Author ![sorted by Author field, ascending order (up)](img/sort_asc.gif) |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Snoeckx, R.; Rabinovich, A.; Dobrynin, D.; Bogaerts, A.; Fridman, A. |
Plasma-based liquefaction of methane: The road from hydrogen production to direct methane liquefaction |
2017 |
Plasma processes and polymers |
14 |
16 |
UA library record; WoS full record; WoS citing articles |
Snoeckx, R.; Setareh, M.; Aerts, R.; Simon, P.; Maghari, A.; Bogaerts, A. |
Influence of N2 concentration in a CH4/N2 dielectric barrier discharge used for CH4 conversion into H2 |
2013 |
International journal of hydrogen energy |
38 |
40 |
UA library record; WoS full record; WoS citing articles |
Snoeckx, R.; Van Wesenbeeck, K.; Lenaerts, S.; Cha, M.S.; Bogaerts, A. |
Suppressing the formation of NOxand N2O in CO2/N2dielectric barrier discharge plasma by adding CH4: scavenger chemistry at work |
2019 |
Sustainable Energy & Fuels |
3 |
|
UA library record; WoS full record; WoS citing articles |
Snoeckx, R.; Wang, W.; Zhang, X.; Cha, M.S.; Bogaerts, A. |
Plasma-based multi-reforming for Gas-To-Liquid: tuning the plasma chemistry towards methanol |
2018 |
Scientific reports |
8 |
|
UA library record; WoS full record; WoS citing articles |
Snoeckx, R.; Zeng, Y.X.; Tu, X.; Bogaerts, A. |
Plasma-based dry reforming : improving the conversion and energy efficiency in a dielectric barrier discharge |
2015 |
RSC advances |
5 |
67 |
UA library record; WoS full record; WoS citing articles |
Somers, W.; Bogaerts, A.; van Duin, A.C.T.; Huygh, S.; Bal, K.M.; Neyts, E.C. |
Temperature influence on the reactivity of plasma species on a nickel catalyst surface : an atomic scale study |
2013 |
Catalysis today |
211 |
27 |
UA library record; WoS full record; WoS citing articles |
Somers, W.; Bogaerts, A.; van Duin, A.C.T.; Neyts, E.C. |
Interactions of plasma species on nickel catalysts : a reactive molecular dynamics study on the influence of temperature and surface structure |
2014 |
Applied catalysis : B : environmental |
154 |
23 |
UA library record; WoS full record; WoS citing articles |
Somers, W.; Bogaerts, A.; van Duin, A.C.T.; Neyts, E.C. |
Plasma species interacting with nickel surfaces : toward an atomic scale understanding of plasma-catalysis |
2012 |
The journal of physical chemistry: C : nanomaterials and interfaces |
116 |
37 |
UA library record; WoS full record; WoS citing articles |
Somers, W.; Dubreuil, M.F.; Neyts, E.C.; Vangeneugden, D.; Bogaerts, A. |
Incorporation of fluorescent dyes in atmospheric pressure plasma coatings for in-line monitoring of coating homogeneity |
2014 |
Plasma processes and polymers |
11 |
3 |
UA library record; WoS full record; WoS citing articles |
Song, C.-H.; Attri, P.; Ku, S.-K.; Han, I.; Bogaerts, A.; Choi, E.H. |
Cocktail of reactive species generated by cold atmospheric plasma: oral administration induces non-small cell lung cancer cell death |
2021 |
Journal Of Physics D-Applied Physics |
54 |
|
UA library record; WoS full record; WoS citing articles |
Steiner, R.E.; Barshick, C.M.; Bogaerts, A. |
Glow discharge optical spectroscopy and mass spectrometry |
2009 |
|
|
|
UA library record |
Sun, S.R.; Kolev, S.; Wang, H.X.; Bogaerts, A. |
Coupled gas flow-plasma model for a gliding arc: investigations of the back-breakdown phenomenon and its effect on the gliding arc characteristics |
2017 |
Plasma sources science and technology |
26 |
9 |
UA library record; WoS full record; WoS citing articles |
Sun, S.R.; Kolev, S.; Wang, H.X.; Bogaerts, A. |
Investigations of discharge and post-discharge in a gliding arc: a 3D computational study |
2017 |
Plasma sources science and technology |
26 |
11 |
UA library record; WoS full record; WoS citing articles |
Sun, S.R.; Wang, H.X.; Bogaerts, A. |
