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  Author Title Year Publication Volume (up) Times cited Additional Links Links
Moors, K.; Sorée, B.; Magnus, W. Modeling and tackling resistivity scaling in metal nanowires 2015 International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 09-11, 2015, Washington, DC UA library record; WoS full record url
Garzia Trulli, M.; Claes, N.; Pype, J.; Bals, S.; Baert, K.; Terryn, H.; Sardella, E.; Favia, P.; Vanhulsel, A. Deposition of aminosilane coatings on porous Al2O3microspheres by means of dielectric barrier discharges 2017 Plasma processes and polymers 14 8 UA library record; WoS full record; WoS citing articles pdf url doi
Verreck, D.; Verhulst, A.S.; Van de Put, M.L.; Sorée, B.; Magnus, W.; Collaert, N.; Mocuta, A.; Groeseneken, G. Self-consistent 30-band simulation approach for (non-)uniformly strained confined heterostructure tunnel field-effect transistors 2017 Simulation of Semiconductor Processes and, Devices (SISPAD)AND DEVICES (SISPAD 2017) UA library record; WoS full record pdf
Van der Paal, J.; Fridman, G.; Bogaerts, A. Ceramide cross-linking leads to pore formation: Potential mechanism behind CAP enhancement of transdermal drug delivery 2019 Plasma processes and polymers 16 UA library record; WoS full record; WoS citing articles pdf doi
Duan, J.; Ma, M.; Yusupov, M.; Cordeiro, R.M.; Lu, X.; Bogaerts, A. The penetration of reactive oxygen and nitrogen species across the stratum corneum 2020 Plasma Processes And Polymers UA library record; WoS full record; WoS citing articles pdf url doi
Yusupov, M.; Dewaele, D.; Attri, P.; Khalilov, U.; Sobott, F.; Bogaerts, A. Molecular understanding of the possible mechanisms of oligosaccharide oxidation by cold plasma 2022 Plasma processes and polymers UA library record; WoS full record; WoS citing articles pdf url doi
Tiwari, S.; Van de Put, M.L.; Sorée, B.; Vandenberghe, W.G. Ab initio modeling of few-layer dilute magnetic semiconductors 2021 International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 27-29, 2021, Dallas, TX UA library record; WoS full record pdf doi
Reyntjens, P.D.; Tiwari, S.; Van de Put, M.L.; Sorée, B.; Vandenberghe, W.G. Ab-initio study of magnetically intercalated Tungsten diselenide 2020 International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 23-OCT 06, 2020 UA library record; WoS full record pdf doi
Tiwari, S.; Van de Put, M.L.; Sorée, B.; Vandenberghe, W.G. Carrier transport in a two-dimensional topological insulator nanoribbon in the presence of vacancy defects 2018 International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 24-26, 2018, Austin, TX UA library record; WoS full record; WoS citing articles pdf doi
Deylgat, E.; Chen, E.; Sorée, B.; Vandenberghe, W.G. Quantum transport study of contact resistance of edge- and top-contacted two-dimensional materials 2023 International Conference on Simulation of Semiconductor Processes and Devices : [proceedings] T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 27-29, 2023, Kobe, Japan UA library record; WoS full record pdf doi
Chai, Z.-N.; Wang, X.-C.; Yusupov, M.; Zhang, Y.-T. Unveiling the interaction mechanisms of cold atmospheric plasma and amino acids by machine learning 2024 Plasma processes and polymers UA library record; WoS full record pdf doi
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Kolev, I.; Madani, M.; Neyts, E. Computer simulations for processing plasmas 2006 Plasma processes and polymers 3 8 UA library record; WoS full record; WoS citing articles doi
Kolev, I.; Bogaerts, A. PIC – MCC numerical simulation of a DC planar magnetron 2006 Plasma processes and polymers 3 27 UA library record; WoS full record; WoS citing articles doi
Bogaerts, A.; Bultinck, E.; Eckert, M.; Georgieva, V.; Mao, M.; Neyts, E.; Schwaederlé, L. Computer modeling of plasmas and plasma-surface interactions 2009 Plasma processes and polymers 6 18 UA library record; WoS full record; WoS citing articles doi
