Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Van Laer, K.; Bogaerts, A. |
Fluid modelling of a packed bed dielectric barrier discharge plasma reactor |
2016 |
Plasma sources science and technology |
25 |
50 |
UA library record; WoS full record; WoS citing articles |
Belov, I.; Paulussen, S.; Bogaerts, A. |
Appearance of a conductive carbonaceous coating in a CO2dielectric barrier discharge and its influence on the electrical properties and the conversion efficiency |
2016 |
Plasma sources science and technology |
25 |
25 |
UA library record; WoS full record; WoS citing articles |
Ozkan, A.; Dufour, T.; Silva, T.; Britun, N.; Snyders, R.; Bogaerts, A.; Reniers, F. |
The influence of power and frequency on the filamentary behavior of a flowing DBD—application to the splitting of CO2 |
2016 |
Plasma sources science and technology |
25 |
40 |
UA library record; WoS full record; WoS citing articles |
Trenchev, G.; Kolev, S.; Bogaerts, A. |
A 3D model of a reverse vortex flow gliding arc reactor |
2016 |
Plasma sources science and technology |
25 |
20 |
UA library record; WoS full record; WoS citing articles |
Ozkan, A.; Dufour, T.; Bogaerts, A.; Reniers, F. |
How do the barrier thickness and dielectric material influence the filamentary mode and CO2conversion in a flowing DBD? |
2016 |
Plasma sources science and technology |
25 |
24 |
UA library record; WoS full record; WoS citing articles |
Berthelot, A.; Bogaerts, A. |
Modeling of plasma-based CO2conversion: lumping of the vibrational levels |
2016 |
Plasma sources science and technology |
25 |
33 |
UA library record; WoS full record; WoS citing articles |
Wang, L.; Wen, D.-Q.; Zhang, Q.-Z.; Song, Y.-H.; Zhang, Y.-R.; Wang, Y.-N. |
Disruption of self-organized striated structure induced by secondary electron emission in capacitive oxygen discharges |
2019 |
Plasma sources science and technology |
28 |
2 |
UA library record; WoS full record; WoS citing articles |
Kelly, S.; van de Steeg, A.; Hughes, A.; van Rooij, G.; Bogaerts, A. |
Thermal instability and volume contraction in a pulsed microwave N2plasma at sub-atmospheric pressure |
2021 |
Plasma Sources Science & Technology |
30 |
|
UA library record; WoS full record; WoS citing articles |
Bahnamiri, O.S.; Verheyen, C.; Snyders, R.; Bogaerts, A.; Britun, N. |
Nitrogen fixation in pulsed microwave discharge studied by infrared absorption combined with modelling |
2021 |
Plasma Sources Science & Technology |
30 |
|
UA library record; WoS full record; WoS citing articles |
Zhang, L.; Heijkers, S.; Wang, W.; Martini, L.M.; Tosi, P.; Yang, D.; Fang, Z.; Bogaerts, A. |
Dry reforming of methane in a nanosecond repetitively pulsed discharge: chemical kinetics modeling |
2022 |
Plasma Sources Science & Technology |
31 |
|
UA library record; WoS full record |
Bogaerts, A.; Neyts, E.C.; Guaitella, O.; Murphy, A.B. |
Foundations of plasma catalysis for environmental applications |
2022 |
Plasma Sources Science & Technology |
|
|
UA library record; WoS full record; WoS citing articles |
Biondo, O.; Fromentin, C.; Silva, T.; Guerra, V.; van Rooij, G.; Bogaerts, A. |
Insights into the limitations to vibrational excitation of CO2: validation of a kinetic model with pulsed glow discharge experiments |
2022 |
Plasma Sources Science & Technology |
31 |
|
UA library record; WoS full record; WoS citing articles |
Tennyson, J.; Mohr, S.; Hanicinec, M.; Dzarasova, A.; Smith, C.; Waddington, S.; Liu, B.; Alves, L.L.; Bartschat, K.; Bogaerts, A.; Engelmann, S.U.; Gans, T.; Gibson, A.R.; Hamaguchi, S.; Hamilton, K.R.; Hill, C.; O’Connell, D.; Rauf, S.; van ’t Veer, K.; Zatsarinny, O. |
The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions |
2022 |
Plasma Sources Science & Technology |
31 |
|
UA library record; WoS full record |
Kolev, S.; Bogaerts, A. |
A 2D model for a gliding arc discharge |
2015 |
Plasma sources science and technology |
24 |
34 |
UA library record; WoS full record; WoS citing articles |
Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. |
Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges |
2010 |
Plasma sources science and technology |
19 |
116 |
UA library record; WoS full record; WoS citing articles |
De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. |
Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis |
2015 |
Plasma sources science and technology |
24 |
11 |
UA library record; WoS full record; WoS citing articles |
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. |
Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges |
2013 |
Plasma sources science and technology |
22 |
20 |
UA library record; WoS full record; WoS citing articles |
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
Kozák, T.; Bogaerts, A. |
Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model |
2015 |
Plasma sources science and technology |
24 |
100 |
UA library record; WoS full record; WoS citing articles |
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
Bogaerts, A.; Gijbels, R. |
The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces |
2002 |
Plasma sources science and technology |
11 |
51 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |