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Author Verbeeck, J.; van Dyck, D.; Lichte, H.; Potapov, P.; Schattschneider, P. pdf  doi
openurl 
  Title Plasmon holographic experiments: theoretical framework Type A1 Journal article
  Year 2005 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 102 Issue 3 Pages 239-255  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down) A theoretical framework is described to understand the results of plasmon holography experiments leading to insight in the meaning of the experimental results and pointing out directions for future experiments. The framework is based on the formalism of mutual intensity to describe how coherence is transferred through an optical system. For the inelastic interaction with the object, an expression for the volume. plasmon excitations in a free electron gas is used as a model for the behaviour of aluminium. The formalism leads to a clear graphical intuitive tool for under-standing the experiments. It becomes evident that the measured coherence is solely related to the angular distribution of the plasmon scattering in the case of bulk plasmons. After describing the framework, the special case of coherence outside a spherical particle is treated and the seemingly controversial idea of a plasmon with a limited coherence length obtained front experiments is clarified. (C) 2004 Elsevier B.V. All rights reserved.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000226436600010 Publication Date 2004-11-05  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 43 Open Access  
  Notes Fwo Approved Most recent IF: 2.843; 2005 IF: 2.490  
  Call Number UA @ lucian @ c:irua:57133UA @ admin @ c:irua:57133 Serial 2643  
Permanent link to this record
 

 
Author Korneychuk, S.; Partoens, B.; Guzzinati, G.; Ramaneti, R.; Derluyn, J.; Haenen, K.; Verbeeck, J. pdf  url
doi  openurl
  Title Exploring possibilities of band gap measurement with off-axis EELS in TEM Type A1 Journal article
  Year 2018 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 189 Issue 189 Pages 76-84  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Condensed Matter Theory (CMT)  
  Abstract (down) A technique to measure the band gap of dielectric materials with high refractive index by means of energy electron loss spectroscopy (EELS) is presented. The technique relies on the use of a circular (Bessel) aperture and suppresses Cherenkov losses and surface-guided light modes by enforcing a momentum transfer selection. The technique also strongly suppresses the elastic zero loss peak, making the acquisition, interpretation and signal to noise ratio of low loss spectra considerably better, especially for excitations in the first few eV of the EELS spectrum. Simulations of the low loss inelastic electron scattering probabilities demonstrate the beneficial influence of the Bessel aperture in this setup even for high accelerating voltages. The importance of selecting the optimal experimental convergence and collection angles is highlighted. The effect of the created off-axis acquisition conditions on the selection of the transitions from valence to conduction bands is discussed in detail on a simplified isotropic two band model. This opens the opportunity for deliberately selecting certain transitions by carefully tuning the microscope parameters. The suggested approach is experimentally demonstrated and provides good signal to noise ratio and interpretable band gap signals on reference samples of diamond, GaN and AlN while offering spatial resolution in the nm range. (C) 2018 Elsevier B.V. All rights reserved.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000432868500008 Publication Date 2018-03-29  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 7 Open Access OpenAccess  
  Notes ; S.K., B.P. and J.V. acknowledge funding from the “Geconcentreerde Onderzoekacties” (GOA) project “Solarpaint” of the University of Antwerp. S.K. and J.V. also acknowledge the FWO-Vlaanderen for financial support under contract G.0044.13N 'Charge ordering'. Financial support via the Methusalem “NANO” network is acknowledged. GG acknowledges support from a postdoctoral fellowship grant from the Fonds Wetenschappelijk Onderzoek-Vlaanderen (FWO). ; Approved Most recent IF: 2.843  
  Call Number UA @ lucian @ c:irua:151472UA @ admin @ c:irua:151472 Serial 5026  
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Author Verbeeck, J. pdf  doi
openurl 
  Title Interpretation of “Energy-filtered electron-diffracted beam holography” by R.A. Herring Type A1 Journal article
