| Author |
Title  |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Verleysen, E.; Bender, H.; Richard, O.; Schryvers, D.; Vandervorst, W. |
Characterization of nickel silicides using EELS-based methods |
2010 |
Journal of microscopy |
240 |
11 |
UA library record; WoS full record; WoS citing articles |
| Stuer, C.; Steegen, A.; van Landuyt, J.; Bender, H.; Maex, K. |
Characterisation of the local stress induced by shallow trench isolation and CoSi2 silicidation |
2001 |
Institute of physics conference series |
|
|
UA library record; WoS full record; |
| Verbist, K.; Lebedev, O.I.; Van Tendeloo, G.; Tafuri, F.; Granozio, F.M.; Di Chiara, A.; Bender, H. |
A potential method to correlate electrical properties and microstructure of a unique high-Tc superconducting Josephson junction |
1999 |
Applied physics letters |
74 |
5 |
UA library record; WoS full record; WoS citing articles |
| Nistor, L.C.; Richard, O.; Zhao, O.; Bender, H.; Stesmans, A.; Van Tendeloo, G. |
A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films |
2003 |
Institute of physics conference series
T2 – Microscopy of semiconducting materials |
|
|
UA library record; WoS full record; |
