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Author van Dyck, D.; Van Aert, S.; den Dekker, A.J. doi  openurl
  Title Physical limits on atomic resolution Type A1 Journal article
  Year 2004 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal  
  Volume 10 Issue Pages 153-157  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Cambridge, Mass. Editor  
  Language Wos 000188882100022 Publication Date 2004-08-11  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1431-9276;1435-8115; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.891 Times cited (up) 14 Open Access  
  Notes Approved Most recent IF: 1.891; 2004 IF: 2.389  
  Call Number UA @ lucian @ c:irua:47515 Serial 2616  
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Author van den Broek, W.; Van Aert, S.; van Dyck, D. doi  openurl
  Title Fully automated measurement of the modulation transfer function of charge-coupled devices above the Nyquist frequency Type A1 Journal article
  Year 2012 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal  
  Volume 18 Issue 2 Pages 336-342  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT); Vision lab  
  Abstract The charge-coupled devices used in electron microscopy are coated with a scintillating crystal that gives rise to a severe modulation transfer function (MTF). Exact knowledge of the MTF is imperative for a good correspondence between image simulation and experiment. We present a practical method to measure the MTF above the Nyquist frequency from the beam blocker's shadow image. The image processing has been fully automated and the program is made public. The method is successfully tested on three cameras with various beam blocker shapes.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Cambridge, Mass. Editor  
  Language Wos 000302084700011 Publication Date 2012-02-14  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1431-9276;1435-8115; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.891 Times cited (up) 15 Open Access  
  Notes Fwo Approved Most recent IF: 1.891; 2012 IF: 2.495  
  Call Number UA @ lucian @ c:irua:96557 Serial 1297  
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Author Tian, H.; Schryvers, D.; Shabalovskaya, S.; van Humbeeck, J. url  doi
openurl 
  Title Microstructure of surface and subsurface layers of a Ni-Ti shape memory microwire Type A1 Journal article
  Year 2009 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal  
  Volume 15 Issue Pages 62-70  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract The microstructure of a 55 Êm diameter, cold-worked Ni-Ti microwire is investigated by different transmission electron microscopy techniques. The surface consists of a few hundred nanometer thick oxide layer composed of TiO and TiO2 with a small fraction of inhomogeneously distributed Ni. The interior of the wire has a core-shell structure with primarily B2 grains in the 1 Êm thick shell, and heavily twinned B19 martensite in the core. This core-shell structure can be explained by a concentration gradient of the alloying elements resulting in a structure separation due to the strong temperature dependence of the martensitic start temperature. Moreover, in between the B2 part of the metallic core-shell and the oxide layer, a Ni3Ti interfacial layer is detected.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Cambridge, Mass. Editor  
  Language Wos 000262912700009 Publication Date 2009-01-15  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1431-9276;1435-8115; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.891 Times cited (up) 15 Open Access  
  Notes FWO G.0465.05; Multimat Approved Most recent IF: 1.891; 2009 IF: 3.035  
  Call Number UA @ lucian @ c:irua:72319 Serial 2074  
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Author Gjorgievska, E.; Van Tendeloo, G.; Nicholson, J.W.; Coleman, N.J.; Slipper, I.J.; Booth, S. pdf  doi
openurl 
  Title The incorporation of nanoparticles into conventional glass-ionomer dental restorative cements Type A1 Journal article
  Year 2015 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal  
  Volume 21 Issue 21 Pages 392-406  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract Conventional glass-ionomer cements (GICs) are popular restorative materials, but their use is limited by their relatively low mechanical strength. This paper reports an attempt to improve these materials by incorporation of 10 wt% of three different types of nanoparticles, aluminum oxide, zirconium oxide, and titanium dioxide, into two commercial GICs (ChemFil((R)) Rock and EQUIA (TM) Fil). The results indicate that the nanoparticles readily dispersed into the cement matrix by hand mixing and reduced the porosity of set cements by filling the empty spaces between the glass particles. Both cements showed no significant difference in compressive strength with added alumina, and ChemFil((R)) Rock also showed no significant difference with zirconia. By contrast, ChemFil((R)) Rock showed significantly higher compressive strength with added titania, and EQUIA (TM) Fil showed significantly higher compressive strength with both zirconia and titania. Fewer air voids were observed in all nanoparticle-containing cements and this, in turn, reduced the development of cracks within the matrix of the cements. These changes in microstructure provide a likely reason for the observed increases in compressive strength, and overall the addition of nanoparticles appears to be a promising strategy for improving the physical properties of GICs.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Cambridge, Mass. Editor  
  Language Wos 000353514700014 Publication Date 2015-02-18  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1431-9276 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.891 Times cited (up) 15 Open Access  
  Notes Approved Most recent IF: 1.891; 2015 IF: 1.877  
  Call Number UA @ lucian @ c:irua:132523 Serial 4194  
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Author Idrissi, H.; Turner, S.; Mitsuhara, M.; Wang, B.; Hata, S.; Coulombier, M.; Raskin, J.-P.; Pardoen, T.; Van Tendeloo, G.; Schryvers, D. doi  openurl
  Title Point defect clusters and dislocations in FIB irradiated nanocrystalline aluminum films : an electron tomography and aberration-corrected high-resolution ADF-STEM study Type A1 Journal article
  Year 2011 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal  
  Volume 17 Issue 6 Pages 983-990  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract Focused ion beam (FIB) induced damage in nanocrystalline Al thin films has been characterized using advanced transmission electron microscopy techniques. Electron tomography was used to analyze the three-dimensional distribution of point defect clusters induced by FIB milling, as well as their interaction with preexisting dislocations generated by internal stresses in the Al films. The atomic structure of interstitial Frank loops induced by irradiation, as well as the core structure of Frank dislocations, has been resolved with aberration-corrected high-resolution annular dark-field scanning TEM. The combination of both techniques constitutes a powerful tool for the study of the intrinsic structural properties of point defect clusters as well as the interaction of these defects with preexisting or deformation dislocations in irradiated bulk or nanostructured materials.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Cambridge, Mass. Editor  
  Language Wos 000297832300018 Publication Date 2011-10-27  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1431-9276;1435-8115; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.891 Times cited (up) 25 Open Access  
  Notes Iap; Fwo Approved Most recent IF: 1.891; 2011 IF: 3.007  
  Call Number UA @ lucian @ c:irua:93627 Serial 2653  
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Author Denecke, M.A.; Somogyi, A.; Janssens, K.; Simon, R.; Dardenne, K.; Noseck, U. doi  openurl
  Title Microanalysis (micro-XRF, micro-XANES, and micro-XRD) of a tertiary sediment using microfocused synchrotron radiation Type A1 Journal article
  Year 2007 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal  
  Volume 13 Issue 3 Pages 165-172  
  Keywords A1 Journal article; AXES (Antwerp X-ray Analysis, Electrochemistry and Speciation)  
  Abstract  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos 000246814100004 Publication Date 2007-05-09  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1431-9276 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.891 Times cited (up) 31 Open Access  
  Notes Approved Most recent IF: 1.891; 2007 IF: 1.941  
  Call Number UA @ admin @ c:irua:64739 Serial 5721  
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Author Ke, X.; Bals, S.; Cott, D.; Hantschel, T.; Bender, H.; Van Tendeloo, G. doi  openurl
  Title Three-dimensional analysis of carbon nanotube networks in interconnects by electron tomography without missing wedge artifacts Type A1 Journal article
  Year 2010 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal  
  Volume 16 Issue 2 Pages 210-217  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract The three-dimensional (3D) distribution of carbon nanotubes (CNTs) grown inside semiconductor contact holes is studied by electron tomography. The use of a specialized tomography holder results in an angular tilt range of ±90°, which means that the so-called missing wedge is absent. The transmission electron microscopy (TEM) sample for this purpose consists of a micropillar that is prepared by a dedicated procedure using the focused ion beam (FIB) but keeping the CNTs intact. The 3D results are combined with energy dispersive X-ray spectroscopy (EDS) to study the relation between the CNTs and the catalyst particles used during their growth. The reconstruction, based on the full range of tilt angles, is compared with a reconstruction where a missing wedge is present. This clearly illustates that the missing wedge will lead to an unreliable interpretation and will limit quantitative studies  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Cambridge, Mass. Editor  
  Language Wos 000276137200011 Publication Date 2010-02-26  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1431-9276;1435-8115; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.891 Times cited (up) 42 Open Access  
  Notes Esteem 026019; Fwo; Iap-Vi Approved Most recent IF: 1.891; 2010 IF: 3.259  
  Call Number UA @ lucian @ c:irua:82279 Serial 3642  