  Year 2006 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 106 Issue 6 Pages 461-465  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down) A straightforward application of the theoretical framework presented by Verbeeck et al. [Ultramicroscopy 102 (2005) 239] is presented to explain the energy-filtered electron-diffracted beam holography experiments published by Herring [Ultramicroscopy 104 (2005) 261]. It is shown that the theory is in agreement with all experimental findings, which leads to the interpretation that the experiments are mainly measuring the angular coherence of the source image rather than exposing details on the coherence properties of inelastic scattering. A change in experimental parameters is proposed, which could result in interesting information about the coherence in all inelastic scattering process. (c) 2006 Elsevier B.V. All rights reserved.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000237491600002 Publication Date 2006-01-18  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 8 Open Access  
  Notes Fwo Approved Most recent IF: 2.843; 2006 IF: 1.706  
  Call Number UA @ lucian @ c:irua:58283UA @ admin @ c:irua:58283 Serial 1710  
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Author Verbeeck, J.; Tian, H.; Béché, A. pdf  doi
openurl 
  Title A new way of producing electron vortex probes for STEM Type A1 Journal article
  Year 2012 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 113 Issue Pages 83-87  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down) A spiral holographic aperture is used in the condensor plane of a scanning transmission electron microscope to produce a focussed electron vortex probe carrying a topological charge of either −1, 0 or +1. The spiral aperture design has a major advantage over the previously used forked aperture in that the three beams with topological charge m=−1, 0, and 1 are not side by side in the specimen plane, but rather on top of each other, focussed at different heights. This allows us to have only one selected beam in focus on the sample while the others contribute only to a background signal. In this paper we describe the working principle as well as first experimental results demonstrating atomic resolution HAADF STEM images obtained with electron vortex probes. These results pave the way for atomic resolution magnetic information when combined with electron energy loss spectroscopy.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000300554400002 Publication Date 2011-10-31  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 62 Open Access  
  Notes J.V. wants to thank Miles Padgett for suggesting this setup and pointing to the relevant optics literature. Peter Schattschneider is acknowledged for in depth discussions on related topics. J.V acknowledges funding from the European Research Council under the 7th Framework Program (FP7), ERC Grant no. 46791-COUN-TATOMS and ERC Starting Grant no. 278510 VORTEX. The Qu-Ant-EM microscope is partially funded by the Hercules fund of the Flemish Government. ECASJO_; Approved Most recent IF: 2.843; 2012 IF: 2.470  
  Call Number UA @ lucian @ c:irua:93624UA @ admin @ c:irua:93624 Serial 2336  
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Author De wael, A.; De Backer, A.; Lobato, I.; Van Aert, S. pdf  url
doi  openurl
  Title Modelling ADF STEM images using elliptical Gaussian peaks and its effects on the quantification of structure parameters in the presence of sample tilt Type A1 Journal article
  Year 2021 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume Issue Pages 113391  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down) A small sample tilt away from a main zone axis orientation results in an elongation of the atomic columns in ADF STEM images. An often posed research question is therefore whether the ADF STEM image intensities of tilted nanomaterials should be quantified using a parametric imaging model consisting of elliptical rather than the currently used symmetrical peaks. To this purpose, simulated ADF STEM images corresponding to different amounts of sample tilt are studied using a parametric imaging model that consists of superimposed 2D elliptical Gaussian peaks on the one hand and symmetrical Gaussian peaks on the other hand. We investigate the quantification of structural parameters such as atomic column positions and scattering cross sections using both parametric imaging models. In this manner, we quantitatively study what can be gained from this elliptical model for quantitative ADF STEM, despite the increased parameter space and computational effort. Although a qualitative improvement can be achieved, no significant quantitative improvement in the estimated structure parameters is achieved by the elliptical model as compared to the symmetrical model. The decrease in scattering cross sections with increasing sample tilt is even identical for both types of parametric imaging models. This impedes direct comparison with zone axis image simulations. Nonetheless, we demonstrate how reliable atom-counting can still be achieved in the presence of small sample tilt.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos 000704334200001 Publication Date 2021-09-24  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited Open Access OpenAccess  
