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	Author	Nistor, L.C.; Richard, O.; Zhao, O.; Bender, H.; Stesmans, A.; Van Tendeloo, G.
	Title	A microstructural study of the thermal stability of atomic layer deposited Al₂O₃ thin films			Type	A1 Journal article
	Year	2003	Publication	Institute of physics conference series T2 – Microscopy of semiconducting materials	Abbreviated Journal
	Volume		Issue		Pages	397-400
	Keywords	A1 Journal article; Electron microscopy for materials research (EMAT)
	Abstract	The thermal stability of amorphous Al2O3 films (similar to8 and 80 nut thick) deposited by atomic layer deposition on HF-last and thin SiO2 covered (001) Si substrates is studied by transmission electron microscopy. The layers are in- and ex-situ annealed in the same temperature range.
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	Corporate Author				Thesis
	Publisher	Iop	Place of Publication	Cambridge	Editor
	Language		Wos		Publication Date	0000-00-00
	Series Editor		Series Title		Abbreviated Series Title
	Series Volume		Series Issue		Edition
	ISSN	0-7503-0979-2	ISBN		Additional Links	UA library record; WoS full record;
	Impact Factor		Times cited		Open Access
	Notes				Approved	Most recent IF: NA
	Call Number	UA @ lucian @ c:irua:54860			Serial	2048
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