Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Bogaerts, A.; Eckert, M.; Mao, M.; Neyts, E. |
Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials |
2011 |
Journal of physics: D: applied physics |
44 |
25 |
UA library record; WoS full record; WoS citing articles |
Kolev, I.; Bogaerts, A. |
Numerical models of the planar magnetron glow discharges |
2004 |
Contributions to plasma physics |
44 |
22 |
UA library record; WoS full record; WoS citing articles |
Mao, M.; Wang, Y.N.; Bogaerts, A. |
Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications |
2011 |
Journal of physics: D: applied physics |
44 |
20 |
UA library record; WoS full record; WoS citing articles |
Mao, M.; Bogaerts, A. |
Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system : the effect of different gas mixtures |
2010 |
Journal of physics: D: applied physics |
43 |
52 |
UA library record; WoS full record; WoS citing articles |
Mao, M.; Bogaerts, A. |
Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma-enhanced CVD system : the effect of processing parameters |
2010 |
Journal of physics: D: applied physics |
43 |
17 |
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. |
The origin of Bohm diffusion, investigated by a comparison of different modelling methods |
2010 |
Journal of physics: D: applied physics |
43 |
16 |
UA library record; WoS full record; WoS citing articles |
Yusupov, M.; Privat-Maldonado, A.; Cordeiro, R.M.; Verswyvel, H.; Shaw, P.; Razzokov, J.; Smits, E.; Bogaerts, A. |
Oxidative damage to hyaluronan–CD44 interactions as an underlying mechanism of action of oxidative stress-inducing cancer therapy |
2021 |
Redox Biology |
43 |
|
UA library record; WoS full record; WoS citing articles |
Cui, Z.; Zhou, C.; Jafarzadeh, A.; Zhang, X.; Hao, Y.; Li, L.; Bogaerts, A. |
SF₆ degradation in γ-Al₂O₃ packed DBD system : effects of hydration, reactive gases and plasma-induced surface charges |
2023 |
Plasma chemistry and plasma processing |
43 |
|
UA library record; WoS full record; WoS citing articles |
Bogaerts, A. |
Special Issue on “Dielectric Barrier Discharges and their Applications” in Commemoration of the 20th Anniversary of Dr. Ulrich Kogelschatz’s Work |
2023 |
Plasma Chemistry and Plasma Processing |
43 |
|
UA library record; WoS full record |
Lin, A.; Gromov, M.; Nikiforov, A.; Smits, E.; Bogaerts, A. |
Characterization of Non-Thermal Dielectric Barrier Discharges for Plasma Medicine: From Plastic Well Plates to Skin Surfaces |
2023 |
Plasma Chemistry and Plasma Processing |
43 |
|
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Bultinck, E.; Kolev, I.; Schwaederlé, L.; van Aeken, K.; Buyle, G.; Depla, D. |
Computer modelling of magnetron discharges |
2009 |
Journal of physics: D: applied physics |
42 |
32 |
UA library record; WoS full record; WoS citing articles |
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Fluid modelling of an atmospheric pressure dielectric barrier discharge in cylindrical geometry |
2009 |
Journal of physics: D: applied physics |
42 |
29 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Boullart, W.; Bogaerts, A. |
Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments |
2009 |
Journal of physics: D: applied physics |
42 |
23 |
UA library record; WoS full record; WoS citing articles |
Martens, T.; Brok, W.J.M.; van Dijk, J.; Bogaerts, A. |
On the regime transitions during the formation of an atmospheric pressure dielectric barrier glow discharge |
2009 |
Journal of physics: D: applied physics |
42 |
21 |
UA library record; WoS full record; WoS citing articles |
van Dijk, J.; Kroesen, G.M.W.; Bogaerts, A. |
Plasma modelling and numerical simulation |
2009 |
Journal of physics: D: applied physics |
42 |
64 |
UA library record; WoS full record; WoS citing articles |
Georgieva, V.; Saraiva, M.; Jehanathan, N.; Lebelev, O.I.; Depla, D.; Bogaerts, A. |
Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments |
2009 |
Journal of physics: D: applied physics |
42 |
37 |
UA library record; WoS full record; WoS citing articles |
Dinh, D.K.; Trenchev, G.; Lee, D.H.; Bogaerts, A. |
Arc plasma reactor modification for enhancing performance of dry reforming of methane |
2020 |
Journal Of Co2 Utilization |
42 |
|
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Bogaerts, A. |
The effect of the magnetic field strength on the sheath region of a dc magnetron discharge |
2008 |
Journal of physics: D: applied physics |
41 |
16 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
Modeling of radio-frequency and direct current glow discharges in argon |
2000 |
Journal of technical physics |
41 |
|
UA library record |
Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. |
New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
47 |
UA library record; WoS full record; WoS citing articles |
Eckert, M.; Neyts, E.; Bogaerts, A. |
On the reaction behaviour of hydrocarbon species at diamond (1 0 0) and (1 1 1) surfaces: a molecular dynamics investigation |
2008 |
Journal of physics: D: applied physics |
41 |
17 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Boullart, W.; Bogaerts, A. |
Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
31 |
UA library record; WoS full record; WoS citing articles |
de Keyser, A.; Bogaerts, R.; Karavolas, V.C.; van Bockstal, L.; Herlach, F.; Peeters, F.M.; van de Graaf, W.; Borghs, G. |
Interplay of 2D and 3D charge carriers in Si-δ-doped InSb layers grown epitaxially on GaAs |
1996 |
Solid state electronics |
40 |
2 |
UA library record; WoS full record; WoS citing articles |
Zhang, Q.-Z.; Wang, W.Z.; Thille, C.; Bogaerts, A. |
H2S Decomposition into H2 and S2 by Plasma Technology: Comparison of Gliding Arc and Microwave Plasma |
2020 |
Plasma Chemistry And Plasma Processing |
40 |
|
UA library record; WoS full record; WoS citing articles |
Neyts, E.; Bogaerts, A.; van de Sanden, M.C.M. |
Densification of thin a-C: H films grown from low-kinetic energy hydrocarbon radicals under the influence of H and C particle fluxes: a molecular dynamics study |
2006 |
Journal of physics: D: applied physics |
39 |
3 |
UA library record; WoS full record; WoS citing articles |
Trenchev, G.; Bogaerts, A. |
Dual-vortex plasmatron: A novel plasma source for CO2 conversion |
2020 |
Journal Of Co2 Utilization |
39 |
|
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: combined Monte Carlo and fluid model |
1999 |
Japanese journal of applied physics |
38 |
45 |
UA library record; WoS full record; WoS citing articles |
Snoeckx, R.; Setareh, M.; Aerts, R.; Simon, P.; Maghari, A.; Bogaerts, A. |
Influence of N2 concentration in a CH4/N2 dielectric barrier discharge used for CH4 conversion into H2 |
2013 |
International journal of hydrogen energy |
38 |
40 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, R.; de Keyser, A.; Herlach, F.; Peeters, F.M.; DeRosa, F.; Palmstrøm, C.J.; Brehmer, D.; Allen, S.J. |
Size effects in the transport properties of thin Sc1-xErxAs epitaxial layers buried in GaAs |
1994 |
Solid state electronics |
37 |
4 |
UA library record; WoS full record; WoS citing articles |
de Bleecker, K.; Herrebout, D.; Bogaerts, A.; Gijbels, R.; Descamps, P. |
One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2 |
2003 |
Journal of physics: D: applied physics |
36 |
|
UA library record; WoS full record; WoS citing articles |