  Notes This project has received funding from the European Research Council (ERC) under the European Union’s Horizon 2020 research and innovation programme (Grant Agreement No. 770887 and No. 823717 ESTEEM3). The authors acknowledge financial support from the Research Foundation Flanders (FWO, Belgium) through grants to A.D.w. and A.D.B. and projects G.0502.18N, G.0267.18N, and EOS 30489208. S.V.A. acknowledges TOP BOF funding from the University of Antwerp.; esteem3JRA; esteem3reported Approved Most recent IF: 2.843  
  Call Number EMAT @ emat @c:irua:181462 Serial 6810  
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Author Ke, X.; Bals, S.; Romo Negreira, A.; Hantschel, T.; Bender, H.; Van Tendeloo, G. pdf  doi
openurl 
  Title TEM sample preparation by FIB for carbon nanotube interconnects Type A1 Journal article
  Year 2009 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 109 Issue 11 Pages 1353-1359  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down) A powerful method to study carbon nanotubes (CNTs) grown in patterned substrates for potential interconnects applications is transmission electron microscopy (TEM). However, high-quality TEM samples are necessary for such a study. Here, TEM specimen preparation by focused ion beam (FIB) has been used to obtain lamellae of patterned samples containing CNTs grown inside contact holes. A dual-cap Pt protection layer and an extensive 5 kV cleaning procedure are applied in order to preserve the CNTs and avoid deterioration during milling. TEM results show that the inner shell structure of the carbon nanotubes has been preserved, which proves that focused ion beam is a useful technique to prepare TEM samples of CNT interconnects.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000270765800006 Publication Date 2009-07-11  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 21 Open Access  
  Notes Esteem 026019; Iap Approved Most recent IF: 2.843; 2009 IF: 2.067  
  Call Number UA @ lucian @ c:irua:79074 Serial 3485  
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Author Croitoru, M.D.; van Dyck, D.; Liu, Y.Z.; Zhang, Z. doi  openurl
  Title Measurement of specimen thickness by phase change determination in TEM Type A1 Journal article
  Year 2008 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 108 Issue 12 Pages 1616-1622  
  Keywords A1 Journal article; Condensed Matter Theory (CMT); Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down) A non-destructive method for measuring the thickness of thin amorphous films composed of light elements has been developed. The method employs the statistics of the phase of the electron exit wave function. The accuracy of this method has been checked numerically by the multislice method and compared with that based on the mean inner potential.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000260808300016 Publication Date 2008-06-23  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 2 Open Access  
  Notes Approved Most recent IF: 2.843; 2008 IF: 2.629  
  Call Number UA @ lucian @ c:irua:75643 Serial 1961  
Permanent link to this record
 

 
Author Lobato, I.; Van Aert, S.; Verbeeck, J. pdf  doi
openurl 
  Title Progress and new advances in simulating electron microscopy datasets using MULTEM Type A1 Journal article
  Year 2016 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 168 Issue 168 Pages 17-27  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down) A new version of the open source program MULTEM is presented here. It includes a graphical user interface, tapering truncation of the atomic potential, CPU multithreading functionality, single/double precision calculations, scanning transmission electron microscopy (STEM) simulations using experimental detector sensitivities, imaging STEM (ISTEM) simulations, energy filtered transmission electron microscopy (EFTEM) simulations, STEM electron energy loss spectroscopy (EELS) simulations along with other improvements in the algorithms. We also present a mixed channeling approach for the calculation of inelastic excitations, which allows one to considerably speed up time consuming EFTEM/STEM-EELS calculations.  
