toggle visibility
Search within Results:
Display Options:

Select All    Deselect All
List View
 |   | 
   print
  Author Title (down) Year Publication Volume Times cited Additional Links Links
Bogaerts, A.; Kolev, I.; Buyle, G. Modeling of the magnetron discharge 2008 UA library record
de Bleecker, K.; Bogaerts, A.; Goedheer, W. Modeling of the formation and transport of nanoparticles in silane plasmas 2004 Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 70 31 UA library record; WoS full record; WoS citing articles url doi
Bogaerts, A.; Gijbels, R. Modeling of radio-frequency and direct current glow discharges in argon 2000 Journal of technical physics 41 UA library record
Berthelot, A.; Bogaerts, A. Modeling of plasma-based CO2conversion: lumping of the vibrational levels 2016 Plasma sources science and technology 25 33 UA library record; WoS full record; WoS citing articles pdf url doi
Bogaerts, A.; Aerts, R.; Snoeckx, R.; Somers, W.; Van Gaens, W.; Yusupov, M.; Neyts, E. Modeling of plasma and plasma-surface interactions for medical, environmental and nano applications 2012 Journal of physics : conference series 399 7 UA library record; WoS full record; WoS citing articles url doi
Berthelot, A. Modeling of microwave plasmas for carbon dioxide conversion 2018 UA library record url
Bogaerts, A.; Gijbels, R. Modeling of metastable argon atoms in a direct current glow discharge 1995 Physical review : A : atomic, molecular and optical physics 52 98 UA library record; WoS full record; WoS citing articles url doi
Bogaerts, A.; Kolev, I. Modeling of magnetron and glow discharges 2002 Le vide: science, technique et applications 57 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge 1999 Journal of applied physics 86 18 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Modeling of glow discharges: what can we learn from it? 1997 Analytical chemistry A-pages 69 UA library record
Bogaerts, A.; Gijbels, R. Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis 1997 Journal of the American Society of Mass Spectrometry 8 15 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; Gijbels, R.; Vlcek, J. Modeling of glow discharge optical emission spectrometry: calculation of the argon atomic optical emission spectrum 1998 Spectrochimica acta: part B : atomic spectroscopy 53 44 UA library record; WoS full record; WoS citing articles doi
Gijbels, R.; Bogaerts, A. Modeling of glow discharge ion sources for mass spectrometry: potentials and limitations 1997 Spectroscopy 9 UA library record
Bogaerts, A.; de Bleecker, K.; Kolev, I.; Madani, M. Modeling of gas discharge plasmas: What can we learn from it? 2005 Surface and coatings technology 200 11 UA library record; WoS full record; WoS citing articles doi
Berthelot, A.; Bogaerts, A. Modeling of CO2Splitting in a Microwave Plasma: How to Improve the Conversion and Energy Efficiency 2017 The journal of physical chemistry: C : nanomaterials and interfaces 121 47 UA library record; WoS full record; WoS citing articles pdf url doi
Berthelot, A.; Bogaerts, A. Modeling of CO2plasma: effect of uncertainties in the plasma chemistry 2017 Plasma sources science and technology 26 16 UA library record; WoS full record; WoS citing articles pdf url doi
Ariskin, D.A.; Schweigert, I.V.; Alexandrov, A.L.; Bogaerts, A.; Peeters, F.M. Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/C2H2 2009 Journal of applied physics 105 21 UA library record; WoS full record; WoS citing articles doi
de Witte, H.; Vandervorst, W.; Gijbels, R. Modeling of bombardment induced oxidation of silicon with and without oxygen flooding 1998 UA library record
de Witte, H.; Vandervorst, W.; Gijbels, R. Modeling of bombardment induced oxidation of silicon 2001 Journal of applied physics 89 16 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement? 1998 Journal of analytical atomic spectrometry 13 24 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R.; Jackson, G.P. Modeling of a millisecond pulsed glow discharge: investigation of the afterpeak 2003 Journal of analytical atomic spectrometry 18 42 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions 2001 Journal of analytical atomic spectrometry 16 36 UA library record; WoS full record; WoS citing articles doi
Petrovic, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. Modeling of a dielectric barrier discharge used as a flowing chemical reactor 2008 UA library record; WoS full record;
Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. Modeling of a dielectric barrier discharge used as a flowing chemical reactor 2008 Journal of physics : conference series 133 6 UA library record; WoS full record; WoS citing articles url doi
Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model 2002 Journal of applied physics 92 15 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Gijbels, R. Modeling network for argon glow discharges: the output cannot be better than the input 2000 1 UA library record; WoS full record; WoS citing articles
Bogaerts, A.; Gijbels, R. Modeling network for argon glow discharge plasmas with copper cathode 2002 UA library record
Bogaerts, A.; Snoeckx, R.; Trenchev, G.; Wang, W. Modeling for a Better Understanding of Plasma-Based CO2 Conversion 2018 Plasma Chemistry and Gas Conversion UA library record pdf url doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
Neyts, E.; Mao, M.; Eckert, M.; Bogaerts, A. Modeling aspects of plasma-enhanced chemical vapor deposition of carbon-based materials 2012 UA library record
Select All    Deselect All
List View
 |   | 
   print

Save Citations:
Export Records: