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Author |
Title  |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Bogaerts, A.; Gijbels, R. |
Modeling of glow discharges: what can we learn from it? |
1997 |
Analytical chemistry A-pages |
69 |
|
UA library record |
|
|
|
Bogaerts, A.; Gijbels, R. |
Modeling of glow discharge sources with flat and pin cathodes and implications for mass spectrometric analysis |
1997 |
Journal of the American Society of Mass Spectrometry |
8 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R.; Vlcek, J. |
Modeling of glow discharge optical emission spectrometry: calculation of the argon atomic optical emission spectrum |
1998 |
Spectrochimica acta: part B : atomic spectroscopy |
53 |
44 |
UA library record; WoS full record; WoS citing articles |
|
|
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Gijbels, R.; Bogaerts, A. |
Modeling of glow discharge ion sources for mass spectrometry: potentials and limitations |
1997 |
Spectroscopy |
9 |
|
UA library record |
|
|
|
Bogaerts, A.; de Bleecker, K.; Kolev, I.; Madani, M. |
Modeling of gas discharge plasmas: What can we learn from it? |
2005 |
Surface and coatings technology |
200 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Mescia, L.; Chiapperino, M.A.; Bia, P.; Gielis, J.; Caratelli, D. |
Modeling of electroporation induced by pulsed electric fields in irregularly shaped cells |
2018 |
IEEE transactions on biomedical engineering |
65 |
|
UA library record; WoS full record; WoS citing articles |
|
|
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Contino, A.; Ciofi, I.; Wu, X.; Asselberghs, I.; Celano, U.; Wilson, C.J.; Tokei, Z.; Groeseneken, G.; Sorée, B. |
Modeling of edge scattering in graphene interconnects |
2018 |
IEEE electron device letters |
39 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
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Berthelot, A.; Bogaerts, A. |
Modeling of CO2Splitting in a Microwave Plasma: How to Improve the Conversion and Energy Efficiency |
2017 |
The journal of physical chemistry: C : nanomaterials and interfaces |
121 |
47 |
UA library record; WoS full record; WoS citing articles |
|
|
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Berthelot, A.; Bogaerts, A. |
Modeling of CO2plasma: effect of uncertainties in the plasma chemistry |
2017 |
Plasma sources science and technology |
26 |
16 |
UA library record; WoS full record; WoS citing articles |
|
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Ariskin, D.A.; Schweigert, I.V.; Alexandrov, A.L.; Bogaerts, A.; Peeters, F.M. |
Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/C2H2 |
2009 |
Journal of applied physics |
105 |
21 |
UA library record; WoS full record; WoS citing articles |
|
|
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de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon with and without oxygen flooding |
1998 |
|
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UA library record |
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|
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de Witte, H.; Vandervorst, W.; Gijbels, R. |
Modeling of bombardment induced oxidation of silicon |
2001 |
Journal of applied physics |
89 |
16 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A.; Gijbels, R. |
Modeling of argon direct current glow discharges and comparison with experiment: how good is the agreement? |
1998 |
Journal of analytical atomic spectrometry |
13 |
24 |
UA library record; WoS full record; WoS citing articles |
|
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Bogaerts, A.; Gijbels, R.; Jackson, G.P. |
Modeling of a millisecond pulsed glow discharge: investigation of the afterpeak |
2003 |
Journal of analytical atomic spectrometry |
18 |
42 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions |
2001 |
Journal of analytical atomic spectrometry |
16 |
36 |
UA library record; WoS full record; WoS citing articles |
|
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Petrovic, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Modeling of a dielectric barrier discharge used as a flowing chemical reactor |
2008 |
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UA library record; WoS full record; |
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Petrović, D.; Martens, T.; van Dijk, J.; Brok, W.J.M.; Bogaerts, A. |
Modeling of a dielectric barrier discharge used as a flowing chemical reactor |
2008 |
Journal of physics : conference series |
133 |
6 |
UA library record; WoS full record; WoS citing articles |
|
|
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Herrebout, D.; Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W.; Vanhulsel, A. |
Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model |
2002 |
Journal of applied physics |
92 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharges: the output cannot be better than the input |
2000 |
|
|
1 |
UA library record; WoS full record; WoS citing articles |
|
|
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Bogaerts, A.; Gijbels, R. |
Modeling network for argon glow discharge plasmas with copper cathode |
2002 |
|
|
|
UA library record |
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Gielis, J.; Ricci, P.E.; Tavkhelidze, I. |
Modeling in mathematics : proceedings of the second Tbilisi-Salerno workshop on modeling in mathematics |
2017 |
|
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UA library record |
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Bogaerts, A.; Snoeckx, R.; Trenchev, G.; Wang, W. |
Modeling for a Better Understanding of Plasma-Based CO2 Conversion |
2018 |
Plasma Chemistry and Gas Conversion |
|
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UA library record |
|
|
|
Nikolova, I. |
Modeling emission, formation and dispersion of ultrafine particles in an urban environment |
2012 |
|
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UA library record |
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|
Liu, Y.; Ngo, H.H.; Guo, W.; Peng, L.; Chen, X.; Wang, D.; Pan, Y.; Ni, B.-J. |
Modeling electron competition among nitrogen oxides reduction and N2Oaccumulation in hydrogenotrophic denitrification |
2018 |
Biotechnology and bioengineering |
115 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Magnus, W.; Brosens, F.; Sorée, B. |
Modeling drive currents and leakage currents : a dynamic approach |
2009 |
Journal of computational electronics |
8 |
4 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Tinck, S.; Boullart, W.; Bogaerts, A. |
Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating |
2011 |
Plasma sources science and technology |
20 |
22 |
UA library record; WoS full record; WoS citing articles |
|
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Neyts, E.; Mao, M.; Eckert, M.; Bogaerts, A. |
Modeling aspects of plasma-enhanced chemical vapor deposition of carbon-based materials |
2012 |
|
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UA library record |
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Moors, K.; Sorée, B.; Magnus, W. |
Modeling and tackling resistivity scaling in metal nanowires |
2015 |
International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]
T2 – International Conference on Simulation of Semiconductor Processes and, Devices (SISPAD), SEP 09-11, 2015, Washington, DC |
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UA library record; WoS full record |
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Vandenbroucke, A.M.; Aerts, R.; Van Gaens, W.; De Geyter, N.; Leys, C.; Morent, R.; Bogaerts, A. |
Modeling and experimental study of trichloroethylene abatement with a negative direct current corona discharge |
2015 |
Plasma chemistry and plasma processing |
35 |
9 |
UA library record; WoS full record; WoS citing articles |
|
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Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. |
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
3 |
UA library record; WoS full record; WoS citing articles |
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