  Address EMAT, University of Antwerp, Department of Physics, Groenenborgerlaan 171, B-2020 Antwerp, Belgium  
  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language English Wos 000380754100003 Publication Date 2016-06-11  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 43 Open Access  
  Notes The authors acknowledge financial support from the European Union under the Seventh Framework Program under a contract for an Integrated Infrastructure Initiative. Reference No. 312483- ESTEEM2. The authors acknowledge financial support from the Research Foundation Flanders (FWO, Belgium) through project fundings (G.0374.13N, G.0369.15N and G.0368.15N).; esteem2jra3; esteem2na3; esteem2_jra2 Approved Most recent IF: 2.843  
  Call Number c:irua:134088 c:irua:134088UA @ admin @ c:irua:134088 Serial 4093  
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Author Lobato, I.; van Dyck, D. doi  openurl
  Title Improved multislice calculations for including higher-order Laue zones effects Type A1 Journal article
  Year 2012 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 119 Issue Pages 63-71  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down) A new method for including higher-order Laue zones (HOLZs) effects in an efficient way in electron scattering simulations has been developed and tested by detail calculations. The calculated results by the conventional multislice (CMS) method and the improved conventional multislice (ICMS) method using a large dynamical aperture to avoid numerical errors are compared with accurate results. We have found that the zero-order Laue zones (ZOLZs) reflection cannot be properly described only using the projected potential in the whole unit cell; in general, we need to subslice the electrostatic potential inside the unit cell. It is shown that the ICMS method has higher accuracy than the CMS method for the calculation of the ZOLZ, HOLZ and Pseudo-HOLZ reflections. Hence, ICMS method allows to use a larger slice thickness than the CMS method and reduces the calculation time. (C) 2012 Elsevier B.V. All rights reserved.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000308079200011 Publication Date 2012-01-14  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 6 Open Access  
  Notes Approved Most recent IF: 2.843; 2012 IF: 2.470  
  Call Number UA @ lucian @ c:irua:101902 Serial 1567  
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Author Van Aert, S.; Verbeeck, J.; Erni, R.; Bals, S.; Luysberg, M.; van Dyck, D.; Van Tendeloo, G. pdf  doi
openurl 
  Title Quantitative atomic resolution mapping using high-angle annular dark field scanning transmission electron microscopy Type A1 Journal article
  Year 2009 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 109 Issue 10 Pages 1236-1244  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down) A model-based method is proposed to relatively quantify the chemical composition of atomic columns using high angle annular dark field (HAADF) scanning transmission electron microscopy (STEM) images. The method is based on a quantification of the total intensity of the scattered electrons for the individual atomic columns using statistical parameter estimation theory. In order to apply this theory, a model is required describing the image contrast of the HAADF STEM images. Therefore, a simple, effective incoherent model has been assumed which takes the probe intensity profile into account. The scattered intensities can then be estimated by fitting this model to an experimental HAADF STEM image. These estimates are used as a performance measure to distinguish between different atomic column types and to identify the nature of unknown columns with good accuracy and precision using statistical hypothesis testing. The reliability of the method is supported by means of simulated HAADF STEM images as well as a combination of experimental images and electron energy-loss spectra. It is experimentally shown that statistically meaningful information on the composition of individual columns can be obtained even if the difference in averaged atomic number Z is only 3. Using this method, quantitative mapping at atomic resolution using HAADF STEM images only has become possible without the need of simultaneously recorded electron energy loss spectra.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000270015200004 Publication Date 2009-05-28  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 166 Open Access  
  Notes Fwo; Esteem 026019 Approved Most recent IF: 2.843; 2009 IF: 2.067  
  Call Number UA @ lucian @ c:irua:78585UA @ admin @ c:irua:78585 Serial 2748  
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Author De wael, A.; De Backer, A.; Jones, L.; Nellist, P.D.; Van Aert, S. pdf  url
doi  openurl
  Title Hybrid statistics-simulations based method for atom-counting from ADF STEM images Type A1 Journal article