Chemistry reduction of complex CO2chemical kinetics: application to a gliding arc plasma |
2020 |
Plasma Sources Science & Technology |
29 |
|
UA library record; WoS full record; WoS citing articles |
Sun, S.R.; Wang, H.X.; Mei, D.H.; Tu, X.; Bogaerts, A. |
CO2 conversion in a gliding arc plasma: Performance improvement based on chemical reaction modeling |
2017 |
Journal of CO2 utilization |
17 |
41 |
UA library record; WoS full record; WoS citing articles |
Tampieri, F.; Espona-Noguera, A.; Labay, C.; Ginebra, M.-P.; Yusupov, M.; Bogaerts, A.; Canal, C. |
Does non-thermal plasma modify biopolymers in solution? A chemical and mechanistic study for alginate |
2023 |
Biomaterials Science |
|
|
UA library record; WoS full record; WoS citing articles |
Tennyson, J.; Mohr, S.; Hanicinec, M.; Dzarasova, A.; Smith, C.; Waddington, S.; Liu, B.; Alves, L.L.; Bartschat, K.; Bogaerts, A.; Engelmann, S.U.; Gans, T.; Gibson, A.R.; Hamaguchi, S.; Hamilton, K.R.; Hill, C.; O’Connell, D.; Rauf, S.; van ’t Veer, K.; Zatsarinny, O. |
The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions |
2022 |
Plasma Sources Science & Technology |
31 |
|
UA library record; WoS full record |
Tennyson, J.; Rahimi, S.; Hill, C.; Tse, L.; Vibhakar, A.; Akello-Egwel, D.; Brown, D.B.; Dzarasova, A.; Hamilton, J.R.; Jaksch, D.; Mohr, S.; Wren-Little, K.; Bruckmeier, J.; Agarwal, A.; Bartschat, K.; Bogaerts, A.; Booth, J.-P.; Goeckner, M.J.; Hassouni, K.; Itikawa, Y.; Braams, B.J.; Krishnakumar, E.; Laricchiuta, A.; Mason, N.J.; Pandey, S.; Petrovic, Z.L.; Pu, Y.-K.; Ranjan, A.; Rauf, S.; Schulze, J.; Turner, M.M.; Ventzek, P.; Whitehead, J.C.; Yoon, J.-S. |
QDB: a new database of plasma chemistries and reactions |
2017 |
Plasma sources science and technology |
26 |
18 |
UA library record; WoS full record; WoS citing articles |
Teodoru, S.; Kusano, Y.; Bogaerts, A. |
The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge |
2012 |
Plasma processes and polymers |
9 |
24 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. |
Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation |
2014 |
Plasma processes and polymers |
11 |
1 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) |
2012 |
Plasma processes and polymers |
9 |
5 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Computational study of the CF4 /CHF3 / H2 /Cl2 /O2 /HBr gas phase plasma chemistry |
2016 |
Journal of physics: D: applied physics |
49 |
5 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A. |
Role of vibrationally excited HBr in a HBr/He inductively coupled plasma used for etching of silicon |
2016 |
Journal of physics: D: applied physics |
49 |
|
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Bogaerts, A.; Shamiryan, D. |
Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma |
2011 |
Plasma processes and polymers |
8 |
5 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Boullart, W.; Bogaerts, A. |
Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments |
2009 |
Journal of physics: D: applied physics |
42 |
23 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Boullart, W.; Bogaerts, A. |
Simulation of an Ar/Cl2 inductively coupled plasma: study of the effect of bias, power and pressure and comparison with experiments |
2008 |
Journal of physics: D: applied physics |
41 |
31 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; De Schepper, P.; Bogaerts, A. |
Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas |
2013 |
Plasma processes and polymers |
10 |
3 |
UA library record; WoS full record; WoS citing articles |
Tinck, S.; Neyts, E.C.; Bogaerts, A. |
Fluorinesilicon surface reactions during cryogenic and near room temperature etching |
2014 |
The journal of physical chemistry: C : nanomaterials and interfaces |
118 |
11 |
UA library record; WoS full record; WoS citing articles |