Saraiva, M.; Chen, H.; Leroy, W.P.; Mahieu, S.; Jehanathan, N.; Lebedev, O.; Georgieva, V.; Persoons, R.; Depla, D. Influence of Al content on the properties of MgO grown by reactive magnetron sputtering 2009 Plasma processes and polymers 6 13 UA library record; WoS full record; WoS citing articles pdf doi
Bultinck, E.; Mahieu, S.; Depla, D.; Bogaerts, A. Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers 2009 Plasma processes and polymers 6 2 UA library record; WoS full record; WoS citing articles doi
Hart, B.T.; Douglas, G.B.; Beckett, R.; van Put, A.; Van Grieken, R. Characterization of colloidal and particulate matter transported by the Magela Creek system, Northern Australia 1993 Hydrological processes 7 UA library record
De Bie, C.; Verheyde, B.; Martens, T.; van Dijk, J.; Paulussen, S.; Bogaerts, A. Fluid modeling of the conversion of methane into higher hydrocarbons in an atmospheric pressure dielectric barrier discharge 2011 Plasma processes and polymers 8 70 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Bogaerts, A.; Shamiryan, D. Simultaneous etching and deposition processes during the etching of silicon with a Cl2/O2/Ar inductively coupled plasma 2011 Plasma processes and polymers 8 5 UA library record; WoS full record; WoS citing articles doi
Balemans, S.; Vlaeminck, S.E.; Torfs, E.; Hartog, L.; Zaharova, L.; Rehman, U.; Nopens, I. The impact of local hydrodynamics on high-rate activated sludge flocculation in laboratory and full-scale reactors 2020 Processes 8 UA library record; WoS full record; WoS citing articles url doi
Teodoru, S.; Kusano, Y.; Bogaerts, A. The effect of O2 in a humid O2/N2/NOx gas mixture on NOx and N2O remediation by an atmospheric pressure dielectric barrier discharge 2012 Plasma processes and polymers 9 24 UA library record; WoS full record; WoS citing articles pdf doi
Aerts, R.; Tu, X.; De Bie, C.; Whitehead, J.C.; Bogaerts, A. An investigation into the dominant reactions for ethylene destruction in non-thermal atmospheric plasmas 2012 Plasma processes and polymers 9 46 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; Bogaerts, A. Modeling SiH4/O2/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI) 2012 Plasma processes and polymers 9 5 UA library record; WoS full record; WoS citing articles pdf doi
Bogaerts, A.; de Bleecker, K.; Georgieva, V.; Herrebout, D.; Kolev, I.; Madani, M.; Neyts, E. Numerical modeling for a better understanding of gas discharge plasmas 2005 High temperature material processes 9 1 UA library record; WoS full record; WoS citing articles doi
Tinck, S.; De Schepper, P.; Bogaerts, A. Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas 2013 Plasma processes and polymers 10 3 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Altamirano-Sánchez, E.; De Schepper, P.; Bogaerts, A. Formation of a nanoscale SiO2 capping layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma : a modeling investigation 2014 Plasma processes and polymers 11 1 UA library record; WoS full record; WoS citing articles pdf doi
Aerts, R.; Snoeckx, R.; Bogaerts, A. In-situ chemical trapping of oxygen in the splitting of carbon dioxide by plasma 2014 Plasma processes and polymers 11 29 UA library record; WoS full record; WoS citing articles pdf doi
Somers, W.; Dubreuil, M.F.; Neyts, E.C.; Vangeneugden, D.; Bogaerts, A. Incorporation of fluorescent dyes in atmospheric pressure plasma coatings for in-line monitoring of coating homogeneity 2014 Plasma processes and polymers 11 3 UA library record; WoS full record; WoS citing articles pdf doi
de Bleecker, K.; Bogaerts, A. Modeling of the synthesis and subsequent growth of nanoparticles in dusty plasmas 2007 High temperature material processes 11 UA library record; WoS full record doi
Bogaerts, A.; Yusupov, M.; Van der Paal, J.; Verlackt, C.C.W.; Neyts, E.C. Reactive molecular dynamics simulations for a better insight in plasma medicine 2014 Plasma processes and polymers 11 22 UA library record; WoS full record; WoS citing articles pdf doi
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