  Year 2017 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 177 Issue 177 Pages 69-77  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down) A hybrid statistics-simulations based method for atom-counting from annular dark field scanning transmission electron microscopy (ADF STEM) images of monotype crystalline nanostructures is presented. Different atom-counting methods already exist for model-like systems. However, the increasing relevance of radiation damage in the study of nanostructures demands a method that allows atom-counting from low dose images with a low signal-to-noise ratio. Therefore, the hybrid method directly includes prior knowledge from image simulations into the existing statistics-based method for atom-counting, and accounts in this manner for possible discrepancies between actual and simulated experimental conditions. It is shown by means of simulations and experiments that this hybrid method outperforms the statistics-based method, especially for low electron doses and small nanoparticles. The analysis of a simulated low dose image of a small nanoparticle suggests that this method allows for far more reliable quantitative analysis of beam-sensitive materials.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos 000401219800010 Publication Date 2017-01-25  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 8 Open Access OpenAccess  
  Notes The authors acknowledge financial support from the Research Foundation Flanders (FWO, Belgium) through project fundings (G.0374.13N, G.0368.15N, G.0369.15N, and WO.010.16N), and a postdoctoral research Grant to A. De Backer. The research leading to these results has received funding from the European Union Seventh Framework Programme under Grant Agreement 312483 – ESTEEM2 (Integrated Infrastructure Initiative-I3). The authors are grateful to G.T. Martinez for providing image simulations. Approved Most recent IF: 2.843  
  Call Number EMAT @ emat @ c:irua:141718 Serial 4486  
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Author Grieb, T.; Tewes, M.; Schowalter, M.; Müller-Caspary, K.; Krause, F.F.; Mehrtens, T.; Hartmann, J.-M.; Rosenauer, A. pdf  doi
openurl 
  Title Quantitative HAADF STEM of SiGe in presence of amorphous surface layers from FIB preparation Type A1 Journal article
  Year 2018 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 184 Issue B Pages 29-36  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down) <script type='text/javascript'>document.write(unpmarked('The chemical composition of four Si1-xGex layers grown on silicon was determined from quantitative scanning transmission electron microscopy (STEM). The chemical analysis was performed by a comparison of the high-angle annular dark field (HAADF) intensity with multislice simulations. It could be shown that amorphous surface layers originating from the preparation process by focused-ion beam (FIB) at 30 kV have a strong influence on the quantification: the local specimen thickness is overestimated by approximately a factor of two, and the germanium concentration is substantially underestimated. By means of simulations, the effect of amorphous surface layers on the HAADF intensity of crystalline silicon and germanium is investigated. Based on these simulations, a method is developed to analyze the experimental HAADF-STEM images by taking the influence of the amorphous layers into account which is done by a reduction of the intensities by multiplication with a constant factor. This suggested modified HAADF analysis gives germanium concentrations which are in agreement with the nominal values. The same TEM lamella was treated with low-voltage ion milling which removed the amorphous surface layers completely. The results from subsequent quantitative HAADF analyses are in agreement with the nominal concentrations which validates the applicability of the used frozen-lattice based multislice simulations to describe the HAADF scattering of Si1-xGex in STEM. (C) 2017 Elsevier B.V. All rights reserved.'));  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000417779800004 Publication Date 2017-10-14  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 7 Open Access Not_Open_Access  
  Notes ; This work was supported by the German Research Foundation (DFG) under Contract No. RO2057/11-1. ; Approved Most recent IF: 2.843  
  Call Number UA @ lucian @ c:irua:148500 Serial 4893  
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Author Alania, M.; Lobato Hoyos, I.P.; Van Aert, S. pdf  url
doi  openurl
  Title Frozen lattice and absorptive model for high angle annular dark field scanning transmission electron microscopy : a comparison study in terms of integrated intensity and atomic column position measurement Type A1 Journal article
