| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Van Gaens, W.; Bogaerts, A. |
Reaction pathways of biomedically active species in an Ar plasma jet |
2014 |
Plasma sources science and technology |
23 |
34 |
UA library record; WoS full record; WoS citing articles |
| Liang, Y.-S.; Xue, C.; Zhang, Y.-R.; Wang, Y.-N. |
Investigation of active species in low-pressure capacitively coupled N-2/Ar plasmas |
2021 |
Physics Of Plasmas |
28 |
|
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Bultinck, E.; Eckert, M.; Georgieva, V.; Mao, M.; Neyts, E.; Schwaederlé, L. |
Computer modeling of plasmas and plasma-surface interactions |
2009 |
Plasma processes and polymers |
6 |
18 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
| Vermeylen, S.; De Waele, J.; Vanuytsel, S.; De Backer, J.; Van der Paal, J.; Ramakers, M.; Leyssens, K.; Marcq, E.; Van Audenaerde, J.; L. J. Smits, E.; Dewilde, S.; Bogaerts, A. |
Cold atmospheric plasma treatment of melanoma and glioblastoma cancer cells |
2016 |
Plasma processes and polymers |
13 |
26 |
UA library record; WoS full record; WoS citing articles |
| Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Yusupov, M.; Van der Paal, J.; Verlackt, C.C.W.; Neyts, E.C. |
Reactive molecular dynamics simulations for a better insight in plasma medicine |
2014 |
Plasma processes and polymers |
11 |
22 |
UA library record; WoS full record; WoS citing articles |
| Sun, S.R.; Kolev, S.; Wang, H.X.; Bogaerts, A. |
Investigations of discharge and post-discharge in a gliding arc: a 3D computational study |
2017 |
Plasma sources science and technology |
26 |
11 |
UA library record; WoS full record; WoS citing articles |
| Kolev, S.; Bogaerts, A. |
A 2D model for a gliding arc discharge |
2015 |
Plasma sources science and technology |
24 |
34 |
UA library record; WoS full record; WoS citing articles |
| Trenchev, G.; Kolev, S.; Kiss’ovski, Z. |
Modeling a Langmuir probe in atmospheric pressure plasma at different EEDFs |
2017 |
Plasma sources science and technology |
26 |
4 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
| Kolev, S.; Bogaerts, A. |
Similarities and differences between gliding glow and gliding arc discharges |
2015 |
Plasma sources science and technology |
24 |
12 |
UA library record; WoS full record; WoS citing articles |
| Kolev, S.; Bogaerts, A. |
Three-dimensional modeling of energy transport in a gliding arc discharge in argon |
2018 |
Plasma Sources Science & Technology |
27 |
|
UA library record; WoS full record; WoS citing articles |
| Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
| Vandenbroucke, A.M.; Aerts, R.; Van Gaens, W.; De Geyter, N.; Leys, C.; Morent, R.; Bogaerts, A. |
Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge |
2015 |
Plasma chemistry and plasma processing |
35 |
9 |
UA library record; WoS full record; WoS citing articles |
| Berthelot, A.; Bogaerts, A. |
Modeling of CO2plasma: effect of uncertainties in the plasma chemistry |
2017 |
Plasma sources science and technology |
26 |
16 |
UA library record; WoS full record; WoS citing articles |
| Privat-Maldonado, A.; Gorbanev, Y.; O'Connell, D.; Vann, R.; Chechik, V.; van der Woude, M.W. |
Nontarget biomolecules alter macromolecular changes induced by bactericidal low-temperature plasma |
2018 |
IEEE transactions on radiation and plasma medical sciences |
2 |
|
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
| Apolinario, S.W.S.; Peeters, F.M. |
Melting transitions in isotropically confined three-dimensional small Coulomb clusters |
2007 |
Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics |
76 |
28 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A. |
Special Issue on “Dielectric Barrier Discharges and their Applications” in Commemoration of the 20th Anniversary of Dr. Ulrich Kogelschatz’s Work |
2023 |
Plasma Chemistry and Plasma Processing |
43 |
|
UA library record; WoS full record |
| Zhang, L.; Heijkers, S.; Wang, W.; Martini, L.M.; Tosi, P.; Yang, D.; Fang, Z.; Bogaerts, A. |
Dry reforming of methane in a nanosecond repetitively pulsed discharge: chemical kinetics modeling |
2022 |
Plasma Sources Science & Technology |
31 |
|
UA library record; WoS full record |
| Smith, G.J.; Diomede, P.; Gibson, A.R.; Doyle, S.J.; Guerra, V.; Kushner, M.J.; Gans, T.; Dedrick, J.P. |
Low-pressure inductively coupled plasmas in hydrogen : impact of gas heating on the spatial distribution of atomic hydrogen and vibrationally excited states |
2024 |
Plasma sources science and technology |
33 |
|
UA library record; WoS full record |
| Tennyson, J.; Rahimi, S.; Hill, C.; Tse, L.; Vibhakar, A.; Akello-Egwel, D.; Brown, D.B.; Dzarasova, A.; Hamilton, J.R.; Jaksch, D.; Mohr, S.; Wren-Little, K.; Bruckmeier, J.; Agarwal, A.; Bartschat, K.; Bogaerts, A.; Booth, J.-P.; Goeckner, M.J.; Hassouni, K.; Itikawa, Y.; Braams, B.J.; Krishnakumar, E.; Laricchiuta, A.; Mason, N.J.; Pandey, S.; Petrovic, Z.L.; Pu, Y.-K.; Ranjan, A.; Rauf, S.; Schulze, J.; Turner, M.M.; Ventzek, P.; Whitehead, J.C.; Yoon, J.-S. |
QDB: a new database of plasma chemistries and reactions |
2017 |
Plasma sources science and technology |
26 |
18 |
UA library record; WoS full record; WoS citing articles |
| Saeed, A.; Khan, A.W.; Shafiq, M.; Jan, F.; Abrar, M.; Zaka-ul-Islam, M.; Zakaullah, M. |
Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy |
2014 |
Plasma science & technology |
16 |
5 |
UA library record; WoS full record; WoS citing articles |
| Van Laer, K.; Bogaerts, A. |
How bead size and dielectric constant affect the plasma behaviour in a packed bed plasma reactor: a modelling study |
2017 |
Plasma sources science and technology |
26 |
22 |
UA library record; WoS full record; WoS citing articles |
| Cui, Z.; Zhou, C.; Jafarzadeh, A.; Zhang, X.; Hao, Y.; Li, L.; Bogaerts, A. |
SF₆ degradation in γ-Al₂O₃ packed DBD system : effects of hydration, reactive gases and plasma-induced surface charges |
2023 |
Plasma chemistry and plasma processing |
43 |
|
UA library record; WoS full record; WoS citing articles |
| Sun, J.-Y.; Wen, D.-Q.; Zhang, Q.-Z.; Liu, Y.-X.; Wang, Y.-N. |
The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials |
2019 |
Physics of plasmas |
26 |
1 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. |
Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation |
2014 |
Plasma processes and polymers |
11 |
1 |
UA library record; WoS full record; WoS citing articles |
| Fridman, A.; Lin, A.; Miller, V.; Bekeschus, S.; Wende, K.; Weltmann, K.-D. |
The plasma treatment unit : an attempt to standardize cold plasma treatment for defined biological effects |
2018 |
Plasma medicine |
8 |
|
UA library record |
