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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
Heirman, P.; Verloy, R.; Baroen, J.; Privat-Maldonado, A.; Smits, E.; Bogaerts, A. |
Liquid treatment with a plasma jet surrounded by a gas shield: effect of the treated substrate and gas shield geometry on the plasma effluent conditions |
2024 |
Journal of physics: D: applied physics |
57 |
|
UA library record; WoS full record |
|
|
Wang, W.; Berthelot, A.; Zhang, Q.; Bogaerts, A. |
Modelling of plasma-based dry reforming: how do uncertainties in the input data affect the calculation results? |
2018 |
Journal of physics: D: applied physics |
51 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Khosravian, N.; Van der Paal, J.; Verlackt, C.C.W.; Yusupov, M.; Kamaraj, B.; Neyts, E.C. |
Multi-level molecular modelling for plasma medicine |
2016 |
Journal of physics: D: applied physics |
49 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
Khalilov, U.; Bogaerts, A.; Hussain, S.; Kovacevic, E.; Brault, P.; Boulmer-Leborgne, C.; Neyts, E.C. |
Nanoscale mechanisms of CNT growth and etching in plasma environment |
2017 |
Journal of physics: D: applied physics |
50 |
6 |
UA library record; WoS full record; WoS citing articles |
|
|
Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. |
New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
47 |
UA library record; WoS full record; WoS citing articles |
|
|
Khalili, M.; Daniels, L.; Lin, A.; Krebs, F.C.; Snook, A.E.; Bekeschus, S.; Bownel, W.B.; Miller, V. |
Non-thermal plasma-induced immunogenic cell death in cancer |
2019 |
Journal of physics: D: applied physics |
52 |
6 |
UA library record; WoS full record; WoS citing articles |
|
|
Kong, L.; Wang, W.; Murphy, A.B.; Xia, G. |
Numerical analysis of direct-current microdischarge for space propulsion applications using the particle-in-cell/Monte Carlo collision (PIC/MCC) method |
2017 |
Journal of physics: D: applied physics |
50 |
8 |
UA library record; WoS full record; WoS citing articles |
|
|
Gul, B.; Tinck, S.; De Schepper, P.; Aman-ur-Rehman; Bogaerts, A. |
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching |
2015 |
Journal of physics: D: applied physics |
48 |
7 |
UA library record; WoS full record; WoS citing articles |
|
|
Mao, M.; Wang, Y.N.; Bogaerts, A. |
Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications |
2011 |
Journal of physics: D: applied physics |
44 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
Eckert, M.; Neyts, E.; Bogaerts, A. |
On the reaction behaviour of hydrocarbon species at diamond (1 0 0) and (1 1 1) surfaces: a molecular dynamics investigation |
2008 |
Journal of physics: D: applied physics |
41 |
17 |
UA library record; WoS full record; WoS citing articles |
|
|
Martens, T.; Brok, W.J.M.; van Dijk, J.; Bogaerts, A. |
On the regime transitions during the formation of an atmospheric pressure dielectric barrier glow discharge |
2009 |
Journal of physics: D: applied physics |
42 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
de Bleecker, K.; Herrebout, D.; Bogaerts, A.; Gijbels, R.; Descamps, P. |
One-dimensional modelling of a capacitively coupled rf plasma in silane/helium, including small concentrations of O2 and N2 |
2003 |
Journal of physics: D: applied physics |
36 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Boschker, H.; Huijben, M.; Vailinois, A.; Verbeeck, J.; Van Aert, S.; Luysberg, M.; Bals, S.; Van Tendeloo, G.; Houwman, E.P.; Koster, G.; Blank, D.H.A.; Rijnders, G. |
Optimized fabrication of high-quality La0.67Sr0.33MnO3 thin films considering all essential characteristics |
2011 |
Journal of physics: D: applied physics |
44 |
99 |
UA library record; WoS full record; WoS citing articles |
|
|
Verswyvel, H.; Deben, C.; Wouters, A.; Lardon, F.; Bogaerts, A.; Smits, E.; Lin, A. |
Phototoxicity and cell passage affect intracellular reactive oxygen species levels and sensitivity towards non-thermal plasma treatment in fluorescently-labeled cancer cells |
2023 |
Journal of physics: D: applied physics |
56 |
|
UA library record; WoS full record; WoS citing articles |
|
|
van Dijk, J.; Kroesen, G.M.W.; Bogaerts, A. |
Plasma modelling and numerical simulation |
2009 |
Journal of physics: D: applied physics |
42 |
64 |
UA library record; WoS full record; WoS citing articles |