  Year 2018 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 184 Issue A Pages 188-198  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down) <script type='text/javascript'>document.write(unpmarked('In this paper, both the frozen lattice (FL) and the absorptive potential (AP) approximation models are compared in terms of the integrated intensity and the precision with which atomic columns can be located from an image acquired using high angle annular dark field (HAADF) scanning transmission electron microscopy (STEM). The comparison is made for atoms of Cu, Ag, and Au. The integrated intensity is computed for both an isolated atomic column and an atomic column inside an FCC structure. The precision has been computed using the so-called Cramer-Rao Lower Bound (CRLB), which provides a theoretical lower bound on the variance with which parameters can be estimated. It is shown that the AP model results into accurate measurements for the integrated intensity only for small detector ranges under relatively low angles and for small thicknesses. In terms of the attainable precision, both methods show similar results indicating picometer range precision under realistic experimental conditions. (C) 2017 Elsevier B.V. All rights reserved.'));  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000415650200022 Publication Date 2017-09-12  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited Open Access OpenAccess  
  Notes ; The authors acknowledge financial support from the Research Foundation Flanders (FWO, Belgium) through project fundings (G.0374.13N, G.0369.15N, and G.0368.15N). A. Rosenauer is acknowledged for providing the STEMsim program. ; Approved Most recent IF: 2.843  
  Call Number UA @ lucian @ c:irua:147658 Serial 4877  
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Author Zhong, Z.; Aveyard, R.; Rieger, B.; Bals, S.; Palenstijn, W.J.; Batenburg, K.J. pdf  url
doi  openurl
  Title Automatic correction of nonlinear damping effects in HAADF-STEM tomography for nanomaterials of discrete compositions Type A1 Journal article
  Year 2018 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 184 Issue 184 Pages 57-65  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down) <script type='text/javascript'>document.write(unpmarked('HAADF-STEM tomography is a common technique for characterizing the three-dimensional morphology of nanomaterials. In conventional tomographic reconstruction algorithms, the image intensity is assumed to be a linear projection of a physical property of the specimen. However, this assumption of linearity is not completely valid due to the nonlinear damping of signal intensities. The nonlinear damping effects increase w.r.t the specimen thickness and lead to so-called \u0022cupping artifacts\u0022, due to a mismatch with the linear model used in the reconstruction algorithm. Moreover, nonlinear damping effects can strongly limit the applicability of advanced reconstruction approaches such as Total Variation Minimization and discrete tomography. In this paper, we propose an algorithm for automatically correcting the nonlinear effects and the subsequent cupping artifacts. It is applicable to samples in which chemical compositions can be segmented based on image gray levels. The correction is realized by iteratively estimating the nonlinear relationship between projection intensity and sample thickness, based on which the projections are linearized. The correction and reconstruction algorithms are tested on simulated and experimental data. (C) 2017 Elsevier B.V. All rights reserved.'));  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000417779800008 Publication Date 2017-10-31  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 8 Open Access OpenAccess  
  Notes ; This research is supported by the Dutch Technology Foundation STW (http:// www.stw.nl/), which is part of the Netherlands Organization for Scientific Research (NWO), and which is partly funded by the Ministry of Economic Affairs, Agriculture and Innovation under project number 13314. Funding from the European Research Council (Starting grant no. COLOURATOMS 335078) is acknowledged by S. Bals. The authors would like to thank Dr. Thomas Altantzis and Dr. Bart Goris for providing the experimental data, and Prof. Dr. Luis M. Liz-Marzan for providing the investigated samples. ; ecas_sara Approved Most recent IF: 2.843  
  Call Number UA @ lucian @ c:irua:148501UA @ admin @ c:irua:148501 Serial 4867  
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Author Hofer, C.; Gao, C.; Chennit, T.; Yuan, B.; Pennycook, T.J. pdf  url
doi  openurl
  Title Phase offset method of ptychographic contrast reversal correction Type A1 Journal article
  Year 2024 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume Issue Pages 113922  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos 001164447000001 Publication Date 2024-01-08  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record  
  Impact Factor 2.2 Times cited Open Access Not_Open_Access  
  Notes FWO, G013122N ; Horizon 2020 Framework Programme; European Research Council, 802123-HDEM ; European Research Council; Approved Most recent IF: 2.2; 2024 IF: 2.843  