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Author Bach, D.; Störmer, H.; Schneider, R.; Gerthsen, D.; Verbeeck, J. doi  openurl
  Title EELS investigations of different niobium oxide phases Type A1 Journal article
  Year 2006 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal  
  Volume 12 Issue 5 Pages 416-423  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract Electron energy loss spectra in conjunction with near-edge fine structures of purely stoichiometric niobium monoxide (NbO) and niobium pentoxide (Nb2O5) reference materials were recorded. The structures of the niobium oxide reference materials were checked by selected area electron diffraction to ensure a proper assignment of the fine structures. NbO and Nb2O5 show clearly different energy loss near-edge fine structures of the Nb-M-4,M-5 and -M-2,M-3 edges and of the O-K edge, reflecting the specific local environments of the ionized atoms. To distinguish the two oxides in a quantitative manner, the intensities under the Nb-M-4,M-5 as well as Nb-M-2,M-3 edges and the O-K edge were measured and their ratios calculated. k-factors were also derived from these measurements.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Cambridge, Mass. Editor  
  Language Wos 000241181400007 Publication Date 2006-09-19  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1431-9276;1435-8115; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.891 Times cited (up) 50 Open Access  
  Notes Approved Most recent IF: 1.891; 2006 IF: 2.108  
  Call Number UA @ lucian @ c:irua:60979UA @ admin @ c:irua:60979 Serial 789  
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Author Bach, D.; Schneider, R.; Gerthsen, D.; Verbeeck, J.; Sigle, W. doi  openurl
  Title EELS of niobium and stoichiometric niobium-oxide phases: part 1: plasmon and Near-edges fine structure Type A1 Journal article
  Year 2009 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal  
  Volume 15 Issue 6 Pages 505-523  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract A comprehensive electron energy-loss spectroscopy study of niobium (Nb) and stable Nb-oxide phases (NbO, NbO2, Nb2O5) was carried out. In this work (Part I), the plasmons and energy-loss near-edge structures (ELNES) of all relevant Nb edges (Nb-N2,3, Nb-M4,5, Nb-M2,3, Nb-M1, and Nb-L2,3) up to energy losses of about 2600 eV and the O-K edge are analyzed with respect to achieving characteristic fingerprints of Nb in different formal oxidation states (0 for metallic Nb, +2 for NbO, +4 for NbO2, and +5 for Nb2O5). Chemical shifts of the Nb-N2,3, Nb-M4,5, Nb-M2,3, and Nb-L2,3 edges are extracted from the spectra that amount to about 4 eV as the oxidation state increases from 0 for Nb to +5 for Nb2O5. Four different microscopes, including a 200 keV ZEISS Libra with monochromator, were used. The corresponding wide range of experimental parameters with respect to the primary electron energy, convergence, and collection semi-angles as well as energy resolution allows an assessment of the influence of the experimental setup on the ELNES of the different edges. Finally, the intensity of the Nb-L2,3 white-line edges is correlated with niobium 4d-state occupancy in the different reference materials.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Cambridge, Mass. Editor  
  Language Wos 000272433200005 Publication Date 2009-10-27  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1431-9276;1435-8115; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.891 Times cited (up) 55 Open Access  
  Notes Approved Most recent IF: 1.891; 2009 IF: 3.035  
  Call Number UA @ lucian @ c:irua:80320UA @ admin @ c:irua:80320 Serial 790  
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Author Bals, S.; Tirry, W.; Geurts, R.; Yang, Z.; Schryvers, D. doi  openurl
  Title High-quality sample preparation by low kV FIB thinning for analytical TEM measurements Type A1 Journal article
  Year 2007 Publication Microscopy and microanalysis Abbreviated Journal Microsc Microanal  
  Volume 13 Issue 2 Pages 80-86  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract Focused ion beam specimen preparation has been used for NiTi samples and SrTiO(3)/SrRuO(3) multilayers with prevention of surface amorphization and Ga implantation by a 2-kV cleaning procedure. Transmission electron microscopy techniques show that the samples are of high quality with a controlled thickness over large scales. Furthermore, preferential thinning effects in multicompounds are avoided, which is important when analytical transmission electron microscopy measurements need to be interpreted in a quantitative manner. The results are compared to similar measurements acquired for samples obtained using conventional preparation techniques such as electropolishing for alloys and ion milling for oxides.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Cambridge, Mass. Editor  
  Language Wos 000245662200002 Publication Date 2007-03-19  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1431-9276;1435-8115; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.891 Times cited (up) 82 Open Access  
  Notes Fwo; Goa Approved Most recent IF: 1.891; 2007 IF: 1.941  
  Call Number UA @ lucian @ c:irua:65850 Serial 1441  
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