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  Author Title Year Publication Volume Times cited (down) Additional Links Links
Huyskens, C.; De Wever, H.; Fovet, Y.; Wegmann, U.; Diels, L.; Lenaerts, S. Screening of novel MBR fouling reducers : benchmarking with known fouling reducers and evaluation of their mechanism of action 2012 Separation and purification technology 95 24 UA library record; WoS full record; WoS citing articles pdf doi
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma 2012 Plasma sources science and technology 21 23 UA library record; WoS full record; WoS citing articles pdf doi
Mahieu, S.; Ghekiere, P.; de Winter, G.; Depla, D.; de Gryse, R.; Lebedev, O.I.; Van Tendeloo, G. Influence of the Ar/O2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering 2005 Thin solid films : an international journal on the science and technology of thin and thick films 484 23 UA library record; WoS full record; WoS citing articles pdf doi
Major, L.; Tirry, W.; Van Tendeloo, G. Microstructure and defect characterization at interfaces in TiN/CrN multilayer coatings 2008 Surface and coatings technology 202 23 UA library record; WoS full record; WoS citing articles doi
Shanenko, A.A.; Aguiar, J.A.; Vagov, A.; Croitoru, M.D.; Milošević, M.V. Atomically flat superconducting nanofilms: multiband properties and mean-field theory 2015 Superconductor science and technology 28 23 UA library record; WoS full record; WoS citing articles pdf doi
Tinck, S.; Boullart, W.; Bogaerts, A. Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching : effects of SiO2 chamber wall coating 2011 Plasma sources science and technology 20 22 UA library record; WoS full record; WoS citing articles pdf doi
Krsmanovic, R.; Lebedev, O.I.; Speghini, A.; Bettinelli, M.; Polizzi, S.; Van Tendeloo, G. Structural characterization and luminescence properties of nanostructured lanthanide-doped Sc2O3 prepared by propellant synthesis 2006 Nanotechnology 17 22 UA library record; WoS full record; WoS citing articles pdf doi
Van Laer, K.; Bogaerts, A. How bead size and dielectric constant affect the plasma behaviour in a packed bed plasma reactor: a modelling study 2017 Plasma sources science and technology 26 22 UA library record; WoS full record; WoS citing articles pdf url doi
Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges 2000 Plasma sources science and technology 9 21 UA library record; WoS full record; WoS citing articles doi
Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges 2013 Plasma sources science and technology 22 20 UA library record; WoS full record; WoS citing articles pdf doi
Trenchev, G.; Kolev, S.; Bogaerts, A. A 3D model of a reverse vortex flow gliding arc reactor 2016 Plasma sources science and technology 25 20 UA library record; WoS full record; WoS citing articles pdf url doi
Ray, S.; Kolen'ko, Y.V.; Kovnir, K.A.; Lebedev, O.I.; Turner, S.; Chakraborty, T.; Erni, R.; Watanabe, T.; Van Tendeloo, G.; Yoshimura, M.; Itoh, M. Defect controlled room temperature ferromagnetism in Co-doped barium titanate nanocrystals 2012 Nanotechnology 23 19 UA library record; WoS full record; WoS citing articles pdf doi
Berdiyorov, G.; Harrabi, K.; Maneval, J.P.; Peeters, F.M. Effect of pinning on the response of superconducting strips to an external pulsed current 2015 Superconductor science and technology 28 19 UA library record; WoS full record; WoS citing articles url doi
Sankaran, K.; Clima, S.; Mees, M.; Pourtois, G. Exploring alternative metals to Cu and W for interconnects applications using automated first-principles simulations 2015 ECS journal of solid state science and technology 4 19 UA library record; WoS full record; WoS citing articles url doi
Chizhov, A.S.; Rumyantseva, M.N.; Vasiliev, R.B.; Filatova, D.G.; Drozdov, K.A.; Krylov, I.V.; Marchevsky, A.V.; Karakulina, O.M.; Abakumov, A.M.; Gaskov, A.M. Visible light activation of room temperature NO2 gas sensors based on ZnO, SnO2 and In2O3 sensitized with CdSe quantum dots 2016 Thin solid films : an international journal on the science and technology of thin and thick films 618 19 UA library record; WoS full record; WoS citing articles pdf url doi
Woo, S.Y.; Gauquelin, N.; Nguyen, H.P.T.; Mi, Z.; Botton, G.A. Interplay of strain and indium incorporation in InGaN/GaN dot-in-a-wire nanostructures by scanning transmission electron microscopy 2015 Nanotechnology 26 19 UA library record; WoS full record; WoS citing articles pdf doi