  Call Number EMAT @ emat @c:irua:202379 Serial 8988  
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Author Chen, J.H.; van Dyck, D.; op de Beeck, M.; van Landuyt, J. openurl 
  Title Computational comparisons between the conventional multislice method and the third-order multislice method for calculating high-energy electron diffraction and imaging Type A1 Journal article
  Year 1997 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 69 Issue Pages 219-240  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos A1997YG59500001 Publication Date 0000-00-00  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 11 Open Access  
  Notes Approved Most recent IF: 2.843; 1997 IF: 1.600  
  Call Number UA @ lucian @ c:irua:21416 Serial 455  
Permanent link to this record
 

 
Author Kruse, P.; Schowalter, M.; Lamoen, D.; Rosenauer, A.; Gerthsen, D. doi  openurl
  Title Determination of the mean inner potential in III-V semiconductors, Si and Ge by density functional theory and electron holography Type A1 Journal article
  Year 2006 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 106 Issue 2 Pages 105-113  
  Keywords A1 Journal article; Electron Microscopy for Materials Science (EMAT);  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos 000234535900005 Publication Date 2005-07-29  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 50 Open Access  
  Notes Approved Most recent IF: 2.843; 2006 IF: 1.706  
  Call Number UA @ lucian @ c:irua:56143 Serial 678  
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Author den Dekker, A.J.; Van Aert, S.; van Dyck, D.; van den Bos, A.; Geuens, P. doi  openurl
  Title Does a monochromator improve the precision in quantitative HRTEM? Type A1 Journal article
  Year 2001 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 89 Issue Pages 275-290  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000172667000004 Publication Date 2002-07-25  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 22 Open Access  
  Notes Approved Most recent IF: 2.843; 2001 IF: 1.890  
  Call Number UA @ lucian @ c:irua:47518 Serial 746  
Permanent link to this record
 

 
Author Van Aert, S.; Geuens, P.; van Dyck, D.; Kisielowski, C.; Jinschek, J.R. doi  openurl
  Title Electron channelling based crystallography Type A1 Journal article
  Year 2007 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 107 Issue 6/7 Pages 551-558  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000245341300015 Publication Date 2006-12-13  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 32 Open Access  
  Notes Approved Most recent IF: 2.843; 2007 IF: 1.996  
  Call Number UA @ lucian @ c:irua:64286 Serial 913  
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Author Luyten, W.; Krekels, T.; Amelinckx, S.; Van Tendeloo, G.; van Dyck, D.; van Landuyt, J. doi  openurl
  Title Electron diffraction effects of conical, helically wound, graphite whiskers Type A1 Journal article
  Year 1993 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 49 Issue Pages 123-131  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos A1993KV56700014 Publication Date 2002-10-18  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.436 Times cited 14 Open Access  
  Notes Approved no  
  Call Number UA @ lucian @ c:irua:6784 Serial 917  
Permanent link to this record
 

 
Author Goessens, C.; Schryvers, D.; van Landuyt, J.; de Keyzer, R. doi  openurl
  Title In situ HREM study of electron irradiation effects in AgCl microcrystals Type A1 Journal article
  Year 1992 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 40 Issue Pages 151-162  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos A1992HN13400005 Publication Date 2002-10-18  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.436 Times cited 10 Open Access  
  Notes Approved no  
  Call Number UA @ lucian @ c:irua:4094 Serial 1581  
Permanent link to this record
 

 
Author Fanidis, C.; van Dyck, D.; van Landuyt, J. doi  openurl
  Title Inelastic scattering of high-energy electrons in a crystal in thermal equilibrium with the environment: 1: theoretical framework Type A1 Journal article
  Year 1992 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 41 Issue Pages 55-64  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos A1992HX68100005 Publication Date 2002-10-18  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.436 Times cited 17 Open Access  
  Notes Approved no  
  Call Number UA @ lucian @ c:irua:4092 Serial 1608  
Permanent link to this record
 

 
Author Fanidis, C.; van Dyck, D.; van Landuyt, J. openurl 
  Title Inelastic scattering of high-energy electrons in a crystal in thermal equilibrium with the environment: part 2: solution of the equations and applications to concrete cases Type A1 Journal article
  Year 1993 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 48 Issue Pages 133-164  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos A1993KM78800013 Publication Date 0000-00-00  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.436 Times cited 6 Open Access  
