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Lu, X.P.; Bruggeman, P.J.; Reuter, S.; Naidis, G.; Bogaerts, A.; Laroussi, M.; Keidar, M.; Robert, E.; Pouvesle, J.-M.; Liu, D.W.; Ostrikov, K.(K.) |
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Title |
Grand challenges in low temperature plasmas |
Type |
A1 Journal article |
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Year |
2022 |
Publication |
Frontiers in physics |
Abbreviated Journal |
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Volume |
10 |
Issue |
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Pages |
1040658-12 |
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Keywords |
A1 Journal article; Engineering sciences. Technology; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) |
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Abstract |
Low temperature plasmas (LTPs) enable to create a highly reactive environment at near ambient temperatures due to the energetic electrons with typical kinetic energies in the range of 1 to 10 eV (1 eV = 11600K), which are being used in applications ranging from plasma etching of electronic chips and additive manufacturing to plasma-assisted combustion. LTPs are at the core of many advanced technologies. Without LTPs, many of the conveniences of modern society would simply not exist. New applications of LTPs are continuously being proposed. Researchers are facing many grand challenges before these new applications can be translated to practice. In this paper, we will discuss the challenges being faced in the field of LTPs, in particular for atmospheric pressure plasmas, with a focus on health, energy and sustainability. |
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Wos |
000878212000001 |
Publication Date |
2022-10-14 |
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Edition |
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ISSN |
2296-424x |
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Additional Links |
UA library record; WoS full record |
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Impact Factor |
3.1 |
Times cited |
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Open Access |
OpenAccess |
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Approved |
Most recent IF: 3.1 |
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Call Number |
UA @ admin @ c:irua:192173 |
Serial |
7267 |
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Permanent link to this record |
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Author |
Laroussi, M.; Bekeschus, S.; Keidar, M.; Bogaerts, A.; Fridman, A.; Lu, X.; Ostrikov, K.; Hori, M.; Stapelmann, K.; Miller, V.; Reuter, S.; Laux, C.; Mesbah, A.; Walsh, J.; Jiang, C.; Thagard, S.M.; Tanaka, H.; Liu, D.; Yan, D.; Yusupov, M. |
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Title |
Low-Temperature Plasma for Biology, Hygiene, and Medicine: Perspective and Roadmap |
Type |
A1 Journal article |
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Year |
2022 |
Publication |
IEEE transactions on radiation and plasma medical sciences |
Abbreviated Journal |
IEEE Trans. Radiat. Plasma Med. Sci. |
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Volume |
6 |
Issue |
2 |
Pages |
127-157 |
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Keywords |
A1 Journal article; Engineering sciences. Technology; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT) |
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Abstract |
Plasma, the fourth and most pervasive state of matter in the visible universe, is a fascinating medium that is connected to the beginning of our universe itself. Man-made plasmas are at the core of many technological advances that include the fabrication of semiconductor devices, which enabled the modern computer and communication revolutions. The introduction of low temperature, atmospheric pressure plasmas to the biomedical field has ushered a new revolution in the healthcare arena that promises to introduce plasma-based therapies to combat some thorny and long-standing medical challenges. This article presents an overview of where research is at today and discusses innovative concepts and approaches to overcome present challenges and take the field to the next level. It is written by a team of experts who took an in-depth look at the various applications of plasma in hygiene, decontamination, and medicine, made critical analysis, and proposed ideas and concepts that should help the research community focus their efforts on clear and practical steps necessary to keep the field advancing for decades to come. |
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Wos |
000750257400005 |
Publication Date |
2021-12-14 |
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ISSN |
2469-7311 |
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Additional Links |
UA library record; WoS full record; WoS citing articles |
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Times cited |
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Open Access |
OpenAccess |
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Notes |
Research Foundation—Flanders, 1200219N ; |
Approved |
Most recent IF: NA |
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Call Number |
PLASMANT @ plasmant @c:irua:185875 |
Serial |
6907 |
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Permanent link to this record |
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Author |
Sun, J.; Qu, Z.; Gao, Y.; Li, T.; Hong, J.; Zhang, T.; Zhou, R.; Liu, D.; Tu, X.; Chen, G.; Brüser, V.; Weltmann, K.-D.; Mei, D.; Fang, Z.; Borras, A.; Barranco, A.; Xu, S.; Ma, C.; Dou, L.; Zhang, S.; Shao, T.; Chen, G.; Liu, D.; Lu, X.; Bo, Z.; Chiang, W.-H.; Vasilev, K.; Keidar, M.; Nikiforov, A.; Jalili, A.R.; Cullen, P.J.; Dai, L.; Hessel, V.; Bogaerts, A.; Murphy, A.B.; Zhou, R.; Ostrikov, K.(K.) |
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Title |
Plasma power-to-X (PP2X): status and opportunities for non-thermal plasma technologies |
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A1 Journal Article |
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Year |
2024 |
Publication |
Journal of Physics D: Applied Physics |
Abbreviated Journal |
J. Phys. D: Appl. Phys. |
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Volume |
57 |
Issue |
50 |
Pages |
503002 |
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Keywords |
A1 Journal Article; plasma power-to-X, non-thermal plasma, gas conversion, plasma catalysis, renewable energy; Plasma, laser ablation and surface modeling Antwerp (PLASMANT) ; |
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Abstract |
This article discusses the ‘power-to-X’ (P2X) concept, highlighting the integral role of non-thermal plasma (NTP) in P2X for the eco-friendly production of chemicals and valuable fuels. NTP with unique thermally non-equilibrium characteristics, enables exotic reactions to occur under ambient conditions. This review summarizes the plasma-based P2X systems, including plasma discharges, reactor configurations, catalytic or non-catalytic processes, and modeling techniques. Especially, the potential of NTP to directly convert stable molecules including CO<sub>2</sub>, CH<sub>4</sub>and air/N<sub>2</sub>is critically examined. Additionally, we further present and discuss hybrid technologies that integrate NTP with photocatalysis, electrocatalysis, and biocatalysis, broadening its applications in P2X. It concludes by identifying key challenges, such as high energy consumption, and calls for the outlook in plasma catalysis and complex reaction systems to generate valuable products efficiently and sustainably, and achieve the industrial viability of the proposed plasma P2X strategy. |
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Wos |
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Publication Date |
2024-12-20 |
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ISSN |
0022-3727 |
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Impact Factor |
3.4 |
Times cited |
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Open Access |
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Notes |
Alexander von Humboldt Foundation; National Science Foundation, 1747760 ; Australian Research Council; |
Approved |
Most recent IF: 3.4; 2024 IF: 2.588 |
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Call Number |
PLASMANT @ plasmant @ |
Serial |
9330 |
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Permanent link to this record |