Bal, K.M.; Huygh, S.; Bogaerts, A.; Neyts, E.C. Effect of plasma-induced surface charging on catalytic processes: application to CO2activation 2018 Plasma sources science and technology 27 19 UA library record; WoS full record; WoS citing articles pdf url doi
Bafekry, A.; Stampfl, C.; Ghergherehchi, M. Strain, electric-field and functionalization induced widely tunable electronic properties in MoS2/BC3, /C3N and / C3N4 van der Waals heterostructures 2020 Nanotechnology (Bristol. Print) 19 UA library record; WoS full record; WoS citing articles pdf url doi
Forsh, E.A.; Abakumov, A.M.; Zaytsev, V.B.; Konstantinova, E.A.; Forsh, P.A.; Rumyantseva, M.N.; Gaskov, A.M.; Kashkarov, P.K. Optical and photoelectrical properties of nanocrystalline indium oxide with small grains 2015 Thin solid films : an international journal on the science and technology of thin and thick films 595 18 UA library record; WoS full record; WoS citing articles pdf doi
Tennyson, J.; Rahimi, S.; Hill, C.; Tse, L.; Vibhakar, A.; Akello-Egwel, D.; Brown, D.B.; Dzarasova, A.; Hamilton, J.R.; Jaksch, D.; Mohr, S.; Wren-Little, K.; Bruckmeier, J.; Agarwal, A.; Bartschat, K.; Bogaerts, A.; Booth, J.-P.; Goeckner, M.J.; Hassouni, K.; Itikawa, Y.; Braams, B.J.; Krishnakumar, E.; Laricchiuta, A.; Mason, N.J.; Pandey, S.; Petrovic, Z.L.; Pu, Y.-K.; Ranjan, A.; Rauf, S.; Schulze, J.; Turner, M.M.; Ventzek, P.; Whitehead, J.C.; Yoon, J.-S. QDB: a new database of plasma chemistries and reactions 2017 Plasma sources science and technology 26 18 UA library record; WoS full record; WoS citing articles url doi
Ozkan, A.; Dufour, T.; Silva, T.; Britun, N.; Snyders, R.; Reniers, F.; Bogaerts, A. DBD in burst mode: solution for more efficient CO2conversion? 2016 Plasma sources science and technology 25 17 UA library record; WoS full record; WoS citing articles pdf url doi
Alves, L.L.; Bogaerts, A.; Guerra, V.; Turner, M.M. Foundations of modelling of nonequilibrium low-temperature plasmas 2018 Plasma sources science and technology 27 17 UA library record; WoS full record; WoS citing articles pdf url doi
Bogaerts, A.; Gijbels, R. Numerical modelling of gas discharge plasmas for various applications 2003 Vacuum: surface engineering, surface instrumentation & vacuum technology 69 16 UA library record; WoS full record; WoS citing articles pdf doi
Charlier, E.; van Doorselaer, M.; Gijbels, R.; de Keyzer, R.; Geuens, I. Unveiling the composition of sulphur sensitization specks by their interactions with TAI 2000 Journal Of Imaging Science And Technology 44 16 UA library record; WoS full record; WoS citing articles
Berthelot, A.; Bogaerts, A. Modeling of CO2plasma: effect of uncertainties in the plasma chemistry 2017 Plasma sources science and technology 26 16 UA library record; WoS full record; WoS citing articles pdf url doi
Zhang, Q.-Z.; Bogaerts, A. Propagation of a plasma streamer in catalyst pores 2018 Plasma sources science and technology 27 16 UA library record; WoS full record; WoS citing articles pdf url doi
Laffez, P.; Chen, X.Y.; Banerjee, G.; Pezeril, T.; Rossell, M.D.; Van Tendeloo, G.; Lacorre, P.; Liu, J.M.; Liu, Z.-G. Growth of La2Mo2O9 films on porous Al2O3 substrates by radio frequency magnetron sputtering 2006 Thin solid films : an international journal on the science and technology of thin and thick films 500 15 UA library record; WoS full record; WoS citing articles pdf doi
Wu, M.F.; Zhou, S.; Yao, S.; Zhao, Q.; Vantomme, A.; van Daele, B.; Piscopiello, E.; Van Tendeloo, G.; Tong, Y.Z.; Yang, Z.J.; Yu, T.J.; Zhang, G.Y. High precision determination of the elastic strain of InGaN/GaN multiple quantum wells 2004 Journal of vacuum science and technology: B: microelectronics and nanometer structures 22 15 UA library record; WoS full record; WoS citing articles pdf doi
Jehanathan, N.; Lebedev, O.; Gélard, I.; Dubourdieu, C.; Van Tendeloo, G. Structure and defect characterization of multiferroic <tex>ReMnO$3 films and multilayers by TEM 2010 Nanotechnology 21 15 UA library record; WoS full record; WoS citing articles pdf doi
Bittencourt, C.; Hitchock, A.P.; Ke, X.; Van Tendeloo, G.; Ewels, C.P.; Guttmann, P. X-ray absorption spectroscopy by full-field X-ray microscopy of a thin graphite flake: Imaging and electronic structure via the carbon K-edge 2012 Beilstein journal of nanotechnology 3 15 UA library record; WoS full record; WoS citing articles pdf url doi
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