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  Author Title Year (down) Publication Volume Times cited Additional Links Links
Tinck, S.; Tillocher, T.; Georgieva, V.; Dussart, R.; Neyts, E.; Bogaerts, A. Concurrent effects of wafer temperature and oxygen fraction on cryogenic silicon etching with SF6/O2plasmas 2017 Plasma processes and polymers 14 UA library record; WoS full record; WoS citing articles pdf url doi
Georgieva, V.; Berthelot, A.; Silva, T.; Kolev, S.; Graef, W.; Britun, N.; Chen, G.; van der Mullen, J.; Godfroid, T.; Mihailova, D.; van Dijk, J.; Snyders, R.; Bogaerts, A.; Delplancke-Ogletree, M.-P. Understanding Microwave Surface-Wave Sustained Plasmas at Intermediate Pressure by 2D Modeling and Experiments: Understanding Microwave Surface-Wave Sustained Plasmas … 2017 Plasma processes and polymers 14 8 UA library record; WoS full record; WoS citing articles pdf url doi
Georgieva, V.; Voter, A.F.; Bogaerts, A. Understanding the surface diffusion processes during magnetron sputter-deposition of complex oxide Mg-Al-O thin films 2011 Crystal growth & design 11 14 UA library record; WoS full record; WoS citing articles doi
Jehanathan, N.; Georgieva, V.; Saraiva, M.; Depla, D.; Bogaerts, A.; Van Tendeloo, G. The influence of Cr and Y on the micro structural evolution of Mg―Cr―O and Mg―Y―O thin films 2011 Thin solid films : an international journal on the science and technology of thin and thick films 519 4 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; De Bie, C.; Eckert, M.; Georgieva, V.; Martens, T.; Neyts, E.; Tinck, S. Modeling of the plasma chemistry and plasmasurface interactions in reactive plasmas 2010 Pure and applied chemistry 82 13 UA library record; WoS full record; WoS citing articles pdf doi
Saraiva, M.; Georgieva, V.; Mahieu, S.; van Aeken, K.; Bogaerts, A.; Depla, D. Compositional effects on the growth of Mg(M)O films 2010 Journal of applied physics 107 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Todorov, I.T.; Bogaerts, A. Molecular dynamics simulation of oxide thin film growth: importance of the inter-atomic interaction potential 2010 Chemical physics letters 485 16 UA library record; WoS full record; WoS citing articles doi
Saraiva, M.; Chen, H.; Leroy, W.P.; Mahieu, S.; Jehanathan, N.; Lebedev, O.; Georgieva, V.; Persoons, R.; Depla, D. Influence of Al content on the properties of MgO grown by reactive magnetron sputtering 2009 Plasma processes and polymers 6 13 UA library record; WoS full record; WoS citing articles pdf doi
Baguer, N.; Georgieva, V.; Calderin, L.; Todorov, I.T.; van Gils, S.; Bogaerts, A. Study of the nucleation and growth of TiO2 and ZnO thin films by means of molecular dynamics simulations 2009 Journal of crystal growth 311 23 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Bultinck, E.; Eckert, M.; Georgieva, V.; Mao, M.; Neyts, E.; Schwaederlé, L. Computer modeling of plasmas and plasma-surface interactions 2009 Plasma processes and polymers 6 18 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Saraiva, M.; Jehanathan, N.; Lebelev, O.I.; Depla, D.; Bogaerts, A. Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments 2009 Journal of physics: D: applied physics 42 37 UA library record; WoS full record; WoS citing articles pdf doi
Ivanova, N.; Löfgren, A.; Tournev, I.; Rousev, R.; Andreeva, A.; Jordanova, A.; Georgieva, V.; Deconinck, T.; Timmerman, V.; Kremensky, I.; De Jonghe, P.; Mitev, V. Spastin gene mutations in Bulgarian patients with hereditary spastic paraplegia 2006 Clinical genetics 70 6 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A. Negative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision study 2006 Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 73 7 UA library record; WoS full record; WoS citing articles url doi
Georgieva, V.; Bogaerts, A. Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model 2006 Plasma sources science and technology 15 35 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Kolev, I.; Madani, M.; Neyts, E. Computer simulations for processing plasmas 2006 Plasma processes and polymers 3 8 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Herrebout, D.; Kolev, I.; Madani, M.; Neyts, E. Numerical modeling for a better understanding of gas discharge plasmas 2005 High temperature material processes 9 1 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A. Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics 2005 Journal of applied physics 98 75 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A.; Gijbels, R. Numerical investigation of ion energy distribution functions in single and dual frequency capacitively coupled plasma reactors 2004 Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 69 97 UA library record; WoS full record; WoS citing articles url doi
Georgieva, V.; Bogaerts, A.; Gijbels, R. Numerical study of Ar/CF4/N2 discharges in single and dual frequency capacitively coupled plasma reactors 2003 Journal of applied physics 94 90 UA library record; WoS full record; WoS citing articles doi
Georgieva, V.; Bogaerts, A.; Gijbels, R. Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency Ar/Cf4 discharge: effect of gas composition 2003 Journal of applied physics 93 57 UA library record; WoS full record; WoS citing articles doi
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