multi-level molecular modelling for plasma medicine 2016 Journal of physics: D: applied physics 49 11 UA library record; WoS full record; WoS citing articles pdf url doi
Kozák, T.; Vlček, J. A parametric model for reactive high-power impulse magnetron sputtering of films 2016 Journal Of Physics D-Applied Physics 49 25 pdf url doi
Tinck, S.; Bogaerts, A. Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry 2016 Journal of physics: D: applied physics 49 5 UA library record; WoS full record; WoS citing articles pdf url doi
Tinck, S.; Bogaerts, A. Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon 2016 Journal of physics: D: applied physics 49 UA library record; WoS full record; WoS citing articles pdf url doi
Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation 2016 Journal of physics: D: applied physics 49 1 UA library record; WoS full record; WoS citing articles pdf url doi
Ozkan, A.; Bogaerts, A.; Reniers, F. Routes to increase the conversion and the energy efficiency in the splitting of CO2by a dielectric barrier discharge 2017 Journal of physics: D: applied physics 50 28 UA library record; WoS full record; WoS citing articles pdf url doi
Verlackt, C.C.W.; Neyts, E.C.; Bogaerts, A. Atomic scale behavior of oxygen-based radicals in water 2017 Journal of physics: D: applied physics 50 11 UA library record; WoS full record; WoS citing articles pdf url doi
Bogaerts, A.; Khosravian, N.; Van der Paal, J.; Verlackt, C.C.W.; Yusupov, M.; Kamaraj, B.; Neyts, E.C. Multi-level molecular modelling for plasma medicine 2016 Journal Of Physics D-Applied Physics 49 UA library record pdf url
Khalilov, U.; Bogaerts, A.; Hussain, S.; Kovacevic, E.; Brault, P.; Boulmer-Leborgne, C.; Neyts, E.C. Nanoscale mechanisms of CNT growth and etching in plasma environment 2017 Journal of physics: D: applied physics 50 6 UA library record; WoS full record; WoS citing articles pdf url doi
Adamovich, I.; Baalrud, S.D.; Bogaerts, A.; Bruggeman, P.J.; Cappelli, M.; Colombo, V.; Czarnetzki, U.; Ebert, U.; Eden, J.G.; Favia, P.; Graves, D.B.; Hamaguchi, S.; Hieftje, G.; Hori, M.; Kaganovich, I.D.; Kortshagen, U.; Kushner, M.J.; Mason, N.J.; Mazouffre, S.; Thagard, S.M.; Metelmann, H.-R.; Mizuno, A.; Moreau, E.; Murphy, A.B.; Niemira, B.A.; Oehrlein, G.S.; Petrovic, Z.L.; Pitchford, L.C.; Pu, Y.-K.; Rauf, S.; Sakai, O.; Samukawa, S.; Starikovskaia, S.; Tennyson, J.; Terashima, K.; Turner, M.M.; van de Sanden, M.C.M.; Vardelle, A. The 2017 Plasma Roadmap: Low temperature plasma science and technology 2017 Journal of physics: D: applied physics 50 246 UA library record; WoS full record; WoS citing articles url doi
Kong, L.; Wang, W.; Murphy, A.B.; Xia, G. Numerical analysis of direct-current microdischarge for space propulsion applications using the particle-in-cell/Monte Carlo collision (PIC/MCC) method 2017 Journal of physics: D: applied physics 50 8 UA library record; WoS full record; WoS citing articles pdf url doi
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