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Author |
Title  |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Tan, X.; McCabe, E.E.; Orlandi, F.; Manuel, P.; Batuk, M.; Hadermann, J.; Deng, Z.; Jin, C.; Nowik, I.; Herber, R.; Segre, C.U.; Liu, S.; Croft, M.; Kang, C.-J.; Lapidus, S.; Frank, C.E.; Padmanabhan, H.; Gopalan, V.; Wu, M.; Li, M.-R.; Kotliar, G.; Walker, D.; Greenblatt, M. |
MnFe0.5Ru0.5O3 : an above-room-temperature antiferromagnetic semiconductor |
2019 |
Journal of materials chemistry C : materials for optical and electronic devices |
7 |
1 |
UA library record; WoS full record; WoS citing articles |
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Li, M.R.; Croft, M.; Stephens, P.W.; Ye, M.; Vanderbilt, D.; Retuerto, M.; Deng, Z.; Grams, C.P.; Hemberger, J.; Hadermann, J.; Li, W.M.; Jin, C.Q.; Saouma, F.O.; Jang, J.I.; Akamatsu, H.; Gopalan, V.; Walker, D.; Greenblatt, M.; |
Mn2FeWO6 : a new Ni3TeO6-type polar and magnetic oxide |
2015 |
Advanced materials |
27 |
32 |
UA library record; WoS full record; WoS citing articles |
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Ryabova, A.S.; Istomin, S.Y.; Dosaev, K.A.; Bonnefont, A.; Hadermann, J.; Arkharova, N.A.; Orekhov, A.S.; Sena, R.P.; Saveleva, V.A.; Kerangueven, G.; Antipov, E., V.; Savinova, E.R.; Tsirlina, G.A. |
Mn₂O₃ oxide with bixbyite structure for the electrochemical oxygen reduction reaction in alkaline media : highly active if properly manipulated |
2021 |
Electrochimica Acta |
367 |
|
UA library record; WoS full record; WoS citing articles |
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Çakir, D.; Sevik, C.; Gulseren, O.; Peeters, F.M. |
Mo2C as a high capacity anode material: a first-principles study |
2016 |
Journal of materials chemistry A : materials for energy and sustainability |
4 |
202 |
UA library record; WoS full record; WoS citing articles |
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Alfeld, M.; Broekaert, J.A.C. |
Mobile depth profiling and sub-surface imaging techniques for historical paintings : a review |
2013 |
Spectrochimica acta: part B : atomic spectroscopy |
88 |
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UA library record; WoS full record; WoS citing articles |
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Bougrioua, Z.; Farvacque, J.-L.; Moerman, I.; Demeester, P.; Harris, J.J.; Lee, K.; Van Tendeloo, G.; Lebedev, O.; Trush, E.J. |
Mobility collapse in undoped and Si-doped GaN grown by LP-MOVPE |
1999 |
Physica status solidi: B: basic research |
216 |
13 |
UA library record; WoS full record; WoS citing articles |
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Gao, M.; Zhang, Y.; Wang, H.; Guo, B.; Zhang, Q.; Bogaerts, A. |
Mode Transition of Filaments in Packed-Bed Dielectric Barrier Discharges |
2018 |
Catalysts |
8 |
7 |
UA library record; WoS full record; WoS citing articles |
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Verbeeck, J.; Van Aert, S. |
Model based quantification of EELS spectra |
2004 |
Ultramicroscopy |
101 |
147 |
UA library record; WoS full record; WoS citing articles |
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Peng, L.; Dai, X.; Liu, Y.; Sun, J.; Song, S.; Ni, B.-J. |
Model-based assessment of estrogen removal by nitrifying activated sludge |
2018 |
Chemosphere |
197 |
|
UA library record; WoS full record; WoS citing articles |
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Zhang, L.; Turner, S.; Brosens, F.; Verbeeck, J. |
Model-based determination of dielectric function by STEM low-loss EELS |
2010 |
Physical review : B : condensed matter and materials physics |
81 |
9 |
UA library record; WoS full record; WoS citing articles |
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Van Aert, S.; van den Broek, W.; Goos, P.; van Dyck, D. |
Model-based electron microscopy : from images toward precise numbers for unknown structure parameters |
2012 |
Micron |
43 |
7 |
UA library record; WoS full record; WoS citing articles |
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Verbeeck, J.; Van Aert, S.; Bertoni, G. |
Model-based quantification of EELS spectra: including the fine structure |
2006 |
Ultramicroscopy |
106 |
38 |
UA library record; WoS full record; WoS citing articles |
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Verbeeck, J.; Bertoni, G. |
Model-based quantification of EELS spectra: treating the effect of correlated noise |
2008 |
Ultramicroscopy |
108 |
16 |
UA library record; WoS full record; WoS citing articles |
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Verbeeck, J.; Bertoni, G. |
