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Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: combined Monte Carlo and fluid model”. Bogaerts A, Gijbels R, Goedheer W, Japanese journal of applied physics 38, 4404 (1999). http://doi.org/10.1143/JJAP.38.4404
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Inorganic mass spectrometry”. Adams F, Gijbels R, van Grieken R, Kim Y-sang Freedom Academy Press, Seoul (1999).
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Investigation of the electron distribution functions in low pressure electron cyclotron resonance discharges”. Kaganovich I, Misina M, Bogaerts A, Gijbels R Kluwer Academic, Dordrecht, page 543 (1999).
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Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge”. Bogaerts A, Yan M, Gijbels R, Goedheer W, Journal of applied physics 86, 2990 (1999). http://doi.org/10.1063/1.371159
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Modelling of radio frequency capacitively coupled plasma at intermediate pressures”. Berezhnoi S, Kaganovich I, Bogaerts A, Gijbels R Kluwer Academic, Dordrecht, page 525 (1999).
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Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge”. Bogaerts A, Gijbels R, IEEE transactions on plasma science 27, 1406 (1999). http://doi.org/10.1109/27.799819
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New developments and applications in GDMS”. Bogaerts A, Gijbels R, Fresenius' journal of analytical chemistry 364, 367 (1999). http://doi.org/10.1007/s002160051352
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On estimation of the dielectric function of Ag(Br,I) nanocrystals by cryo-EELS (addendum)”. Oleshko VP, Gijbels RH, van Daele AJ, Jacob WA, Nanostructered materials 11, 687 (1999)
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Quantitative secondary ion mass spectrometry depth profiling of surface layers of cubic silver halide microcrystals”. Verlinden G, Gijbels R, Geuens I, Journal of the American Society for Mass Spectrometry 10, 1016 (1999). http://doi.org/10.1016/S1044-0305(99)00064-1
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Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description”. Bogaerts A, Gijbels R, Journal of applied physics 86, 4124 (1999). http://doi.org/10.1063/1.371337
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A self-consistent mathematical model of a hollow cathode glow discharge”. Baguer N, Bogaerts A, Gijbels R, , 157 (1999)
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Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures”. Berezhnoi S, Kaganovich I, Misina M, Bogaerts A, Gijbels R, IEEE transactions plasma science 27, 1339 (1999). http://doi.org/10.1109/27.799810
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Simulation of plasma processes in plasma assisted CVD reactors”. Herrebout D, Bogaerts A, Goedheer W, Dekempeneer E, Gijbels R, , 213 (1999)
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Static secondary ion mass spectrometry (S-SIMS): part 1: methodology and structural interpretation”. van Vaeck L, Adriaens A, Gijbels R, Mass spectrometry reviews 18, 1 (1999)
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Surface analysis of halide distributions in complex AgX microcrystals by imaging time-of-flight SIMS (TOF-SIMS)”. Verlinden G, Gijbels R, Geuens I, de Keyzer R, Journal of analytical atomic spectrometry 14, 429 (1999). http://doi.org/10.1039/a807276k
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XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers”. Conard T, de Witte H, Loo R, Verheyen P, Vandervorst W, Caymax M, Gijbels R, Thin solid films : an international journal on the science and technology of thin and thick films 343/344, 583 (1999). http://doi.org/10.1016/S0040-6090(99)00122-4
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Analytical electron microscopy of silver halide photographic systems”. Oleshko VP, Gijbels RH, Jacob WA, Micron 31, 55 (2000). http://doi.org/10.1016/S0968-4328(99)00055-4
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Behavior of the sputtered copper atoms, ions and excited species in a radio-frequency and direct current glow discharge”. Bogaerts A, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 55, 279 (2000). http://doi.org/10.1016/S0584-8547(00)00142-7
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Calculation of gas heating in direct current argon glow discharges”. Bogaerts A, Gijbels R, Serikov VV, Journal of applied physics 87, 8334 (2000). http://doi.org/10.1063/1.373545
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Chemical surface characterization of complex AgX microcrystals by imaging TOF-SIMS and dual beam depth profiling”. Verlinden G, Gijbels R, Geuens I, de Keyzer R, , 213 (2000)
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Comparison of calculated and measured optical emission intensities in a direct current argon-copper glow discharge”. Bogaerts A, Donko Z, Kutasi K, Bano G, Pinhao N, Pinheiro M, Spectrochimica acta: part B : atomic spectroscopy 55, 1465 (2000). http://doi.org/10.1016/S0584-8547(00)00253-6
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Description of the argon-excited levels in a radio-frequency and direct current glow discharge”. Bogaerts A, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 55, 263 (2000). http://doi.org/10.1016/S0584-8547(00)00143-9
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Determination of the silver sulphide cluster size distribution via computer simulations”. Charlier E, Gijbels R, Van Doorselaer M, De Keyzer R page 85 (2000).
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Effects of adding hydrogen to an argon glow discharge: overview of relevant processes and some qualitative explanations”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 15, 441 (2000). http://doi.org/10.1039/a909779a
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Einleitung zu den massenspektrometrischen Methoden”. Gijbels R, Adriaens A Schweizerbart, Stuttgart, page 159 (2000).
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Electron Boltzmann kinetic equation averaged over fast electron bouncing and pitch-angle scattering for fast modeling of electron cyclotron resonance discharge”. Kaganovich I, Misina M, Berezhnoi S, Gijbels R, Physical review : E : statistical, nonlinear, and soft matter physics 61, 1875 (2000). http://doi.org/10.1103/PhysRevE.61.1875
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Electron microscopy and scanning microanalysis”. Oleshko V, Gijbels R, Amelinckx S Wiley, Chichester, page 9088 (2000).
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Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on wafer surfaces”. de Witte H, de Gendt S, Douglas M, Conard T, Kenis K, Mertens PW, Vandervorst W, Gijbels R, Journal of the electrochemical society 147, 13 (2000). http://doi.org/10.1149/1.1393457
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Evolution of impurity clusters and photographic sensitivity”. Oleshko VP, Gijbels RH, Bilous VM, Jacob WA, Alfimov MV, Zhurnal nauchnoj prikladnoj fotografii i kinematografii 45, 1 (2000)
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