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Author Verleysen, E.; Bender, H.; Richard, O.; Schryvers, D.; Vandervorst, W. doi  openurl
  Title Characterization of nickel silicides using EELS-based methods Type A1 Journal article
  Year (down) 2010 Publication Journal of microscopy Abbreviated Journal J Microsc-Oxford  
  Volume 240 Issue 1 Pages 75-82  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract The characterization of Ni-silicides using electron energy loss spectroscopy (EELS) based methods is discussed. A series of Ni-silicide phases is examined: Ni3Si, Ni31Si12, Ni2Si, NiSi and NiSi2. The composition of these phases is determined by quantitative core-loss EELS. A study of the low loss part of the EELS spectrum shows that both the energy and the shape of the plasmon peak are characteristic for each phase. Examination of the Ni-L edge energy loss near edge structure (ELNES) shows that the ratio and the sum of the L2 and L3 white line intensities are also characteristic for each phase. The sum of the white line intensities is used to determine the trend in electron occupation of the 3d states of the phases. The dependence of the plasmon energy on the electron occupation of the 3d states is demonstrated.  
  Address  
  Corporate Author Thesis  
  Publisher Place of Publication Oxford Editor  
  Language Wos 000281715400009 Publication Date 2010-05-20  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0022-2720; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.692 Times cited 11 Open Access  
  Notes Approved Most recent IF: 1.692; 2010 IF: 1.872  
  Call Number UA @ lucian @ c:irua:84879 Serial 329  
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