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  Author Title Year Publication Volume Times cited Additional Links Links
Pourtois, G.; Dabral, A.; Sankaran, K.; Magnus, W.; Yu, H.; de de Meux, A.J.; Lu, A.K.A.; Clima, S.; Stokbro, K.; Schaekers, M.; Houssa, M.; Collaert, N.; Horiguchi, N. Probing the intrinsic limitations of the contact resistance of metal/semiconductor interfaces through atomistic simulations 2017 Semiconductors, Dielectrics, And Metals For Nanoelectronics 15: In Memory Of Samares Kar 1 UA library record; WoS full record; WoS citing articles pdf doi
Ozkan, A.; Dufour, T.; Silva, T.; Britun, N.; Snyders, R.; Bogaerts, A.; Reniers, F. The influence of power and frequency on the filamentary behavior of a flowing DBD—application to the splitting of CO2 2016 Plasma sources science and technology 25 40 UA library record; WoS full record; WoS citing articles pdf url doi
Martens, T.; Bogaerts, A.; van Dijk, J. Pulse shape influence on the atmospheric barrier discharge 2010 Applied physics letters 96 35 UA library record; WoS full record; WoS citing articles doi
Cui, Z.; Jafarzadeh, A.; Hao, Y.; Liu, L.; Li, L.; Zheng, Y. Prediction of the decomposition tendency of C5F10O on discharged metal surfaces 2023 IEEE transactions on dielectrics and electrical insulation 30 UA library record; WoS full record; WoS citing articles pdf doi
Chen, Y.Y.; Pourtois, G.; Adelmann, C.; Goux, L.; Govoreanu, B.; Degreave, R.; Jurczak, M.; Kittl, J.A.; Groeseneken, G.; Wouters, D.J. Insights into Ni-filament formation in unipolar-switching Ni/HfO2/TiN resistive random access memory device 2012 Applied physics letters 100 29 UA library record; WoS full record; WoS citing articles doi
Goux, L.; Fantini, A.; Govoreanu, B.; Kar, G.; Clima, S.; Chen, Y.-Y.; Degraeve, R.; Wouters, D.J.; Pourtois, G.; Jurczak, M. Asymmetry and switching phenomenology in TiN\ (Al2O3) \ HfO2 \ Hf systems 2012 ECS solid state letters 1 11 UA library record; WoS full record; WoS citing articles doi
Martens, T.; Bogaerts, A.; Brok, W.J.M.; van Dijk, J. The influence of impurities on the performance of the dielectric barrier discharge 2010 Applied physics letters 96 28 UA library record; WoS full record; WoS citing articles doi
Neyts, E.C. Plasma-Surface Interactions in Plasma Catalysis 2016 Plasma chemistry and plasma processing 36 66 UA library record; WoS full record; WoS citing articles pdf url doi
Van Gaens, W.; Bogaerts, A. Reaction pathways of biomedically active species in an Ar plasma jet 2014 Plasma sources science and technology 23 34 UA library record; WoS full record; WoS citing articles pdf doi
Grubova, I.Y.; Surmeneva, M.A.; Huygh, S.; Surmenev, R.A.; Neyts, E.C. Effects of silicon doping on strengthening adhesion at the interface of the hydroxyapatite-titanium biocomposite : a first-principles study 2019 Computational materials science 159 1 UA library record; WoS full record; WoS citing articles pdf doi
Slaets, J.; Aghaei, M.; Ceulemans, S.; Van Alphen, S.; Bogaerts, A. CO2and CH4conversion in “real” gas mixtures in a gliding arc plasmatron: how do N2and O2affect the performance? 2020 Green Chemistry 22 UA library record; WoS full record; WoS citing articles pdf url doi
Van Gaens, W.; Iseni, S.; Schmidt-Bleker, A.; Weltmann, K.-D.; Reuter, S.; Bogaerts, A. Numerical analysis of the effect of nitrogen and oxygen admixtures on the chemistry of an argon plasma jet operating at atmospheric pressure 2015 New journal of physics 17 29 UA library record; WoS full record; WoS citing articles url doi
Van Gaens, W.; Bruggeman, P.J.; Bogaerts, A. Numerical analysis of the NO and O generation mechanism in a needle-type plasma jet 2014 New journal of physics 16 34 UA library record; WoS full record; WoS citing articles url doi
Madani, M.; Bogaerts, A.; Vangeneugden, D. Numerical modelling for a dielectric barrier discharge at atmospheric pressure in nitrogen 2005 UA library record; WoS full record;
Eckert, M.; Neyts, E.; Bogaerts, A. Modeling adatom surface processes during crystal growth: a new implementation of the Metropolis Monte Carlo algorithm 2009 CrystEngComm 11 15 UA library record; WoS full record; WoS citing articles pdf doi
Liang, Y.-S.; Xue, C.; Zhang, Y.-R.; Wang, Y.-N. Investigation of active species in low-pressure capacitively coupled N-2/Ar plasmas 2021 Physics Of Plasmas 28 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Boullart, W.; Bogaerts, A. Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments 2009 Journal of physics: D: applied physics 42 23 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition 2011 Plasma sources science and technology 20 11 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Bultinck, E.; Eckert, M.; Georgieva, V.; Mao, M.; Neyts, E.; Schwaederlé, L. Computer modeling of plasmas and plasma-surface interactions 2009 Plasma processes and polymers 6 18 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; De Bie, C.; Eckert, M.; Georgieva, V.; Martens, T.; Neyts, E.; Tinck, S. Modeling of the plasma chemistry and plasmasurface interactions in reactive plasmas 2010 Pure and applied chemistry 82 13 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications 2012 Journal of physics : conference series 399 7 UA library record; WoS full record; WoS citing articles url doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Bultinck, E.; Kolev, I.; Schwaederlé, L.; van Aeken, K.; Buyle, G.; Depla, D. Computer modelling of magnetron discharges 2009 Journal of physics: D: applied physics 42 32 UA library record; WoS full record; WoS citing articles doi
Eckert, M.; Mortet, V.; Zhang, L.; Neyts, E.; Verbeeck, J.; Haenen, ken; Bogaerts, A. Theoretical investigation of grain size tuning during prolonged bias-enhanced nucleation 2011 Chemistry of materials 23 9 UA library record; WoS full record; WoS citing articles pdf doi
Mao, M.; Benedikt, J.; Consoli, A.; Bogaerts, A. New pathways for nanoparticle formation in acetylene dusty plasmas: a modelling investigation and comparison with experiments 2008 Journal of physics: D: applied physics 41 47 UA library record; WoS full record; WoS citing articles doi
Zhao, S.-X.; Gao, F.; Wang, Y.-P.; Wang, Y.-N.; Bogaerts, A. Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma 2015 Journal of applied physics 118 1 UA library record; WoS full record; WoS citing articles pdf url doi
Aerts, R.; Martens, T.; Bogaerts, A. Influence of vibrational states on CO2 splitting by dielectric barrier discharges 2012 The journal of physical chemistry: C : nanomaterials and interfaces 116 112 UA library record; WoS full record; WoS citing articles doi
Vermeylen, S.; De Waele, J.; Vanuytsel, S.; De Backer, J.; Van der Paal, J.; Ramakers, M.; Leyssens, K.; Marcq, E.; Van Audenaerde, J.; L. J. Smits, E.; Dewilde, S.; Bogaerts, A. Cold atmospheric plasma treatment of melanoma and glioblastoma cancer cells 2016 Plasma processes and polymers 13 26 UA library record; WoS full record; WoS citing articles pdf url doi
Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation 2013 Plasma sources science and technology 22 13 UA library record; WoS full record; WoS citing articles pdf doi
Eckert, M.; Neyts, E.; Bogaerts, A. Insights into the growth of (ultra)nanocrystalline diamond by combined molecular dynamics and Monte Carlo simulations 2010 Crystal growth & design 10 13 UA library record; WoS full record; WoS citing articles doi
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