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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links  |
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Delabie, A.; Sioncke, S.; Rip, J.; Van Elshocht, S.; Pourtois, G.; Mueller, M.; Beckhoff, B.; Pierloot, K. |
Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates |
2012 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
30 |
41 |
UA library record; WoS full record; WoS citing articles |
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Dubourdieu, C.; Rauwel, E.; Roussel, H.; Ducroquet, F.; Hollaender, B.; Rossell, M.; Van Tendeloo, G.; Lhostis, S.; Rushworth, S. |
Addition of yttrium into HfO2 films: microstructure and electrical properties |
2009 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
27 |
29 |
UA library record; WoS full record; WoS citing articles |
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Wu, M.F.; Zhou, S.; Yao, S.; Zhao, Q.; Vantomme, A.; van Daele, B.; Piscopiello, E.; Van Tendeloo, G.; Tong, Y.Z.; Yang, Z.J.; Yu, T.J.; Zhang, G.Y. |
High precision determination of the elastic strain of InGaN/GaN multiple quantum wells |
2004 |
Journal of vacuum science and technology: B: microelectronics and nanometer structures |
22 |
15 |
UA library record; WoS full record; WoS citing articles |
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Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
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Lubyshev, D.; Fastenau, J.M.; Fang, X.-M.; Wu, Y.; Doss, C.; Snyder, A.; Liu, W.K.; Lamb, M.S.M.; Bals, S.; Song, C. |
Comparison of As- and P-based metamorphic buffers for high performance InP heterojunction bipolar transistor and high electron mobility transistor applications |
2004 |
Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena |
22 |
25 |
UA library record; WoS full record; WoS citing articles |
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Tytgat, T.; Smits, M.; Lenaerts, S.; Verbruggen, S.W. |
Immobilization of TiO2 into self-supporting photocatalytic foam : influence of calcination temperature |
2014 |
International journal of applied ceramic technology |
11 |
2 |
UA library record; WoS full record; WoS citing articles |
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Borkowski, R.; Straub, M.; Ou, Y.; Lefevre, Y.; Jelić, Ž.L.; Lanneer, W.; Kaneda, N.; Mahadevan, A.; Hueckstaedt, V.; van Veen, D.; Houtsma, V.; Coomans, W.; Bonk, R.; Maes, J. |
FLCS-PON : a 100 Gbit/s flexible passive optical network: concepts and field trial |
2021 |
Journal Of Lightwave Technology |
39 |
|
UA library record; WoS full record; WoS citing articles |
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Van Aert, S.; den Dekker, A.J.; van den Bos, A.; Van Dyck, D. |
High resolution electron microscopy from imaging towards measuring |
2001 |
... IEEE International Instrumentation and Measurement Technology Conference
T2 – Rediscovering measurement in the age of informatics : proceedings of the 18th IEEE Instrumentation and Measurement Technology Conference (IMTC), 2001: vol 3 |
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UA library record |
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Reyntjens, P.; Van de Put, M.; Vandenberghe, W.G.; Sorée, B. |
Ultrascaled graphene-capped interconnects : a quantum mechanical study |
2023 |
Proceedings of the IEEE ... International Interconnect Technology Conference
T2 – IEEE International Interconnect Technology Conference (IITC) / IEEE, Materials for Advanced Metallization Conference (MAM), MAY 22-25, 2023, Dresden, Germany |
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UA library record; WoS full record |
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Adelmann, C.; Sankaran, K.; Dutta, S.; Gupta, A.; Kundu, S.; Jamieson, G.; Moors, K.; Pinna, N.; Ciofi, I.; Van Elshocht, S.; Bommels, J.; Boccardi, G.; Wilson, C.J.; Pourtois, G.; Tokei, Z. |
Alternative Metals: from ab initio Screening to Calibrated Narrow Line Models |
2018 |
Proceedings of the IEEE ... International Interconnect Technology Conference
T2 – IEEE International Interconnect Technology Conference (IITC), JUN 04-07, 2018, Santa Clara, CA |
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UA library record; WoS full record; WoS citing articles |
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Linek, J.; Wyszynski, M.; Müller, B.; Korinski, D.; Milošević, M.V.; Kleiner, R.; Koelle, D. |
