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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Zhang, R.; Wu, Z.; Li, X.J.; Li, L.L.; Chen, Q.; Li, Y.-M.; Peeters, F.M. |
Fano resonances in bilayer phosphorene nanoring |
2018 |
Nanotechnology |
29 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Aierken, Y.; Sevik, C.; Gulseren, O.; Peeters, F.M.; Çakir, D. |
In pursuit of barrierless transition metal dichalcogenides lateral heterojunctions |
2018 |
Nanotechnology |
29 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Shah, N.A.; Li, L.L.; Mosallanejad, V.; Peeters, F.M.; Guo, G.-P. |
Transport characteristics of multi-terminal pristine and defective phosphorene systems |
2019 |
Nanotechnology |
30 |
8 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bafekry, A.; Shahrokhi, M.; Shafique, A.; Jappor, H.R.; Shojaei, F.; Feghhi, S.A.H.; Ghergherehchi, M.; Gogova, D. |
Two-dimensional carbon nitride C₆N nanosheet with egg-comb-like structure and electronic properties of a semimetal |
2021 |
Nanotechnology |
32 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Osca, J.; Moors, K.; Sorée, B.; Serra, L. |
Fabry-Perot interferometry with gate-tunable 3D topological insulator nanowires |
2021 |
Nanotechnology |
32 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhou, S.; Zhang, C.; Xu, W.; Zhang, J.; Xiao, Y.; Ding, L.; Wen, H.; Cheng, X.; Hu, C.; Li, H.; Li, X.; Peeters, F.M. |
Observation of temperature induced phase transitions in TiO superconducting thin film via infrared measurement |
2024 |
Infrared physics and technology |
137 |
|
UA library record; WoS full record |
|
|
|
Xiao, H.; Wen, H.; Xu, W.; Cheng, Y.; Zhang, J.; Cheng, X.; Xiao, Y.; Ding, L.; Li, H.; He, B.; Peeters, F.M. |
Terahertz magneto-optical properties of Nitrogen-doped diamond |
2024 |
Infrared physics and technology |
138 |
|
UA library record; WoS full record |
|
|
|
Huyskens, C.; De Wever, H.; Fovet, Y.; Wegmann, U.; Diels, L.; Lenaerts, S. |
Screening of novel MBR fouling reducers : benchmarking with known fouling reducers and evaluation of their mechanism of action |
2012 |
Separation and purification technology |
95 |
24 |
UA library record; WoS full record; WoS citing articles |
|
|
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Huyskens, C.; Lenaerts, S.; Brauns, E.; Diels, L.; de Wever, H. |
Study of (ir)reversible fouling in MBRs under various operating conditions using new on-line fouling sensor |
2011 |
Separation and purification technology |
81 |
15 |
UA library record; WoS full record; WoS citing articles |
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|
Blommaerts, N.; Dingenen, F.; Middelkoop, V.; Savelkouls, J.; Goemans, M.; Tytgat, T.; Verbruggen, S.W.; Lenaerts, S. |
Ultrafast screening of commercial sorbent materials for VOC adsorption using real-time FTIR spectroscopy |
2018 |
Separation and purification technology |
207 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Kolev, S.; Bogaerts, A. |
A 2D model for a gliding arc discharge |
2015 |
Plasma sources science and technology |
24 |
34 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. |
Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis |
2015 |
Plasma sources science and technology |
24 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Kozák, T.; Bogaerts, A. |
Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model |
2015 |
Plasma sources science and technology |
24 |
100 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Kolev, S.; Bogaerts, A. |
Similarities and differences between gliding glow and gliding arc discharges |
2015 |
Plasma sources science and technology |
24 |
12 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Van Gaens, W.; Bogaerts, A. |
Reaction pathways of biomedically active species in an Ar plasma jet |
2014 |
Plasma sources science and technology |
23 |
34 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Kozák, T.; Bogaerts, A. |
Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model |
2014 |
Plasma sources science and technology |
23 |
170 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. |
Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges |
2013 |
Plasma sources science and technology |
22 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. |
Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges |
2010 |
Plasma sources science and technology |
19 |
116 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Georgieva, V.; Bogaerts, A. |
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model |
2006 |
Plasma sources science and technology |
15 |
35 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
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