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Author  |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Tit, N.; Al Ezzi, M.M.; Abdullah, H.M.; Yusupov, M.; Kouser, S.; Bahlouli, H.; Yamani, Z.H. |
Detection of CO2 using CNT-based sensors: Role of Fe catalyst on sensitivity and selectivity |
2017 |
Materials chemistry and physics |
186 |
17 |
UA library record; WoS full record; WoS citing articles |
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Tirumalasetty, G.K.; van Huis, M.A.; Kwakernaak, C.; Sietsma, J.; Sloof, W.G.; Zandbergen, H.W. |
Deformation-induced austenite grain rotation and transformation in TRIP-assisted steel |
2012 |
Acta materialia |
60 |
80 |
UA library record; WoS full record; WoS citing articles |
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Tirumalasetty, G.K.; van Huis, M.A.; Fang, C.M.; Xu, Q.; Tichelaar, F.D.; Hanlon, D.N.; Sietsma, J.; Zandbergen, H.W. |
Characterization of NbC and (Nb, Ti)N nanoprecipitates in TRIP assisted multiphase steels |
2011 |
Acta materialia |
59 |
58 |
UA library record; WoS full record; WoS citing articles |
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Tirry, W.; Schryvers, D.; Jorissen, K.; Lamoen, D. |
Electron-diffraction structure refinement of Ni4Ti3 precipitates in Ni52Ti48 |
2006 |
Acta crystallographica: section B: structural science |
62 |
30 |
UA library record; WoS full record; WoS citing articles |
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Tirry, W.; Schryvers, D.; Jorissen, K.; Lamoen, D. |
Quantitative determination of the crystal structure of Ni4Ti3 precipitates |
2006 |
Materials science and engineering: part A: structural materials: properties, microstructure and processing |
438 |
7 |
UA library record; WoS full record; WoS citing articles |
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Tirry, W.; Schryvers, D. |
3D strain fields surrounding Ni4Ti3: direct measurement and correlation with the R-phase |
2009 |
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UA library record; WoS full record |
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Tirry, W.; Schryvers, D. |
High resolution TEM study of Ni4Ti3 precipitates in austenitic Ni51Ti49 |
2004 |
Materials science and engineering: part A: structural materials: properties, microstructure and processing |
378 |
19 |
UA library record; WoS full record; WoS citing articles |
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Tirry, W.; Schryvers, D. |
In situ transmission electron microscopy of stress-induced martensite with focus on martensite twinning |
2008 |
Materials science and engineering: part A: structural materials: properties, microstructure and processing |
481 |
22 |
UA library record; WoS full record; WoS citing articles |
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Tirry, W.; Schryvers, D. |
Linking a completely three-dimensional nanostrain to a structural transformation eigenstrain |
2009 |
Nature materials |
8 |
53 |
UA library record; WoS full record; WoS citing articles |
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Tirry, W.; Schryvers, D. |
Quantitative determination of strain fields around Ni4Ti3 precipitates in NiTi |
2005 |
Acta materialia |
53 |
97 |
UA library record; WoS full record; WoS citing articles |
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Tirry, W.; Coghe, F.; Bouvier, S.; Gasperini, M.; Rabet, L.; Schryvers, D. |
A multi-scale characterization of deformation twins in Ti6Al4V sheet material deformed by simple shear |
2010 |
Materials science and engineering: part A: structural materials: properties, microstructure and processing |
527 |
20 |
UA library record; WoS full record; WoS citing articles |
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Tirry, W.; Bouvier, S.; Benmhenni, N.; Hammami, W.; Habraken, A.M.; Coghe, F.; Schryvers, D.; Rabet, L. |
Twinning in pure Ti subjected to monotonic simple shear deformation |
2012 |
Materials characterization |
72 |
25 |
UA library record; WoS full record; WoS citing articles |
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Tirez, K.; Vanhoof, C.; Bronders, J.; Seuntjens, P.; Bleux, N.; Berghmans, P.; De Brucker, N.; Vanhaecke, F. |
Do ICP-MS based methods fulfill the EU monitoring requirements for the determination of elements in our environment? |
2015 |
Environmental science : processes & impacts |
17 |
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UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Tillocher, T.; Georgieva, V.; Dussart, R.; Neyts, E.; Bogaerts, A. |
Concurrent effects of wafer temperature and oxygen fraction on cryogenic silicon etching with SF6/O2plasmas |
2017 |
Plasma processes and polymers |
14 |
|
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. |
Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation |
2016 |
Journal of physics: D: applied physics |
49 |
1 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. |
Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study |
2015 |
Journal of physics: D: applied physics |
48 |
9 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Neyts, E.C.; Bogaerts, A. |
Fluorinesilicon surface reactions during cryogenic and near room temperature etching |
2014 |
The journal of physical chemistry: C : nanomaterials and interfaces |
118 |
11 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; De Schepper, P.; Bogaerts, A. |
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas |
2013 |
Plasma processes and polymers |
10 |
3 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Boullart, W.; Bogaerts, A. |
Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments |
2009 |
Journal of physics: D: applied physics |
42 |
23 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Boullart, W.; Bogaerts, A. |
Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
31 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Bogaerts, A.; Shamiryan, D. |
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma |
2011 |
Plasma processes and polymers |
8 |
5 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
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|
Tinck, S.; Bogaerts, A. |
Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry |
2016 |
Journal of physics: D: applied physics |
49 |
5 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Bogaerts, A. |
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon |
2016 |
Journal of physics: D: applied physics |
49 |
|
UA library record; WoS full record; WoS citing articles |
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Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. |
Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation |
2014 |
Plasma processes and polymers |
11 |
1 |
UA library record; WoS full record; WoS citing articles |
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Tinck, S. |
Numerical simulations of inductively coupled plasmas for applications in the microelectronics industry |
2011 |
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UA library record |
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Timmis, K.; de Vos, W.M.; Luis Ramos, J.; Vlaeminck, S.E.; Prieto, A.; Danchin, A.; Verstraete, W.; de Lorenzo, V.; Lee, S.Y.; Brussow, H.; Timmis, J.K.; Singh, B.K. |
The contribution of microbial biotechnology to sustainable development goals |
2017 |
Microbial biotechnology |
10 |
|
UA library record; WoS full record; WoS citing articles |
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Tilleman, L.; De Henau, S.; Pauwels, M.; Nagy, N.; Pintelon, I.; Braeckman, B.P.; De Wael, K.; Van Doorslaer, S.; Adriaensen, D.; Timmermans, J.-P.; Moens, L.; Dewilde, S. |
An N-myristoylated globin with a redox-sensing function that regulates the defecation cycle in Caenorhabditis elegans |
2012 |
PLoS ONE |
7 |
6 |
UA library record; WoS full record; WoS citing articles |
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