On the coupling of magnetic moments to superconducting quantum interference devices |
2024 |
Superconductor science and technology |
37 |
|
UA library record; WoS full record |
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Kenawy, A.; Magnus, W.; Milošević, M.V.; Sorée, B. |
Electronically tunable quantum phase slips in voltage-biased superconducting rings as a base for phase-slip flux qubits |
2020 |
Superconductor Science & Technology |
33 |
4 |
UA library record; WoS full record; WoS citing articles |
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Stafford, B.H.; Sieger, M.; Ottolinger, R.; Meledin, A.; Strickland, N.M.; Wimbush, S.C.; Van Tendeloo, G.; Huehne, R.; Schultz, L. |
Tilted BaHfO3 nanorod artificial pinning centres in REBCO films on inclined substrate deposited-MgO coated conductor templates |
2017 |
Superconductor science and technology |
30 |
6 |
UA library record; WoS full record; WoS citing articles |
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Zebrowski, D.P.; Peeters, F.M.; Szafran, B. |
Driven spin transitions in fluorinated single- and bilayer-graphene quantum dots |
2017 |
Semiconductor science and technology |
32 |
|
UA library record; WoS full record |
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Biondo, O.; Hughes, A.; van der Steeg, A.; Maerivoet, S.; Loenders, B.; van Rooij, G.; Bogaerts, A. |
Power concentration determined by thermodynamic properties in complex gas mixtures : the case of plasma-based dry reforming of methane |
2023 |
Plasma sources science and technology |
32 |
|
UA library record; WoS full record; WoS citing articles |
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Osca, J.; Moors, K.; Sorée, B.; Serra, L. |
Fabry-Perot interferometry with gate-tunable 3D topological insulator nanowires |
2021 |
Nanotechnology |
32 |
|
UA library record; WoS full record; WoS citing articles |
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Zhang, R.; Wu, Z.; Li, X.J.; Li, L.L.; Chen, Q.; Li, Y.-M.; Peeters, F.M. |
Fano resonances in bilayer phosphorene nanoring |
2018 |
Nanotechnology |
29 |
4 |
UA library record; WoS full record; WoS citing articles |
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Petrovic, M.D.; Milovanović, S.P.; Peeters, F.M. |
Scanning gate microscopy of magnetic focusing in graphene devices : quantum versus classical simulation |
2017 |
Nanotechnology |
28 |
7 |
UA library record; WoS full record; WoS citing articles |
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Li, L.L.; Moldovan, D.; Xu, W.; Peeters, F.M. |
Electric-and magnetic-field dependence of the electronic and optical properties of phosphorene quantum dots |
2017 |
Nanotechnology |
28 |
32 |
UA library record; WoS full record; WoS citing articles |
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Saeed, A.; Khan, A.W.; Shafiq, M.; Jan, F.; Abrar, M.; Zaka-ul-Islam, M.; Zakaullah, M. |
Investigation of 50 Hz pulsed DC nitrogen plasma with active screen cage by trace rare gas optical emission spectroscopy |
2014 |
Plasma science & technology |
16 |
5 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
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Kozák, T.; Bogaerts, A. |
Splitting of CO2 by vibrational excitation in non-equilibrium plasmas : a reaction kinetics model |
2014 |
Plasma sources science and technology |
23 |
170 |
UA library record; WoS full record; WoS citing articles |
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Van Gaens, W.; Bogaerts, A. |
Reaction pathways of biomedically active species in an Ar plasma jet |
2014 |
Plasma sources science and technology |
23 |
34 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
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Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. |
Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges |
2013 |
Plasma sources science and technology |
22 |
20 |
UA library record; WoS full record; WoS citing articles |
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Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
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Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
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Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
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Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
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