Model-based quantification of EELS: is standardless quantification possible? |
2008 |
Microchimica acta |
161 |
5 |
UA library record; WoS full record; WoS citing articles |
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De wael, A. |
Model-based quantitative scanning transmission electron microscopy for measuring dynamic structural changes at the atomic scale |
2021 |
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UA library record |
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Joris, I.; Bronders, J.; van der Grift, B.; Seuntjens, P. |
Model-based scenario analysis of the impact of remediation measures on metal leaching from soils contaminated by historic smelter emissions |
2014 |
Journal of environmental quality |
43 |
|
UA library record; WoS full record; WoS citing articles |
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Trenchev, G.; Kolev, S.; Kiss’ovski, Z. |
Modeling a Langmuir probe in atmospheric pressure plasma at different EEDFs |
2017 |
Plasma sources science and technology |
26 |
4 |
UA library record; WoS full record; WoS citing articles |
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Eckert, M.; Neyts, E.; Bogaerts, A. |
Modeling adatom surface processes during crystal growth: a new implementation of the Metropolis Monte Carlo algorithm |
2009 |
CrystEngComm |
11 |
15 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. |
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
3 |
UA library record; WoS full record; WoS citing articles |
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Vandenbroucke, A.M.; Aerts, R.; Van Gaens, W.; De Geyter, N.; Leys, C.; Morent, R.; Bogaerts, A. |
Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge |
2015 |
Plasma chemistry and plasma processing |
35 |
9 |
UA library record; WoS full record; WoS citing articles |
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Moors, K.; Sorée, B.; Magnus, W. |
Modeling and tackling resistivity scaling in metal nanowires |
2015 |
International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]
T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 09-11, 2015, Washington, DC |
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UA library record; WoS full record |
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Neyts, E.; Mao, M.; Eckert, M.; Bogaerts, A. |
Modeling aspects of plasma-enhanced chemical vapor deposition of carbon-based materials |
2012 |
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UA library record |
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Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
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Magnus, W.; Brosens, F.; Sorée, B. |
Modeling drive currents and leakage currents : a dynamic approach |
2009 |
Journal of computational electronics |
8 |
4 |
UA library record; WoS full record; WoS citing articles |
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Liu, Y.; Ngo, H.H.; Guo, W.; Peng, L.; Chen, X.; Wang, D.; Pan, Y.; Ni, B.-J. |
Modeling electron competition among nitrogen oxides reduction and N2Oaccumulation in hydrogenotrophic denitrification |
2018 |
Biotechnology and bioengineering |
115 |
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UA library record; WoS full record; WoS citing articles |
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Nikolova, I. |
Modeling emission, formation and dispersion of ultrafine particles in an urban environment |
2012 |
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UA library record |
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Bogaerts, A.; Snoeckx, R.; Trenchev, G.; Wang, W. |
Modeling for a Better Understanding of Plasma-Based CO2 Conversion |
2018 |
Plasma Chemistry and Gas Conversion |
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UA library record |
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Gielis, J.; Ricci, P.E.; Tavkhelidze, I. |
Modeling in mathematics : proceedings of the second Tbilisi-Salerno workshop on modeling in mathematics |
2017 |
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UA library record |
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Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharge plasmas with copper cathode |
2002 |
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UA library record |
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Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharges: the output cannot be better than the input |
2000 |
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1 |
UA library record; WoS full record; WoS citing articles |
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