  Notes Approved no  
  Call Number UA @ lucian @ c:irua:6782 Serial 1609  
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Author Dunin-Borkowski, R.E.; Lichte, H.; Tillmann, K.; Van Aert, S.; Van Tendeloo, G. pdf  url
doi  openurl
  Title Introduction to a special issue in honour of W. Owen Saxton, David J. Smith and Dirk Van Dyck on the occasion of their 65th birthdays Type Editorial
  Year 2013 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 134 Issue Pages 1-1  
  Keywords Editorial; Electron microscopy for materials research (EMAT)  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Elsevier science bv Place of Publication Amsterdam Editor  
  Language Wos 000324474900001 Publication Date 2013-07-24  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 1 Open Access  
  Notes Approved Most recent IF: 2.843; 2013 IF: 2.745  
  Call Number UA @ lucian @ c:irua:109917 Serial 1721  
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Author van Dyck, D.; Van Aert, S.; den Dekker, A.J.; van den Bos, A. doi  openurl
  Title Is atomic resolution transmission electron microscopy able to resolve and refine amorphous structures? Type A1 Journal article
  Year 2003 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 98 Issue Pages 27-42  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000186831500003 Publication Date 2003-04-25  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 26 Open Access  
  Notes Approved Most recent IF: 2.843; 2003 IF: 1.665  
  Call Number UA @ lucian @ c:irua:47516 Serial 1749  
Permanent link to this record
 

 
Author den Dekker, A.J.; Van Aert, S.; van den Bos, A.; van Dyck, D. pdf  doi
openurl 
  Title Maximum likelihood estimation of structure parameters from high resolution electron microscopy images: part 1: a theoretical framework Type A1 Journal article
  Year 2005 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 104 Issue 2 Pages 83-106  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000230526400001 Publication Date 2005-04-09  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 70 Open Access  
  Notes Approved Most recent IF: 2.843; 2005 IF: 2.490  
  Call Number UA @ lucian @ c:irua:57229 Serial 1959  
Permanent link to this record
 

 
Author Van Aert, S.; den Dekker, A.J.; van den Bos, A.; van Dyck, D.; Chen, J.H. pdf  doi
openurl 
  Title Maximum likelihood estimation of structure parameters from high resolution electron microscopy images : part 2 : a practical example Type A1 Journal article
  Year 2005 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 104 Issue 2 Pages 107-125  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000230526400002 Publication Date 2005-04-08  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 37 Open Access  
  Notes Approved Most recent IF: 2.843; 2005 IF: 2.490  
  Call Number UA @ lucian @ c:irua:57131 Serial 1960  
Permanent link to this record
 

 
Author Potapov, P.L.; Schryvers, D. doi  openurl
  Title Measuring the absolute position of EELS ionisation edges in a TEM Type A1 Journal article
  Year 2004 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 99 Issue Pages 73-85  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000220804700005 Publication Date 2003-08-12  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 29 Open Access  
  Notes Approved Most recent IF: 2.843; 2004 IF: 2.215  
  Call Number UA @ lucian @ c:irua:48781 Serial 1970  
Permanent link to this record
 

 
Author Van Aert, S.; den Dekker, A.J.; van Dyck, D.; van den Bos, A. doi  openurl
  Title Optimal experimental design of STEM measurement of atom column positions Type A1 Journal article
  Year 2002 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 90 Issue Pages 273-289  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos 000174770900004 Publication Date 2002-07-25  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.843 Times cited 35 Open Access  
  Notes Approved Most recent IF: 2.843; 2002 IF: 1.772  
  Call Number UA @ lucian @ c:irua:47517 Serial 2483  
Permanent link to this record
 

 
Author Zhang, X.B.; Zhang, X.F.; Amelinckx, S.; Van Tendeloo, G.; van Landuyt, J. doi  openurl
  Title The reciprocal space of carbon tubes: a detailed interpretation of the electron diffraction effects Type A1 Journal article
  Year 1994 Publication Ultramicroscopy Abbreviated Journal Ultramicroscopy  
  Volume 54 Issue Pages 237-249  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract (down)  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Amsterdam Editor  
  Language Wos A1994PA59800016 Publication Date 2002-10-18  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0304-3991; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 2.436 Times cited 59 Open Access  
  Notes Approved  
  Call Number UA @ lucian @ c:irua:10006 Serial 2844  
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