|
|
Yusupov, M.; Neyts, E.C.; Simon, P.; Berdiyorov, G.; Snoeckx, R.; van Duin, A.C.T.; Bogaerts, A. |
Reactive molecular dynamics simulations of oxygen species in a liquid water layer of interest for plasma medicine |
2014 |
Journal of physics: D: applied physics |
47 |
51 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, C.; Ren, K.; Wang, S.; Luo, Y.; Tang, W.; Sun, M. |
Recent progress on two-dimensional van der Waals heterostructures for photocatalytic water splitting : a selective review |
2023 |
Journal of physics: D: applied physics |
56 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Tinck, S.; Bogaerts, A. |
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon |
2016 |
Journal of physics: D: applied physics |
49 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Ozkan, A.; Bogaerts, A.; Reniers, F. |
Routes to increase the conversion and the energy efficiency in the splitting of CO2by a dielectric barrier discharge |
2017 |
Journal of physics: D: applied physics |
50 |
28 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, Q.-Z.; Zhao, S.-X.; Jiang, W.; Wang, Y.-N. |
Separate control between geometrical and electrical asymmetry effects in capacitively coupled plasmas |
2012 |
Journal of physics: D: applied physics |
45 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
31 |
UA library record; WoS full record; WoS citing articles |
|
|
Rubino, S.; Schattschneider, P.; Rusz, J.; Verbeeck, J.; Leifer, K. |
Simulation of magnetic circular dichroism in the electron microscope |
2010 |
Journal of physics: D: applied physics |
43 |
13 |
UA library record; WoS full record; WoS citing articles |
|
|
Zhang, S.; Van Gaens, W.; van Gessel, B.; Hofmann, S.; van Veldhuizen, E.; Bogaerts, A.; Bruggeman, P. |
Spatially resolved ozone densities and gas temperatures in a time modulated RF driven atmospheric pressure plasma jet : an analysis of the production and destruction mechanisms |
2013 |
Journal of physics: D: applied physics |
46 |
74 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Neyts, E.C.; Rousseau, A. |
Special issue on fundamentals of plasmasurface interactions |
2014 |
Journal of physics: D: applied physics |
47 |
2 |
UA library record; WoS full record; WoS citing articles |
|
|
Georgieva, V.; Saraiva, M.; Jehanathan, N.; Lebelev, O.I.; Depla, D.; Bogaerts, A. |
Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments |
2009 |
Journal of physics: D: applied physics |
42 |
37 |
UA library record; WoS full record; WoS citing articles |
|
|
Van der Paal, J.; Verlackt, C.C.; Yusupov, M.; Neyts, E.C.; Bogaerts, A. |
Structural modification of the skin barrier by OH radicals : a reactive molecular dynamics study for plasma medicine |
2015 |
Journal of physics: D: applied physics |
48 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
Lauwens, J.; Kerkhofs, L.; Sala, A.; Sorée, B. |
Superconductor-semiconductor hybrid capacitance with a nonlinear charge-voltage profile |
2024 |
Journal of physics: D: applied physics |
57 |
|
UA library record; WoS full record |
|
|
Ghica, C.; Nistor, L.C.; Bender, H.; Richard, O.; Van Tendeloo, G.; Ulyashin, A. |
TEM characterization of extended defects induced in Si wafers by H-plasma treatment |
2007 |
Journal of physics: D: applied physics |
40 |
10 |
UA library record; WoS full record; WoS citing articles |
|
|
Adamovich, I.; Baalrud, S.D.; Bogaerts, A.; Bruggeman, P.J.; Cappelli, M.; Colombo, V.; Czarnetzki, U.; Ebert, U.; Eden, J.G.; Favia, P.; Graves, D.B.; Hamaguchi, S.; Hieftje, G.; Hori, M.; Kaganovich, I.D.; Kortshagen, U.; Kushner, M.J.; Mason, N.J.; Mazouffre, S.; Thagard, S.M.; Metelmann, H.-R.; Mizuno, A.; Moreau, E.; Murphy, A.B.; Niemira, B.A.; Oehrlein, G.S.; Petrovic, Z.L.; Pitchford, L.C.; Pu, Y.-K.; Rauf, S.; Sakai, O.; Samukawa, S.; Starikovskaia, S.; Tennyson, J.; Terashima, K.; Turner, M.M.; van de Sanden, M.C.M.; Vardelle, A. |
The 2017 Plasma Roadmap: Low temperature plasma science and technology |
2017 |
Journal of physics: D: applied physics |
50 |
246 |
UA library record; WoS full record; WoS citing articles |
|
|
Bultinck, E.; Bogaerts, A. |
The effect of the magnetic field strength on the sheath region of a dc magnetron discharge |
2008 |
Journal of physics: D: applied physics |
41 |
16 |
UA library record; WoS full record; WoS citing articles |
|